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Site-Selective Deposition of a Cobalt Cocatalyst onto a Plasmonic Au/TiO2 Photoanode for Improved Water Oxidation

  • Megumi Okazaki
    Megumi Okazaki
    Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
    Japan Society for the Promotion of Science, Kojimachi Business Center Building, 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083, Japan
  • Yoshiki Suganami
    Yoshiki Suganami
    Research Institute for Electronic Science, Hokkaido University, North-21 West-10, Kita-ku, Sapporo 001-0021, Japan
  • Naoki Hirayama
    Naoki Hirayama
    Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
  • Hiroko Nakata
    Hiroko Nakata
    Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
  • Tomoya Oshikiri
    Tomoya Oshikiri
    Research Institute for Electronic Science, Hokkaido University, North-21 West-10, Kita-ku, Sapporo 001-0021, Japan
  • Toshiyuki Yokoi
    Toshiyuki Yokoi
    Nanospace Catalysis Unit, Institute of Innovative Research, Tokyo Institute of Technology, 4259-S2-5, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Hiroaki Misawa*
    Hiroaki Misawa
    Research Institute for Electronic Science, Hokkaido University, North-21 West-10, Kita-ku, Sapporo 001-0021, Japan
    Center for Emergent Functional Matter Science, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
    *(H.M.) Email: [email protected]
  • , and 
  • Kazuhiko Maeda*
    Kazuhiko Maeda
    Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
    *(K.M.) Email: [email protected]
Cite this: ACS Appl. Energy Mater. 2020, 3, 6, 5142–5146
Publication Date (Web):May 27, 2020
https://doi.org/10.1021/acsaem.0c00857

Copyright © 2020 American Chemical Society. This publication is licensed under CC-BY-NC-ND.

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Abstract

Plasmonic Au/TiO2 thin film works as a stable water oxidation photoanode. Here we show that site-selective deposition of nanosized CoOx as a water oxidation cocatalyst at the edge of Au nanoparticles on the TiO2 film improves the photoelectrochemical water oxidation activity. The nanosized CoOx was deposited by a photoassisted electrochemical method onto the Au/TiO2 thin film. The CoOx loading amount was controllable by changing the amount of electric charge that flowed during the deposition, which influenced the photoelectrochemical performance. Under visible light, the optimized CoOx/Au/TiO2 thin film generated stable photoanodic current, which was ∼3 times higher than that obtained using Au/TiO2.

Photoanode materials that are active for water oxidation under visible light play a vital role in constructing artificial photosynthetic schemes such as overall water splitting, (1,2) and CO2/N2 fixation systems. (3−5) Sensitization of a wide-gap metal oxide with a “catalytic photosensitizer” that simultaneously functions as a light-absorbing center and a water oxidation catalyst is an effective approach that enables one to obtain a visible-light-absorbing photoanode material for water oxidation. (1,5,6)

Among them, nanosized plasmonic metal/semiconductor hybrid systems are of particular interest, as they can utilize a wide range of visible light and near-infrared light owing to their light-harvesting effect induced by localized surface plasmon resonance (LSPR) of metal nanoparticles. (7,8) Of course, plasmonic metal nanoparticles not only serve as light-absorbing units but also promote plasmon-induced charge separation at the metal/semiconductor interface, followed by reduction/oxidation reactions. (9,10) For example, Au-loaded metal oxide thin films (e.g., TiO2 and SrTiO3) have been shown to function as stable photoanodes for water oxidation under irradiation of light with wavelength longer than 550 nm in the presence of an (electro)chemical bias without noticeable degradation of activity. (11,12) The use of a TiO2 photonic crystal or nanotunnels as scaffolds of Au nanoparticles has been shown to improve the efficiency. (13−15)

However, one of the biggest issues in the LSPR-based photosystem is the very short lifetime of plasmon-induced hot carriers. (16−18) Also, hot electrons injected into the conduction band of an adjacent semiconductor should move to an external circuit without recombination with hot holes existing in the plasmonic metal and/or surface states of TiO2. Therefore, prompt spatial separation of the hot holes is a straightforward way to improve the plasmon-induced charge separation efficiency, which will eventually contribute to more efficient water oxidation. Several attempts have been made to improve the consumption of hot holes by introducing a water oxidation promoter such as nanoparticulate cobalt or iridium species. (19−21)

Recently, Murakoshi et al. have visualized the active sites for plasmon-induced electron transfer reaction on a Au/TiO2 electrode by means of photoelectrochemical polymerization of pyrrole. (22) According to that report, the oxidative polymerization occurred at the edge of Au nanoparticles on the Au/TiO2 electrode. A subsequent report by Li et al. has also demonstrated that the active site for water oxidation over plasmonic Au/TiO2 was the interface between Au and TiO2 by means of surface photovoltage imaging with Kelvin probe force microscopy and theoretical calculations. (23) Although the localized hot holes at the Au/TiO2 interface have a strong ability to oxidize water into O2, the intrinsic catalytic property of the interfacial site for water oxidation may not be optimal. As mentioned above, introducing an additional water oxidation cocatalyst into the Au/TiO2 system has been made. (19−21) However, the distribution of the introduced water oxidation cocatalysts was uncontrolled. Moskovits et al. have developed a solar water-splitting device based on a gold nanorod array in which nanosized Pt/TiO2 and CoOx were deposited separately. (24) According to that study, CoOx on the Au nanorod was claimed to work as a water oxidation site. Nevertheless, the impact of “site-selective” deposition of a water oxidation cocatalyst onto the Au/TiO2 interface has not been investigated.

In this work, we demonstrate that site-selective deposition of a CoOx cocatalyst at the edge of Au nanoparticles on the TiO2 film is actually possible by a photoassisted electrodeposition technique. The resulting CoOx/Au/TiO2 thin film showed enhanced photoelectrochemical water oxidation performance by a factor of ∼3, as compared to Au/TiO2.

The preparation procedure of the CoOx/Au/TiO2 thin film is illustrated in Scheme 1. First, a 30 nm thick TiO2 layer was formed by an atomic layer deposition (ALD) technique on a FTO substrate. We chose an ALD method for the preparation of a TiO2 support layer, because the planar morphology of the ALD-derived oxide should be convenient for analyzing the morphological characteristics of Au and CoOx that are located on TiO2. Then, a 12 nm thick Au layer was deposited on the TiO2 film by vapor deposition, followed by annealing at 573 K in air to generate Au nanoparticle islands. Finally, CoOx was loaded on the Au/TiO2 thin film by a photoelectrochemical deposition method. The quantity of cobalt deposited was controlled with respect to the photocurrent that flowed during the photodeposition. Unless otherwise stated, the amount of electron that flowed during the preparation was ∼1.0 × 10–4 C. The detail can be found in the Supporting Information.

Scheme 1

Scheme 1. Preparation of CoOx-Deposited Au/TiO2 Photoanode

The deposition of TiO2 on FTO and Au on TiO2/FTO was confirmed by X-ray photoelectron spectroscopy (XPS), as shown in Supporting Information Figure S1. The crystal phase of the deposited TiO2 was mainly rutile, as indicated by Raman spectroscopy (Figure S2). However, XPS measurement did not detect any clear signal of cobalt species despite 200 times scans with several electrode samples, suggesting that the concentration of deposited cobalt on Au/TiO2/FTO was very low. Inductively coupled plasma–mass spectrometry (ICP-MS) analysis indicated that the prepared film contained approximately 0.1 nmol of cobalt. Considering the photodeposition condition, cobalt species appear to be in the form of oxide and/or oxyhydroxide. (25) Therefore, we represent the deposited cobalt species as CoOx for simplicity.

Figure 1 shows extinction spectra of Au/TiO2 and CoOx/Au/TiO2. The plasmon resonance band of Au/TiO2 was confirmed in the visible-light region, which exhibited a maximum at approximately 670 nm. The maximum wavelengths were shifted to longer wavelengths (at around 700 nm) upon CoOx deposition. This red shift can be explained by a contact of CoOx with a higher refractive index than air at the edge of Au particles on TiO2. (26)

Figure 1

Figure 1. Extinction spectra of Au/TiO2 and CoOx/Au/TiO2 thin films.

The location of the CoOx introduced was investigated by high-resolution scanning electron microscopy (SEM). As shown in Figure 2, CoOx was mainly deposited at the edge of Au nanoparticles. The thickness of the CoOx deposited was increased with an increase in electric charge flow and were estimated to be approximately 6 and 10 nm, respectively, under 1.0 × 10–4 and 2.0 × 10–4 C charge flow conditions. It shows that the amount of CoOx deposited was increased with an increase in electric charge flow during the photoassisted deposition. It has been reported by previous works that hot holes should be accumulated at the interface of Au nanoparticles and TiO2 support under visible-light irradiation. (23) Therefore, it is reasonable to consider that CoOx could be successfully loaded at the edge of Au nanoparticles on the TiO2 film under plasmonic excitation with 580 nm wavelength. We also attempted energy dispersive X-ray spectroscopy measurement to visualize the existence of cobalt species in the CoOx/Au/TiO2 thin film, but the results were unsuccessful due to charge-up effect and damage of the film sample in the measurement.

Figure 2

Figure 2. SEM images of (A) Au/TiO2 and CoOx/Au/TiO2 thin films prepared with electric charge of (B) 1.0 × 10–4 and (C) 2.0 × 10–4 C, respectively. The inset images indicate their enlarged views.

The as-prepared CoOx/Au/TiO2 thin film generated clear photoresponse under visible light (λ > 450 nm) upon anodic polarization. As shown in Figure 3A, the anodic photocurrent generated from the CoOx/Au/TiO2 thin film was ∼3 times higher than that of Au/TiO2, with good stability determined by current–time curves. Unmodified TiO2 thin film had almost no ability to generate photocurrent because it could not effectively absorb visible light. Photoanode performance of the CoOx/Au/TiO2 thin film was also compared with those of Au/TiO2 and TiO2 by taking current–voltage curves. As shown in Figure S3, the CoOx/Au/TiO2 thin film again showed enhanced photoresponse, with a photocurrent onset potential of approximately −0.7 V vs Ag/AgCl, which was almost the same as that of Au/TiO2.

Figure 3

Figure 3. Photoelectrochemical performance. (A) Current–time curves for modified TiO2 thin films recorded in controlled-potential photoelectrolysis at +0.10 V vs Ag/AgCl (i.e., +1.07 V vs RHE) under visible light (λ > 450 nm) with the light intensity of 180 mW. The experiment was conducted in 0.2 M K3PO4 solution (pH 13) using the optimized CoOx/Au/TiO2 thin film anode, in which CoOx deposition was done under 1.0 × 10–4 C condition. Irradiation area: 3.0 cm–2. (B) IPCEs of the CoOx/Au/TiO2 thin film electrode recorded in aqueous 0.1 M KOH solution (pH 13) at 0 V vs Ag/AgCl as a function of the wavelength of the incident light. (C) IPCEs of the CoOx/Au/TiO2 electrodes at 580 nm as a function of the amount of electric charge flowed during the photoassited CoOx deposition. The error bars were estimated at two points using the optimal CoOx/Au/TiO2 and Au/TiO2 (CoOx-free specimen) thin films prepared at different batches.

Figure 3B shows IPCEs of the CoOx/Au/TiO2 thin film at different wavelengths. The change in IPCE recorded at different wavelengths was similar to that of the extinction spectrum (Figure 1). This means that photocurrent generation was derived from plasmonic photoexcitation. The IPCE of the CoOx/Au/TiO2 thin film was found to be sensitive to the electric charge that flowed during the photodeposition of CoOx, as shown in Figure 3C. The data point at zero electric charge corresponds to Au/TiO2. The IPCE increased with increasing electric charge flow, to reach a maximum at around 1.0 × 10–4 C, beyond which it decreased.

Thus, it was shown that the plasmonic water photooxidation was enhanced by selectively depositing a suitable concentration of CoOx cocatalyst at the edge of Au nanoparticles on the TiO2 film. However, an excess loading of CoOx, as demonstrated by SEM (Figure 2), led to lower performance, most likely due to a decrease in active surface area for water oxidation, which has been usually seen in heterogeneous (photo)catalysis. (27) The larger CoOx deposits also buried the interface between Au and TiO2, thereby hindering the migration of holes from the active Au/TiO2 interface to the external surface of CoOx through the inside. This eventually leads to the lower water oxidation performance. It is also noted that loading CoOx by an impregnation method was not as effective as the photoassisted deposition (Figure S4), most likely because the impregnation method did not provide site-selective deposition of CoOx (Figure S5). Nevertheless, the performance of the impregnated specimen was a little higher than the unmodified Au/TiO2. Therefore, the randomly deposited CoOx had the functionality as a cocatalyst to some extent, and a “catalytic sensitizer” effect of CoOx for water oxidation with a TiO2 support (6) might be also at play.

The optimized CoOx/Au/TiO2 thin film photoanode worked stably under simulated sunlight, as shown in Figure 4. This result shows that the deposited CoOx cocatalyst was stable during the photoelectrolysis of water. During the 3 h of photoelectrolysis, product analysis by gas chromatography indicated that O2 was evolved with almost no sign of deactivation. The amount of O2 evolved was similar to one-fourth of the amount of electrons passing through the external circuit. There was an induction period at the initial stage of the reaction (∼1 h) due to a time lag of gas diffusion from the solution to the gas phase, as reported in some previous works. (28,29) After irradiation was stopped, O2 evolution continued for another ∼2 h, which is further confirmation of the effect of diffusion on the gas detection. A maximum solar-to-hydrogen energy conversion efficiency was 0.052%.

Figure 4

Figure 4. Time courses of (A) O2 evolution and (B) current generation in controlled-potential photoelectrolysis at −0.31 V vs Ag/AgCl (i.e., +0.66 V vs RHE) under simulated sunlight (100 mW cm–2). The experiment was conducted in 0.2 M K3PO4 solution (pH 13) using the optimized CoOx/Au/TiO2 thin film anode. Irradiation area: 3.0 cm2. Error range of O2 detection was approximately 10%.

In conclusion, we succeeded in modifying a plasmonic Au/TiO2 film with a CoOx cocatalyst site-selectively by a photoassisted electrochemical method. The amount of the CoOx cocatalyst deposited at the interface between Au and TiO2 was controllable by changing the amount of electric charge that flowed during the photodeposition. Upon the site-selective deposition of nanosized CoOx with ∼6 nm thickness, an IPCE for water oxidation was improved by a factor of ∼3. However, deposition of >10 nm thick CoOx reduced the performance.

We have previously reported the Au film–TiO2–Au nanoparticle (ATA) water-splitting system, (30) which gives higher IPCEs (>1%) under visible light. The present method, which enabled for site-selective CoOx deposition onto the water oxidation center, could be a candidate for the improvement of IPCEs for water-splitting reaction for the ATA system as well as for other Au/semiconductor-based plasmonic artificial photosynthetic nanodevices, because the catalytic reaction of water oxidation ends the oxidation half-cycle in any of these devices. The use of TiO2 nanostructures having high surface area (13) as scaffolds of Au nanoparticles and additional CoOx may be another approach to improving efficiency. A standalone, bias-free photoelectrochemical water-splitting system can in principle be constructed using other metal oxide semiconductor supports that have more negative flat-band potential. These possibilities are currently under investigation in our groups.

Supporting Information

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The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsaem.0c00857.

  • Experimental section; additional characterization and photoelectrochemical data (Figures S1–S6) (PDF)

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Author Information

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  • Corresponding Authors
  • Authors
    • Megumi Okazaki - Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, JapanJapan Society for the Promotion of Science, Kojimachi Business Center Building, 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083, JapanOrcidhttp://orcid.org/0000-0003-1167-9453
    • Yoshiki Suganami - Research Institute for Electronic Science, Hokkaido University, North-21 West-10, Kita-ku, Sapporo 001-0021, Japan
    • Naoki Hirayama - Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
    • Hiroko Nakata - Department of Chemistry, School of Science, Tokyo Institute of Technology, 2-12-1-NE-2 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
    • Tomoya Oshikiri - Research Institute for Electronic Science, Hokkaido University, North-21 West-10, Kita-ku, Sapporo 001-0021, JapanOrcidhttp://orcid.org/0000-0002-1268-0256
    • Toshiyuki Yokoi - Nanospace Catalysis Unit, Institute of Innovative Research, Tokyo Institute of Technology, 4259-S2-5, Nagatsuta, Midori-ku, Yokohama 226-8503, JapanOrcidhttp://orcid.org/0000-0002-3315-3172
  • Notes
    The authors declare no competing financial interest.

Acknowledgments

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We acknowledge financial support from JSPS KAKENHI (Grant Nos. JP16H06441, JP19H02511, JP18H05205, JP17H01041, JP17H05245, JP17H05459, JP16H06506, JP15K04589, and JP18K05053), the Nanotechnology Platform (Hokkaido University), and the Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials (Five-Star Alliance) of MEXT (Grant Nos. 20181032 and 20191034). M.O. acknowledges support in the form of a JSPS Fellowship for Young Scientists (Grant No. JP19J21858). We thank Profs. Keigo Kamata and Michikazu Hara (Tokyo Tech) for assistance in Raman spectroscopy measurements.

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  • Abstract

    Scheme 1

    Scheme 1. Preparation of CoOx-Deposited Au/TiO2 Photoanode

    Figure 1

    Figure 1. Extinction spectra of Au/TiO2 and CoOx/Au/TiO2 thin films.

    Figure 2

    Figure 2. SEM images of (A) Au/TiO2 and CoOx/Au/TiO2 thin films prepared with electric charge of (B) 1.0 × 10–4 and (C) 2.0 × 10–4 C, respectively. The inset images indicate their enlarged views.

    Figure 3

    Figure 3. Photoelectrochemical performance. (A) Current–time curves for modified TiO2 thin films recorded in controlled-potential photoelectrolysis at +0.10 V vs Ag/AgCl (i.e., +1.07 V vs RHE) under visible light (λ > 450 nm) with the light intensity of 180 mW. The experiment was conducted in 0.2 M K3PO4 solution (pH 13) using the optimized CoOx/Au/TiO2 thin film anode, in which CoOx deposition was done under 1.0 × 10–4 C condition. Irradiation area: 3.0 cm–2. (B) IPCEs of the CoOx/Au/TiO2 thin film electrode recorded in aqueous 0.1 M KOH solution (pH 13) at 0 V vs Ag/AgCl as a function of the wavelength of the incident light. (C) IPCEs of the CoOx/Au/TiO2 electrodes at 580 nm as a function of the amount of electric charge flowed during the photoassited CoOx deposition. The error bars were estimated at two points using the optimal CoOx/Au/TiO2 and Au/TiO2 (CoOx-free specimen) thin films prepared at different batches.

    Figure 4

    Figure 4. Time courses of (A) O2 evolution and (B) current generation in controlled-potential photoelectrolysis at −0.31 V vs Ag/AgCl (i.e., +0.66 V vs RHE) under simulated sunlight (100 mW cm–2). The experiment was conducted in 0.2 M K3PO4 solution (pH 13) using the optimized CoOx/Au/TiO2 thin film anode. Irradiation area: 3.0 cm2. Error range of O2 detection was approximately 10%.

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    • Experimental section; additional characterization and photoelectrochemical data (Figures S1–S6) (PDF)


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