Rhodium(I)-Catalyzed Silylation of Aryl Halides with Triethoxysilane:  Practical Synthetic Route to Aryltriethoxysilanes

Miki Murata,* Masanori Ishikura, Masayuki Nagata, Shinji Watanabe, and Yuzuru Masuda*
Department of Materials Science, Kitami Institute of Technology, Kitami 090-8507, Japan
Org. Lett., 2002, 4 (11), pp 1843–1845
DOI: 10.1021/ol025770p
Publication Date (Web): May 3, 2002
Copyright © 2002 American Chemical Society
*

In papers with more than one author, the asterisk indicates the name of the author to whom inquiries about the paper should be addressed.

, muratamk@mail.kitami-it.ac.jp

Abstract

Abstract Image

The specific silylation of aryl iodides and bromides with triethoxysilane (EtO)3SiH in the presence of NEt3 and a catalytic amount of [Rh(cod)(MeCN)2]BF4 provides the corresponding aryltriethoxysilanes in high yield.

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History

  • Published In Issue May 30, 2002
  • Received February 22, 2002

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