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Surface Plasmon Interference Nanolithography

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Zhao-Wei Liu,^† Qi-Huo Wei,^‡ and Xiang Zhang*^†

NSF Nanoscale Science and Engineering Center (NSEC), 5130 Etcheverry Hall, University of California, Berkeley, California 94720-1740, and Applied NanoBioscience Center, Arizona State University, Main Campus, P.O. Box 874004, Tempe, Arizona 85287-4004

Nano Lett., 2005, 5 (5), pp 957–961

DOI: 10.1021/nl0506094

Publication Date (Web): April 21, 2005

Section:

Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes

Abstract

A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface plasmon interference nanolithography (SPIN) can go far beyond the free-space diffraction limit of the light. Simulation results show that one-dimensional and two-dimensional periodical structures of 40−100 nm features can be patterned using interfering surface plasmons launched by 1D gratings. Detailed characteristics of SPIN such as field distribution and contrast are also investigated.

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This article has been cited by 12 ACS Journal articles (5 most recent appear below).

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