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Al2O3-Induced Sub-Gap Doping on the IGZO Channel for the Detection of Infrared Light
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    Al2O3-Induced Sub-Gap Doping on the IGZO Channel for the Detection of Infrared Light
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    • Jaeun Kim
      Jaeun Kim
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
      More by Jaeun Kim
    • Tae Hyeon Kim
      Tae Hyeon Kim
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
    • Seyoung Oh
      Seyoung Oh
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
      More by Seyoung Oh
    • Jae Hyeon Nam
      Jae Hyeon Nam
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
    • Hye Yeon Jang
      Hye Yeon Jang
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
    • Yonghun Kim
      Yonghun Kim
      Materials Center for Energy Convergence, Surface Technology Division, Korea Institute of Materials Science (KIMS), 797 Changwondaero, Sungsan-gu, Changwon, Gyeongnam 51508, Republic of Korea
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    • Naohito Yamada
      Naohito Yamada
      Graduate School of Chemical Sciences and Engineering, Hokkaido University, Sapporo 060-8628, Japan
    • Hikaru Kobayashi
      Hikaru Kobayashi
      Graduate School of Chemical Sciences and Engineering, Hokkaido University, Sapporo 060-8628, Japan
    • So-Young Kim
      So-Young Kim
      Center for Emerging Electronic Devices and Systems, Gwangju Institute of Science and Technology, Cheomdan-gwagiro 123, Buk-gu, Gwangju 61005, Korea
      School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Cheomdan-gwagiro 123, Buk-gu, Gwangju 61005, Korea
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    • Byoung Hun Lee
      Byoung Hun Lee
      Center for Emerging Electronic Devices and Systems, Gwangju Institute of Science and Technology, Cheomdan-gwagiro 123, Buk-gu, Gwangju 61005, Korea
      School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Cheomdan-gwagiro 123, Buk-gu, Gwangju 61005, Korea
    • Hiroki Habazaki
      Hiroki Habazaki
      Graduate School of Chemical Sciences and Engineering, Hokkaido University, Sapporo 060-8628, Japan
      Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido 060-8628, Japan
    • Woojin Park*
      Woojin Park
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
      *Email: [email protected]
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    • Byungjin Cho*
      Byungjin Cho
      Department of Advanced Materials Engineering, Chungbuk National University, 1 Chungdae-ro, Seowon-gu, Cheongju, Chungbuk 28644, Republic of Korea
      *Email: [email protected]
      More by Byungjin Cho
    Other Access OptionsSupporting Information (1)

    ACS Applied Electronic Materials

    Cite this: ACS Appl. Electron. Mater. 2020, 2, 5, 1478–1483
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    https://doi.org/10.1021/acsaelm.0c00228
    Published May 4, 2020
    Copyright © 2020 American Chemical Society

    Abstract

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    Wide band gap oxide materials with additional infrared (IR) photosensing have rarely been reported because of the lack of the IR-associated sub band gap absorption. In this work, we report that the insertion of a thin aluminum oxide (Al2O3) layer between the Al electrode and indium gallium zinc oxide (IGZO) channel, deposited by atomic layer deposition, enables the material to absorb 850 nm IR light as well as light at visible wavelengths (400 and 530 nm). UV–visible absorption and photoluminescence measurements showed that the Al2O3/IGZO-stacked channel layers could induce additional IR absorption and, consequently, IR-excited charge carriers owing to sub-gap doping within the IGZO band gap. Notably, this approach provides the synergetic effect of enabling IR detection as well as improving the contact properties in the IGZO transistor. Furthermore, the clear dynamic photoswitching behavior was observed only for the Al2O3/IGZO transistor device, revealing a photocurrent 50 times higher than the device containing only IGZO. Thus, the simple approach of engineering the interface of wide band gap oxide materials made it possible to introduce unexpected dual-band gap photosensing characteristics, thereby extending the range of photonic applications of these materials.

    Copyright © 2020 American Chemical Society

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    Supporting Information

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    The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsaelm.0c00228.

    • AES elemental depth profile of the IGZO only sample without the Al2O3 layer, AFM surface morphology images of bare IGZO and Al2O3/IGZO films, extraction method of series resistance, transfer characteristics of the IGZO transistor and Al2O3/IGZO transistor under various light intensities (0.5–4.0 mW/cm2), transfer curves and photocurrent depending on Al2O3 thickness, PL spectra of IGZO and Al2O3/IGZO films in the IR range, and schematic of the energy band diagram of IGZO with Al2O3-induced energy states (PDF)

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    Cited By

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    This article is cited by 20 publications.

    1. Anamika Sen, Heekyeong Park, Pavan Pujar, Arindam Bala, Haewon Cho, Na Liu, Srinivas Gandla, Sunkook Kim. Probing the Efficacy of Large-Scale Nonporous IGZO for Visible-to-NIR Detection Capability: An Approach toward High-Performance Image Sensor Circuitry. ACS Nano 2022, 16 (6) , 9267-9277. https://doi.org/10.1021/acsnano.2c01773
    2. Hongwei Xu, Taikyu Kim, HeeSung Han, Min Jae Kim, Jae Seok Hur, Cheol Hee Choi, Joon-Hyuk Chang, Jae Kyeong Jeong. High-Performance Broadband Phototransistor Based on TeOx/IGTO Heterojunctions. ACS Applied Materials & Interfaces 2022, 14 (2) , 3008-3017. https://doi.org/10.1021/acsami.1c18576
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    ACS Applied Electronic Materials

    Cite this: ACS Appl. Electron. Mater. 2020, 2, 5, 1478–1483
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acsaelm.0c00228
    Published May 4, 2020
    Copyright © 2020 American Chemical Society

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