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Electron Beam Patterning of Metal–Organic Frameworks

  • Yurun Miao
    Yurun Miao
    Institute for NanoBioTechnology, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United States
    More by Yurun Miao
  •  and 
  • Michael Tsapatsis*
    Michael Tsapatsis
    Institute for NanoBioTechnology, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United States
    Department of Chemical and Biomolecular Engineering, Johns Hopkins University, 3400 North Charles St, Baltimore, Maryland 21218, United States
    Applied Physics Laboratory, Johns Hopkins University, 11100 Johns Hopkins Road, Laurel, Maryland 20723, United States
    *Email: [email protected]
Cite this: Chem. Mater. 2021, 33, 2, 754–760
Publication Date (Web):January 11, 2021
https://doi.org/10.1021/acs.chemmater.0c04204
Copyright © 2021 American Chemical Society

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    Abstract

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    Development in patterning technique of metal–organic frameworks (MOFs) will facilitate their integration in microelectronics, but controlling the structure of MOFs at the nanoscale remains a major challenge. We demonstrate that an electron beam (e-beam) can be used to pattern a zinc-imidazolate MOF, ZIF-L, at unprecedented resolution in a direct-write lithographic approach, where the electron-irradiated MOF functions either as a positive- or negative-tone resist depending on the level of exposure and developing solvent used. Nanosheets with adjustable thickness and other nanostructures can be obtained using a low e-beam with a controlled penetration depth. In addition, electron irradiation in ZIF-L leads to spatially directed crystallization to a prototypical MOF ZIF-8 via ligand-vapor treatment. This versatile strategy opens the door to e-beam-based processing of MOF materials for various applications.

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    2. Takashi Ito, Samantha G. Jenkins, Soenke Seifert, Ahmet Uysal. Electrochemistry-Induced Direct Deposition of Nanoscale Thin Zeolitic Imidazolate Framework-8 Films on Insulator Substrates. Crystal Growth & Design 2023, 23 (9) , 6369-6377. https://doi.org/10.1021/acs.cgd.3c00329
    3. Yake Wang, Jundi Yuan, Jinping Chen, Yi Zeng, Tianjun Yu, Xudong Guo, Shuangqing Wang, Guoqiang Yang, Yi Li. A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography. ACS Omega 2023, 8 (13) , 12173-12182. https://doi.org/10.1021/acsomega.2c08112
    4. Paul Iacomi, Guillaume Maurin. ResponZIF Structures: Zeolitic Imidazolate Frameworks as Stimuli-Responsive Materials. ACS Applied Materials & Interfaces 2021, 13 (43) , 50602-50642. https://doi.org/10.1021/acsami.1c12403
    5. Supriya Ghosh, Hwanhui Yun, Prashant Kumar, Sabrina Conrad, Michael Tsapatsis, K. Andre Mkhoyan. Two Distinct Stages of Structural Modification of ZIF-L MOF under Electron-Beam Irradiation. Chemistry of Materials 2021, 33 (14) , 5681-5689. https://doi.org/10.1021/acs.chemmater.1c01332
    6. Rong Wu, Ming Luo, Lifei Liu, Lei Liu, Weizhen Zhao, Wen‐Hua Sun. Structural investigation of zinc‐based photoresists with different substituents for high‐resolution lithography. Applied Organometallic Chemistry 2023, 37 (8) https://doi.org/10.1002/aoc.7158
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    11. Artem K. Grebenko, Konstantin A. Motovilov, Anton V. Bubis, Albert G. Nasibulin. Gentle Patterning Approaches toward Compatibility with Bio‐Organic Materials and Their Environmental Aspects. Small 2022, 18 (22) https://doi.org/10.1002/smll.202200476
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