Supercritical Carbon Dioxide Processing of Fluorinated Surfactant Templated Mesoporous Silica Thin Films

Kaustav Ghosh, Hans-Joachim Lehmler, Stephen E. Rankin, and Barbara L. Knutson*
Department of Chemical and Materials Engineering, University of Kentucky, 177 Anderson Hall, Lexington, Kentucky 40506-0046, and Department of Occupational and Environmental Health, University of Iowa, 100 Oakdale Campus #124 IREH, Iowa City, Iowa 52242-5000
Langmuir, 2005, 21 (14), pp 6145–6149
DOI: 10.1021/la050311t
Publication Date (Web): June 10, 2005
Copyright © 2005 American Chemical Society

 University of Kentucky.

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 University of Iowa.

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*

 Corresponding author.

Abstract

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The effect of processing mesoporous silica thin films with supercritical CO2 immediately after casting is investigated, with a goal of using the penetration of CO2 molecules in the tails of fluorinated surfactant templates to tailor the final pore size. Well-ordered films with two-dimensional hexagonal close-packed pore structure are synthesized using a cationic fluorinated surfactant, 1-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)pyridinium chloride, as a templating agent. Hexagonal mesopore structures are obtained for both unprocessed films and after processing the cast films in CO2 at constant pressure (69−172 bar) and temperature (25−45 °C) for 72 h, followed by traditional heat treatment steps. X-ray diffraction and transmission electron microscopy analysis reveal significant increases in pore size for all CO2-treated thin films (final pore diameter up to 4.22 ± 0.14 nm) relative to the unprocessed sample (final pore diameter of 2.21 ± 0.20 nm) before surfactant extraction. Similar pore sizes are obtained with liquid and supercritical fluid treatments over the range of conditions tested. These results demonstrate that combining the tunable solvent strength of compressed and supercritical CO2 with the “CO2-philic” nature of fluorinated tails allows one to use CO2 processing to control the pore size in ordered mesoporous silica films.

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History

  • Published In Issue July 05, 2005
  • Received February 3, 2005
    Revised May 4, 2005

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