Electron Beam Patterning of Metal–Organic Frameworks
- Yurun MiaoYurun MiaoInstitute for NanoBioTechnology, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United StatesMore by Yurun Miao
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- Michael Tsapatsis*Michael Tsapatsis*Email: [email protected]Institute for NanoBioTechnology, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United StatesDepartment of Chemical and Biomolecular Engineering, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United StatesApplied Physics Laboratory, Johns Hopkins University, 11100 Johns Hopkins Road, Laurel, Maryland 20723, United StatesMore by Michael Tsapatsis
Abstract

Development in patterning technique of metal–organic frameworks (MOFs) will facilitate their integration in microelectronics, but controlling the structure of MOFs at the nanoscale remains a major challenge. We demonstrate that an electron beam (e-beam) can be used to pattern a zinc-imidazolate MOF, ZIF-L, at unprecedented resolution in a direct-write lithographic approach, where the electron-irradiated MOF functions either as a positive- or negative-tone resist depending on the level of exposure and developing solvent used. Nanosheets with adjustable thickness and other nanostructures can be obtained using a low e-beam with a controlled penetration depth. In addition, electron irradiation in ZIF-L leads to spatially directed crystallization to a prototypical MOF ZIF-8 via ligand-vapor treatment. This versatile strategy opens the door to e-beam-based processing of MOF materials for various applications.
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