Reference-Free Total Reflection X-ray Fluorescence Analysis of Semiconductor Surfaces with Synchrotron Radiation

Burkhard Beckhoff,* Rolf Fliegauf, Michael Kolbe, Matthias Müller, Jan Weser, and Gerhard Ulm
Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12, 10587 Berlin, Germany
Anal. Chem., 2007, 79 (20), pp 7873–7882
DOI: 10.1021/ac071236p
Publication Date (Web): September 20, 2007
Copyright © 2007 American Chemical Society

Abstract

Total reflection X-ray fluorescence (TXRF) analysis is a well-established method to monitor lowest level contamination on semiconductor surfaces. Even light elements on a wafer surface can be excited effectively when using high-flux synchrotron radiation in the soft X-ray range. To meet current industrial requirements in nondestructive semiconductor analysis, the Physikalisch-Technische Bundesanstalt (PTB) operates dedicated instrumentation for analyzing light element contamination on wafer pieces as well as on 200- and 300-mm silicon wafer surfaces. This instrumentation is also suited for grazing incidence X-ray fluorescence analysis and conventional energy-dispersive X-ray fluorescence analysis of buried and surface nanolayered structures, respectively. The most prominent features are a high-vacuum load-lock combined with an equipment front end module and a UHV irradiation chamber with an electrostatic chuck mounted on an eight-axis manipulator. Here, the entire surface of a 200- or a 300-mm wafer can be scanned by monochromatized radiation provided by the plane grating monochromator beamline for undulator radiation in the PTB laboratory at the electron storage ring BESSY II. This beamline provides high spectral purity and high photon flux in the range of 0.078−1.86 keV. In addition, absolutely calibrated photodiodes and Si(Li) detectors are used to monitor the exciting radiant power respectively the fluorescence radiation. Furthermore, the footprint of the excitation radiation at the wafer surface is well-known due to beam profile recordings by a CCD during special operation conditions at BESSY II that allow for drastically reduced electron beam currents. Thus, all the requirements of completely reference-free quantitation of TXRF analysis are fulfilled and are to be presented in the present work. The perspectives to arrange for reference-free quantitation using X-ray tube-based, table-top TXRF analysis are also addressed.

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This article has been cited by 4 ACS Journal articles (4 most recent appear below).

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    Complementary Characterization of Buried Nanolayers by Quantitative X-ray Fluorescence Spectrometry under Conventional and Grazing Incidence Conditions

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      The determination of the thickness and elemental composition is an important part of the characterization of nanolayered structures. For buried nanolayers, X-ray fluorescence spectrometry is a qualified method for the thickness determination whereas ...

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    Measuring and Interpreting X-ray Fluorescence from Planetary Surfaces

    Alan Owens, Burkhard Beckhoff, George Fraser, Michael Kolbe, Michael Krumrey, Alfonso Mantero, Michael Mantler, Anthony Peacock, Maria-Grazia Pia, Derek Pullan, Uwe G. Schneider and Gerhard Ulm
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      As part of a comprehensive study of X-ray emission from planetary surfaces and in particular the planet Mercury, we have measured fluorescent radiation from a number of planetary analog rock samples using monochromatized synchrotron radiation provided by ...

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    X-ray Spectrometry

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History

  • Published In Issue October 15, 2007
  • Received for review June 12, 2007. Accepted August 7, 2007.

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