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Article

Controlled CCVD Synthesis of Robust Multiwalled Carbon Nanotube Films

Supporting Info

Niina Halonen,^† Krisztián Kordás,*^† Geza Tóth,^† Tero Mustonen,^† Jani Mäklin,^† Jouko Vähäkangas,^† Pulickel M. Ajayan,^‡^§ and Robert Vajtai

Microelectronics and Materials Physics Laboratories, Department of Electrical and Information Engineering, and EMPART Research Group of Infotech, University of Oulu, P.O. Box 4500, Oulu FIN-90014, Finland, Department of Materials Science & Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, Department of Mechanical Engineering and Materials Science, Rice University, Houston, Texas 77251-1892, and Rensselaer Nanotechnology Center, Rensselaer Polytechnic Institute, Troy, New York 12180

J. Phys. Chem. C, 2008, 112 (17), pp 6723–6728

DOI: 10.1021/jp7110617

Publication Date (Web): April 10, 2008

†

University of Oulu.

To whom correspondence should be addressed.

‡

Department of Materials Science & Engineering, Rensselaer Polytechnic Institute.

Rice University.

Abstract

The emerging interest toward applications of robust highly aligned carbon nanotube forests requires synthesis of such films in a controlled manner. In this paper, the growth mechanism and influence of growth parameters on the structural properties of multiwalled carbon nanotube films grown by catalytic chemical vapor deposition on SiO₂ surfaces are investigated. The experimental studies are complemented with computational finite element simulations of temperature and flow fields in the reactor to have a better understanding on tailored synthesis. Film thickness, mass, density, purity, alignment, and nanotube size distribution data were assessed as a function of several growth parameters by electron microscopy and electron and X-ray diffraction techniques.

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