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Nonlinear Fano-Resonant Dielectric Metasurfaces

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Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, Tennessee 37212, United States
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, Tennessee 37212, United States
§ Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
Department of Mechanical Engineering, Vanderbilt University, Nashville, Tennessee 37212, United States
Cite this: Nano Lett. 2015, 15, 11, 7388–7393
Publication Date (Web):October 26, 2015
https://doi.org/10.1021/acs.nanolett.5b02802
Copyright © 2015 American Chemical Society

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    Abstract

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    Strong nonlinear light–matter interaction is highly sought-after for a variety of applications including lasing and all-optical light modulation. Recently, resonant plasmonic structures have been considered promising candidates for enhancing nonlinear optical processes due to their ability to greatly enhance the optical near-field; however, their small mode volumes prevent the inherently large nonlinear susceptibility of the metal from being efficiently exploited. Here, we present an alternative approach that utilizes a Fano-resonant silicon metasurface. The metasurface results in strong near-field enhancement within the volume of the silicon resonator while minimizing two photon absorption. We measure a third harmonic generation enhancement factor of 1.5 × 105 with respect to an unpatterned silicon film and an absolute conversion efficiency of 1.2 × 10–6 with a peak pump intensity of 3.2 GW cm–2. The enhanced nonlinearity, combined with a sharp linear transmittance spectrum, results in transmission modulation with a modulation depth of 36%. The modulation mechanism is studied by pump–probe experiments.

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    • Sample fabrication, the measurement setup, numerical modeling, and Figures S1–S7 (PDF)

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