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Chemical Vapor Deposition of Diamond Coatings onto Dental Burrs

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Waqar Ahmed , Htet Sein and Hussam Rajab

Department of Chemistry and Materials, Manchester Metropolitan University, Manchester M1 5GD, United Kingdom

Mark Jackson

Department of Mechanical Engineering, Tennessee Technological University, Cookeville, TN 38505

J. Chem. Educ., 2003, 80 (6), p 636

DOI: 10.1021/ed080p636

Publication Date (Web): June 1, 2003

Section:

History, Education, and Documentation

Abstract

Chemical vapor deposition (CVD) is an elegant and promising technology for coating dental tools such as burrs and microdrills with a hard diamond coating in order to improve their performance and lifespan. The diamond coatings are formed by decomposing a mixture of methane and hydrogen on the surface of the heated components in a reactor under vacuum conditions. The CVD diamond-coated burrs give a superior performance compared to the conventional diamond burrs made by binding diamond particles onto the metal surface. In addition, the risks of contamination of oral tissues are reduced. Interestingly, the thermal characteristics of diamond are similar to those of dentine and therefore the drilling operation is more comfortable for the patient. These properties of the CVD diamond dental burr make it a highly desirable alternative to the conventional dental burr for odontological applications. If the process can be scaled up to coat multiple substrates, the CVD coated dental burr may replace the conventional dental burr.

Keywords (Audience):

General Public

Keywords (Domain):

Analytical Chemistry

Keywords (Feature):

Products of Chemistry

Keywords (Subject):

Crystals / Crystallography

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This article has been cited by 1 ACS Journal articles (1 most recent appear below).

Chemical Vapor Deposition of Aluminum Oxide Thin Films
Jason K. Vohs, Amy Bentz, Krystal Eleamos, and John Poole, Bradley D. Fahlman
Journal of Chemical Education2010 87 (10), 1102-1104
- Chemical Vapor Deposition of Aluminum Oxide Thin Films
  Jason K. Vohs, Amy Bentz, Krystal Eleamos, and John Poole, Bradley D. Fahlman
  Journal of Chemical Education2010 87 (10), 1102-1104
  Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for ...
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