Nano Lett., 7 (12), 3628 -3632, 2007. 10.1021/nl071844k S1530-6984(07)01844-9
Web Release Date: November 2, 2007

Copyright © 2007 American Chemical Society

Moiré Patterns in Superimposed Nanoporous Thin Films Derived from Block-Copolymer Assemblies

Valeriy Luchnikov,* Alexey Kondyurin, Petr Formanek, Hannes Lichte, and Manfred Stamm

Leibniz Institute of Polymer Research Dresden, D-01069 Dresden, Germany, University of Sydney, School of Physics, A28, The University of Sydney, NSW 2006, Australia, and Technical University of Dresden, Triebenberg Lab, D 01062 Dresden, Germany

Received July 28, 2007

Revised October 21, 2007

Abstract:

Nanoscale rotation moiré patterns are observed in double-layer nanoporous thin films produced with use of block-copolymer self-assembly. Periodic hexagonal moiré superstructures appear when the films possessing long-range order are superimposed at small misorientation angles. Overlapping films misoriented by angles close to 30 generate aperiodic quasi-crystal-like superstructures with 5-fold symmetries. The stacking of the disordered nanoporous films produces labyrinth-like patterns. Block-copolymer moiré superstructures are promising as nanolithography masks with controllable morphology and periodicity.


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