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Letter

Plasmon-Assisted Chemical Vapor Deposition

Supporting Info

David A. Boyd,*^† Leslie Greengard,^‡ Mark Brongersma,^§ Mohamed Y. El-Naggar,^† and David G. Goodwin^†

Division of Engineering and Applied Science, California Institute of Technology, Pasadena, California 91125, Courant Institute of Mathematical Sciences, New York University, New York, New York 10012, and Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-4045

Nano Lett., 2006, 6 (11), pp 2592–2597

DOI: 10.1021/nl062061m

Publication Date (Web): October 11, 2006

Corresponding author. E-mail: daboyd@caltech.edu.

†

California Institute of Technology.

‡

New York University.

Stanford University.

Abstract

We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PACVD), by patterning the spatial deposition of PbO and TiO₂ on glass substrates coated with a dispersion of 23 nm gold particles. The morphology of both oxide deposits is consistent with local laser-induced heating of the gold particles by more than 150 °C. We show that temperature changes of this magnitude are consistent with our analysis of the heat-loss mechanisms. The technique is general and can be used to spatially control the deposition of virtually any material for which a CVD process exists.

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History

Published In Issue November 08, 2006
Received August 31, 2006
Revised Manuscript Received September 18, 2006

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Letter

Plasmon-Assisted Chemical Vapor Deposition