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Ultrastable Atomic Force Microscopy: Atomic-Scale Stability and Registration in Ambient Conditions

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Gavin M. King^†, Ashley R. Carter^†^‡, Allison B. Churnside^†^‡, Louisa S. Eberle^†^§ and Thomas T. Perkins*^†

JILA, National Institute of Standards and Technology, and University of Colorado, Boulder, Colorado 80309, Department of Physics, Department of Molecular, Cellular, and Developmental Biology, University of Colorado, Boulder, Colorado 80309, and Denver School of Science and Technology, Denver, Colorado 80238

Nano Lett., 2009, 9 (4), pp 1451–1456

DOI: 10.1021/nl803298q

Publication Date (Web): March 12, 2009

* To whom correspondence should be addressed. E-mail: tperkins@jila.colorado.edu., †

JILA, National Institute of Standards and Technology and University of Colorado.

, ‡

Department of Physics, University of Colorado.

, §

Denver School of Science and Technology.

Department of Molecular, Cellular, and Developmental Biology, University of Colorado.

Section:

Surface Chemistry and Colloids

Abstract

Instrumental drift in atomic force microscopy (AFM) remains a critical, largely unaddressed issue that limits tip−sample stability, registration, and the signal-to-noise ratio during imaging. By scattering a laser off the apex of a commercial AFM tip, we locally measured and thereby actively controlled its three-dimensional position above a sample surface to <40 pm (Δf = 0.01−10 Hz) in air at room temperature. With this enhanced stability, we overcame the traditional need to scan rapidly while imaging and achieved a 5-fold increase in the image signal-to-noise ratio. Finally, we demonstrated atomic-scale (100 pm) tip−sample stability and registration over tens of minutes with a series of AFM images on transparent substrates. The stabilization technique requires low laser power (<1 mW), imparts a minimal perturbation upon the cantilever, and is independent of the tip−sample interaction. This work extends atomic-scale tip−sample control, previously restricted to cryogenic temperatures and ultrahigh vacuum, to a wide range of perturbative operating environments.

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