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Making Nanomaterials in Supercritical Fluids: A Review
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Abstract
Using supercritical or near-supercritical fluids as media for physical or chemical transformations is an emerging technology for nanomaterials production. The unusual properties of supercritical fluids—including tunable solvent strength, high diffusivity, and low viscosity, as well as the ability to replace toxic solvents—offer materials processing in supercritical fluids significant advantages over conventional processes. Nanoparticles, nanowires, and thin solid films with high purity, uniformity, and homogeneity can be prepared in supercritical or near-supercritical fluids with minimum environmental problems. A number of nanomaterials processing techniques including rapid expansion of supercritical solutions (RESS), microemulsion reactions, supercritical fluid transport–chemical deposition (SFT–CD), supercritical fluid transport–chemical vapor deposition (SFT–CVD), supercritical fluid chemical deposition (SFCD), chemical fluid deposition (CFD), and supercritical fluid immersion deposition (SFID) are described.
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This article has been cited by 7 ACS Journal articles (5 most recent appear below).
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Shawn Dodds, Jeffery A. Wood, and Paul A. CharpentierIndustrial & Engineering Chemistry Research2007 46 (24), 8009-8017The purpose of this work was to develop a mathematical model to describe the crystal size distributions (CSDs) produced from the gas−antisolvent (GAS) technique on the crystallization of beclomethasone-17,21-dipropionate (BDP), which is an anti-...
Micronization of Phenanthrene Using the Gas Antisolvent Process: Part 2. Theoretical Study
Yousef Bakhbakhi, Sohrab Rohani, and Paul A. CharpentierIndustrial & Engineering Chemistry Research2005 44 (19), 7345-7351Micronization of Phenanthrene Using the Gas Antisolvent Process: Part 2. Theoretical Study
Yousef Bakhbakhi, Sohrab Rohani, and Paul A. CharpentierIndustrial & Engineering Chemistry Research2005 44 (19), 7345-7351In the second part of our study, a rigorous mathematical model was developed and simulated using Parsival for the gas antisolvent recrystallization process using phenanthrene−toluene−carbon dioxide as a model system, This model accounts for the governing ...
Micronization of Phenanthrene Using the Gas Antisolvent Process. 1. Experimental Study and Use of FTIR
Yousef Bakhbakhi, Sohrab Rohani, and Paul A. CharpentierIndustrial & Engineering Chemistry Research2005 44 (19), 7337-7344Micronization of Phenanthrene Using the Gas Antisolvent Process. 1. Experimental Study and Use of FTIR
Yousef Bakhbakhi, Sohrab Rohani, and Paul A. CharpentierIndustrial & Engineering Chemistry Research2005 44 (19), 7337-7344In this study the micronization of phenanthrene from toluene was studied using the gas antisolvent (GAS) recrystallization process. A systematic investigation of the influence of the key GAS process parameters, antisolvent addition rate (1, 20, 50, and ...
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- Received: August 03, 2009
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