Web Release Date: December 22,
Influence of Substrate Treatment on Self-Organized Pattern Formation by Langmuir-Blodgett Transfer
Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany, and Center for Nanotechnology (CeNTech), Gievenbeckweg 11, 48149 Münster, Germany
Received: August 23, 2007
In Final Form: October 16, 2007
Abstract:
Mesoscopic stripe patterns can be obtained by Langmuir-Blodgett (LB) transfer of L-
-dipalmitoylphosphatidylcholine (DPPC) onto solid substrates. In order to investigate the influence of substrates on the pattern
formation, silicon slides treated by different cleaning processes were taken as model systems. A shift in the
transfer pressure range for patterning was observed between plasma- and RCA-treated silicon. This can be
explained with a model of equivalent states and taking into account the influence of microscale water films
on the substrates.
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