Web Release Date: October 3,
Fabrication of Multiplex Quasi-Three-Dimensional Grids of One-Dimensional Nanostructures via Stepwise Colloidal Lithography
Max Planck Institute of Colloids and Interfaces, D-14424, Potsdam, Germany
Received July 26, 2007
Revised September 13, 2007
Abstract:
By using O2-plasma etched monolayers of hexagonally close-packed latex spheres as masks for metal vapor deposition, we successfully
demonstrate a stepwise colloidal lithography to stepwise grow highly ordered multiplex quasi-three-dimensional grids of metallic one-dimensional
nanostructures, e.g., nanowires and nanorods. The success of the present approach is centered at manipulation of the incidence angle of
metal vapor beams with respect to the normal direction of colloidal masks and particularly the azimuth angle 
of the projection of the vapor
beam incidence on the masks with respect to the vector from one sphere to the nearest neighbors. Stepwise deposition of different metals
by regularly varying allows consecutively stacking of 1D nanostructures into multiplex quasi-3D grids. This stepwise angle-resolved colloidal
lithography should provide a significant nanochemical complement of conventional lithographic techniques, enabling us to easily fabricate
sophisticated 3D nanostructures with defined vertical and lateral heterogeneity.
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