Robust Microstructures Using UV Photopatternable Semiconductor Nanocrystals

Won Jin Kim, Sung Jin Kim, Kwang-Sup Lee, Marek Samoc, Alexander N. Cartwright and Paras N. Prasad*
Institute for Lasers, Photonics and Biophotonics, Department of Chemistry, and Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, New York 14260, and Department of Advanced Materials, Hannam University, Daejeon 305-811, Korea
Nano Lett., 2008, 8 (10), pp 3262–3265
DOI: 10.1021/nl8016219
Publication Date (Web): September 9, 2008
Copyright © 2008 American Chemical Society
* Corresponding author. Dr. Paras N. Prasad, Distinguished Professor, Institute for Lasers, Photonics and Biophotonics, 428 Natural Sciences Complex, The State University of New York, University at Buffalo, Buffalo, NY 14260-3000, pnprasad@buffalo.edu. Phone: 716-645-6800 ext.2099, Fax: 716-645-6945.

Abstract

Abstract Image

We report an approach to produce predefined patterns of quantum dots and multipod nanocrystals using optical lithography for direct writing of films for optoelectronic and electronic devices. To obtain photopatternability, the nanostructures (for example, CdSe, CdTe, and PbSe nanocrystals) were functionalized by incorporation of the functional ligand t-butoxycarbonyl (t-BOC) which has an acid-labile moiety. This change in the surface chemistry results in the ability to photopattern the semiconductor nanocrystals where desired for a number of optoelectronic device geometries. We demonstrate that the ultimate resolution (line width and spacing) of this technique is below 5 μm (the limit of our optical apparatus used for writing).

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History

  • Published In Issue October 08, 2008
  • Article ASAPSeptember 09, 2008
  • Received: June 5, 2008
    Revised: August 12, 2008

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