Bis[bis(trimethylsilyl)amino]silylene, an Unstable Divalent Silicon Compound

Gyu-Hwan Lee,† Robert West,*‡ and Thomas Müller§
Department of Chemistry, Hannam University, Taejon, 305-761, Korea, Organosilicon Research Center, Department of Chemistry, University of Wisconsin, Madison, Wisconsin 53706, and Institut fr Anorganische Chemie der Universitt Frankfurt, Frankfurt, Germany
J. Am. Chem. Soc., 2003, 125 (27), pp 8114–8115
DOI: 10.1021/ja035374h
Publication Date (Web): June 17, 2003
Copyright © 2003 American Chemical Society
†

 Hannam University.

,
*

In papers with more than one author, the asterisk indicates the name of the author to whom inquiries about the paper should be addressed.

,
‡

 University of Wisconsin.

,
§

 Universität Frankfurt.

, west@chem.wisc.edu

Abstract

Abstract Image

The title compound, [(Me3Si)2N]2Si:  (1), was prepared by the reduction of [(Me3Si)2N]2SiBr2 (2) with potassium graphite at −78 °C. Unlike the corresponding germanium and tin compounds, 1 is unstable, but it can be studied in solution at low temperatures. The 29Si NMR chemical shift of 1 measured at −20 °C was 223.9 ppm, in good agreement with a value obtained from model calculations of 233 ppm. Reaction of solutions of 1 with methanol or phenol gave the trapping products expected for the silylene, [(Me3Si)2N]2Si(H)OR (R = CH3, C6H5).

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History

  • Published In Issue July 09, 2003
  • Received March 29, 2003

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