Cart
Article
Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers
Full Text HTML
Hi-Res PDFPurchase the full-text
- PDF/HTML,
figures/images,
references and tables,
(where available)
Abstract
To keep pace with the ever-shrinking feature sizes required in the microelectronics industry, suitable developers with high diffusivities, selectivity, and adjustable solvating power are required. Supercritical fluid (SCF) CO2 possesses many of the above unique properties and could serve as an “environmentally responsible” alternative developer to aqueous base. In this study, the high solubility of fluorinated block copolymers in supercritical CO2 and the selectivity of supercritical CO2 to both polarity changes and the molecular structure of the polymer were utilized to develop an environmentally friendly lithographic process. Polymers with acid-cleavable tetrahydropyranyl groups and supercritical CO2 soluble, fluoro-side-chain-containing methacrylate groups were synthesized with varying volume fractions of the components, and their solubilities in supercritical CO2 were characterized. Chemical amplification was used to effect the polarity change leading to the solubility difference in supercritical CO2, and the lithographic performance was evaluated. Important parameters such as sensitivity, contrast, and resolution were investigated, and 0.2 μm features using supercritical CO2 development were demonstrated.
Citing Articles
Citation data is made available by participants in CrossRef's Cited-by Linking service. For a more comprehensive list of citations to this article, users are encouraged to perform a search in SciFinder.
This article has been cited by 24 ACS Journal articles (5 most recent appear below).
Supercritical Fluids for the Fabrication of Semiconductor Devices: Emerging or Missed Opportunities?
Alvin H. Romang and James J. WatkinsChemical Reviews2010 110 (1), 459-478Supercritical Fluids for the Fabrication of Semiconductor Devices: Emerging or Missed Opportunities?
Alvin H. Romang and James J. WatkinsChemical Reviews2010 110 (1), 459-478
Development of a Directly Patterned Low-Surface-Energy Polymer Brush in Supercritical Carbon Dioxide
Abhinav Rastogi, Marvin Y. Paik and Christopher K. OberACS Applied Materials & Interfaces2009 1 (9), 2013-2020Development of a Directly Patterned Low-Surface-Energy Polymer Brush in Supercritical Carbon Dioxide
Abhinav Rastogi, Marvin Y. Paik and Christopher K. OberACS Applied Materials & Interfaces2009 1 (9), 2013-2020Carbon dioxide (CO2) is a sustainable solvent because it is nonflammable, exhibits a relatively low toxicity, and is naturally abundant. As a selective, nonpolar solvent, supercritical CO2 (scCO2) is an ideal fit for the development of low-surface-energy ...
Solubilities of l-Proline in Subcritical HFC-134a and Supercritical CO2 Fluids
Ling Liu, Zhen Li, Zhong-Wen Liu and Zhao-Tie LiuJournal of Chemical & Engineering Data2009 54 (9), 2780-2784Solubilities of l-Proline in Subcritical HFC-134a and Supercritical CO2 Fluids
Ling Liu, Zhen Li, Zhong-Wen Liu and Zhao-Tie LiuJournal of Chemical & Engineering Data2009 54 (9), 2780-2784A static method coupled with gravimetric analysis was used to measure the solubility of l-proline in subcritical 1,1,1,2-tetrafluoroethane (HFC-134a) and supercritical CO2 (scCO2). The solubility of l-proline is much higher in HFC-134a fluid than in scCO2...
Fluorinated Quaternary Ammonium Salts as Dissolution Aids for Polar Polymers in Environmentally Benign Supercritical Carbon Dioxide
Manabu Tanaka, Abhinav Rastogi, Gregory N. Toepperwein, Robert A. Riggleman, Nelson M. Felix, Juan J. de Pablo and Christopher K. OberChemistry of Materials2009 21 (14), 3125-3135Fluorinated Quaternary Ammonium Salts as Dissolution Aids for Polar Polymers in Environmentally Benign Supercritical Carbon Dioxide
Manabu Tanaka, Abhinav Rastogi, Gregory N. Toepperwein, Robert A. Riggleman, Nelson M. Felix, Juan J. de Pablo and Christopher K. OberChemistry of Materials2009 21 (14), 3125-3135Environmentally benign supercritical carbon dioxide (scCO2) has been utilized as an “ecologically responsible” solvent for a wide variety of applications. However, nonpolar scCO2 is generally a very poor solvent for polar polymers which limits its use as ...
Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO2 Compatible Salt
Amy E. Zweber, Mark Wagner, James DeYoung and Ruben G. CarbonellLangmuir2009 25 (11), 6176-6190Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO2 Compatible Salt
Amy E. Zweber, Mark Wagner, James DeYoung and Ruben G. CarbonellLangmuir2009 25 (11), 6176-6190The mechanism of developing an extreme ultraviolet (EUV) commercial photoresist with supercritical carbon dioxide (scCO2) and a CO2 compatible salt (CCS) solution was studied. The cloud point of CCS in CO2 and the pressure at which the photoresist ...
Tools
-
Add to Favorites
-
Download Citation
-
Email a Colleague -
Permalink
Order Reprints
Rights & Permissions
Citation Alerts
History
- Published In Issue January 17, 2000
- Received April 27, 1999
Revised Manuscript Received November 2, 1999
ACS
Network
Facebook
Tweet This
CiteULike
Newsvine
Digg This
Delicious
