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Letter

Three-Dimensional Nanostructure Construction via Nanografting: Positive and Negative Pattern Transfer

Jun-Fu Liu,^† Sylvain Cruchon-Dupeyrat,^† Jayne C. Garno,^†^‡ Jane Frommer,^§ and Gang-Yu Liu*^†

Department of Chemistry, University of California, Davis, California 95616, Department of Chemistry, Wayne State University, Detroit, Michigan 48202, IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120

Nano Letters, 2002, 2 (9), pp 937–940

DOI: 10.1021/nl025670c

Publication Date (Web): August 24, 2002

†

University of California, Davis.

Current address: NanoInk, Inc., 1436 W. Randolph St. #402, Chicago, IL 60607.

‡

Wayne State University.

IBM Almaden Research Center.

Corresponding author. Tel: 530-754-9678; Fax: 530-752-8995; E-mail: liu@chem.ucdavis.edu.

Abstract

Three-dimensional nanostructures can be constructed using scanning probe lithography in combination with selective surface reactions. This letter introduces a successful approach using AFM-based nanografting to produce two-dimensional nanopatterns within self-assembled monolayer resists. These nanopatterns serve as an anchor to construct nanostructures in the third dimension via surface reactions. In this way, the nanometer-scale 2D pattern is transferred to chemically distinct 3D nanostructures. This approach offers the advantages of high spatial precision and selectivity in pattern transfer.

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Published In Issue September 11, 2002
Received June 25, 2002
Revised Manuscript Received August 1, 2002

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Letter

Three-Dimensional Nanostructure Construction via Nanografting: Positive and Negative Pattern Transfer

Abstract

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SciFinder Links

History

Recommend & Share

Related Content

Molecular Recognition-Mediated Fabrication of Protein Nanostructures by Dip-Pen Lithography

Fabrication of Luminescent Nanostructures and Polymer Nanowires Using Dip-Pen Nanolithography

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

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