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Effect of Step Edges on Adsorption Behavior for GaN(0001) Surfaces during Metalorganic Vapor Phase Epitaxy: An Ab Initio Study
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    Effect of Step Edges on Adsorption Behavior for GaN(0001) Surfaces during Metalorganic Vapor Phase Epitaxy: An Ab Initio Study
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    • Takumi Ohka
      Takumi Ohka
      Department of Physics Engineering, Mie University, 1577 Kurima-Machiya, Tsu, Mie 514-8507, Japan
      More by Takumi Ohka
    • Toru Akiyama*
      Toru Akiyama
      Department of Physics Engineering, Mie University, 1577 Kurima-Machiya, Tsu, Mie 514-8507, Japan
      *E-mail: [email protected]
      More by Toru Akiyama
    • Abdul Muizz Pradipto
      Abdul Muizz Pradipto
      Department of Physics Engineering, Mie University, 1577 Kurima-Machiya, Tsu, Mie 514-8507, Japan
    • Kohji Nakamura
      Kohji Nakamura
      Department of Physics Engineering, Mie University, 1577 Kurima-Machiya, Tsu, Mie 514-8507, Japan
    • Tomonori Ito
      Tomonori Ito
      Department of Physics Engineering, Mie University, 1577 Kurima-Machiya, Tsu, Mie 514-8507, Japan
      More by Tomonori Ito
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    Crystal Growth & Design

    Cite this: Cryst. Growth Des. 2020, 20, 7, 4358–4365
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    https://doi.org/10.1021/acs.cgd.0c00117
    Published June 4, 2020
    Copyright © 2020 American Chemical Society

    Abstract

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    The adsorption behavior of adatoms on stepped GaN(0001) surfaces during metalorganic vapor phase epitaxy (MOVPE) is theoretically investigated on the basis of ab initio calculations. The calculations using vicinal surfaces consisting of single layer step edges along the [11̅00] direction reveal that the structure of step edges depends on the growth condition. The vicinal surface with H-terminated N atoms (Nad-H+Ga-H) and that with both H-terminated N atoms and NH2 (Nad-H+Ga-NH2) are found to be stabilized under the MOVPE growth condition. Furthermore, different adsorption sites and energies of Ga and N adatoms are obtained depending on the atomic configurations of step edges and terraces. The most stable adsorption site of the Ga adatom is located at the step edge irrespective of the reconstructions, but the adsorption energy for the surface with Nad-H+Ga-NH2 (−3.54 eV) is much lower than that with Nad-H+Ga-H (−2.68 eV). One of the striking results of the adsorption behavior of the Ga adatom is the presence or absence of the Ehrlich–Schwoebel barrier, depending on the structure of step edges. On the basis of the calculated adsorption energies and energy barriers, the adsorption behavior at the step edges on GaN(0001) surfaces depending on the growth condition of MOVPE is successfully explained.

    Copyright © 2020 American Chemical Society

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    This article is cited by 17 publications.

    1. Toru Akiyama, Takahiro Kawamura. Structural Stability of Vicinal AlN(0001) and GaN(0001) Surfaces with Steps and Kinks under Metal–Organic Vapor-Phase Epitaxy Condition: A First-Principles Study. Crystal Growth & Design 2024, 24 (14) , 5906-5915. https://doi.org/10.1021/acs.cgd.4c00121
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    15. Toru Akiyama, Takumi Ohka, Katsuya Nagai, Tomonori Ito. Effect of step edges on the adsorption behavior on vicinal AlN(0001) surface during metal-organic vapor phase epitaxy: An ab initio study. Journal of Crystal Growth 2021, 571 , 126244. https://doi.org/10.1016/j.jcrysgro.2021.126244
    16. Toru Akiyama, Atsutaka Nakatani, Tsunashi Shimizu, Takumi Ohka, Tomonori Ito. Effective approach for calculating individual energy of step edges on polar AlN(0001) and GaN(0001) surfaces. Japanese Journal of Applied Physics 2021, 60 (8) , 080701. https://doi.org/10.35848/1347-4065/ac1128
    17. Peter Tieu, Xingxu Yan, Mingjie Xu, Phillip Christopher, Xiaoqing Pan. Directly Probing the Local Coordination, Charge State, and Stability of Single Atom Catalysts by Advanced Electron Microscopy: A Review. Small 2021, 17 (16) https://doi.org/10.1002/smll.202006482

    Crystal Growth & Design

    Cite this: Cryst. Growth Des. 2020, 20, 7, 4358–4365
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acs.cgd.0c00117
    Published June 4, 2020
    Copyright © 2020 American Chemical Society

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