J. Phys. Chem. A, 108 (38), 7643 -7645, 2004. 10.1021/jp047202s S1089-5639(04)07202-0
Web Release Date: August 25, 2004

Copyright © 2004 American Chemical Society

A Connection between Empirical Bond Strength and the Localization of the Electron Density at the Bond Critical Points of the SiO Bonds in Silicates

G. V. Gibbs*

Departments of Geosciences, Materials Science and Engineering, and Mathematics, Virginia Polytechnic Institute and State University, Blacksburg, Virginia 24061

D. F. Cox

Department of Chemical Engineering, Virginia Polytechnic Institute and State University, Blacksburg, Virginia 24061

K. M. Rosso

W.W. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, PO Box 999, KB-96, Richland, Washington 99352

Received: June 28, 2004

In Final Form: August 11, 2004

Abstract:

The empirical bond strength of the SiO bond correlates with the value of the electron density at the bond critical point calculated for a large number of silicates and observed for the silica polymorphs stishovite and coesite. The greater the bond strength, the greater the localization of the electron density at the critical point, the shorter the bond, and the greater the covalent character of the bonded interaction. Bond strength and resonance bond number are considered to represent similar properties of the electronic structure of the bond.


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