Article
Modeling of Thin-Film Slurry Photocatalytic Reactors Affected by Radiation Scattering
Corresponding author phone: +44 (0) 115 9514170; fax: +44 (0) 115 9514115; e-mail: gianluca.li.puma@nottingham.ac.uk.
Abstract
Photocatalytic oxidation over titanium dioxide is a “green” sustainable process for treatment and purification of water and wastewater. A dimensionless model for steady-state, continuous flow, thin-film, slurry (TFS) photocatalytic reactors for water purification using solar radiation and UV lamps is presented and validated. The model is applicable to TFS flat plate and annular photoreactors of (a) falling film or (b) double-skin designs, operating with three ideal flows: (1) falling film laminar flow (FFLF), (2) plug flow (PF) and (3) slit flow (SF). Model parameters can be estimated easily from real systems, and solutions can be obtained with modest computational efforts. A modified two-flux absorption-scattering model models the radiation field in the photoreactor. Model simulations show that at a scattering albedo higher than 0.3, radiation scattering can significantly affect conversions obtained at different values of optical thickness. However, at lower values, the effect of scattering on conversions is negligible. The conversions with the idealized flow systems follow the sequence FFLF > PF > SF. SF operation should always be avoided. The model estimates the optimum value of optical thickness that maximizes conversion in a photocatalytic reactor. Optimal design of TFS photocatalytic reactors using the photocatalyst TiO2 Degussa P25 requires an optical thickness in the range from 1.8 to 3.4 depending on flow conditions and reaction kinetics.
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History
- Published In Issue December 15, 2003
- Received for review March 10, 2003
Revised manuscript received July 18, 2003
Accepted September 29, 2003
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