Nano Lett., 5 (12), 2557 -2562, 2005. 10.1021/nl051932+ S1530-6984(05)01932-6
Web Release Date: November 11, 2005

Copyright © 2005 American Chemical Society

Fabrication of Metallic Nanodots in Large-Area Arrays by Mold-to-Mold Cross Imprinting (MTMCI)

Sunghoon Kwon, Xiaoming Yan, Anthony M. Contreras, J. Alexander Liddle, Gabor A. Somorjai, and Jeffrey Bokor*

The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, Department of Chemistry and Department of Electrical Engineering and Computer Science, University of California, Berkeley, California 94720, and Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Received September 29, 2005

Revised November 3, 2005

Abstract:

We have developed a mold-to-mold cross imprint (MTMCI) process, which redefines an imprint mold with another imprint mold. By performing MTMCI on two identical imprint molds with silicon spacer nanowires in a perpendicular arrangement, we fabricated a large array of sub-30-nm silicon nanopillars. Large-area arrays of Pt dots are then produced using nanoimprint lithography with the silicon nanopillar mold.


Download the full text: PDF | HTML