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A Photolithography Laboratory Experiment for General Chemistry Students

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Thomas C. DeVore and Brian H. Augustine

Department of Chemistry, James Madison University, Harrisonburg, VA 22807

Adora M. Christenson

Human Genome Sciences, Department of Formulation and Stability, Rockford, MD 20850

Gregory W. Corder

Department of Physics, James Madison University, Harrisonburg, VA 22807

J. Chem. Educ., 2003, 80 (2), p 183

DOI: 10.1021/ed080p183

Publication Date (Web): February 1, 2003

Abstract

Photolithography is the primary means of pattern transfer used in the production of a multitude of microfabricated devices, including integrated circuits, microelectromechanical systems, and optoelectronic devices. The underlying photochemical process inherent to lithography is an attractive model system to introduce photochemistry, reaction kinetics, polymer chemistry, and materials science to a broader audience in a general chemistry laboratory setting. We report a second-semester general chemistry experiment in which students design and produce a photomask to pattern a silicon wafer using optical lithography. In addition to substrate patterning, students examine the reaction kinetics of the photobleaching process of the photoresist system using a UV–vis spectrometer operating in the kinetics mode. Both experiments introduce lower-division students to a technologically important industrial chemistry process and aid in understanding the topics of polymer chemistry and photochemistry.

Keywords (Audience):

First-Year Undergraduate / General

Keywords (Domain):

Polymer Chemistry

Keywords (Pedagogy):

Hands-On Learning / Manipulatives

Keywords (Subject):

Kinetics

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This article has been cited by 1 ACS Journal articles (1 most recent appear below).

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  Journal of Chemical Education2012 Article ASAP
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