Sub-100 nm Patterning of Supported Bilayers by Nanoshaving Lithography

J. Am. Chem. Soc., 130 (9), 2718 -2719, 2008. 10.1021/ja077730s S0002-7863(07)07730-X
Web Release Date: February 8, 2008

Sub-100 nm Patterning of Supported Bilayers by Nanoshaving Lithography

Jinjun Shi, Jixin Chen, and Paul S. Cremer*

Department of Chemistry, Texas A&M University, P.O. Box 30012, College Station, Texas 77843-3012

cremer@mail.chem.tamu.edu

Received October 8, 2007

Abstract:

Sub-100 nm wide supported phospholipid bilayers (SLBs) were patterned on a planar borosilicate substrate by AFM-based nanoshaving lithography. First, a bovine serum albumin monolayer was coated on the glass and then selectively removed in long strips by an AFM tip. The width of vacant strips could be controlled down to 15 nm. Bilayer lines could be formed within the vacant strips by vesicle fusion. It was found that stable bilayers formed by this method had a lower size limit of ~ 55 nm in width. This size limit stems from a balance between a favorable bilayer adhesion energy and an unfavorable bilayer edge energy.

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