Toward Nonvolatile Spin–Orbit Devices: Deposition of Ferroelectric Hafnia on Monolayer Graphene/Co/HM StacksClick to copy article linkArticle link copied!
- Suzanne Lancaster*Suzanne Lancaster*Email: [email protected]NaMLab gGmbH, Nöthnitzer Strasse 64a, Dresden 01187, GermanyMore by Suzanne Lancaster
- Iciar Arnay
- Ruben Guerrero
- Adrian Gudín
- Alejandra Guedeja-MarrónAlejandra Guedeja-MarrónDepartamento de Física de Materiales and Instituto Pluridisciplinar, Universidad Complutense de Madrid, Ciudad Universitaria, Madrid 28040, SpainMore by Alejandra Guedeja-Marrón
- Jose Manuel DiezJose Manuel DiezDepartamento de Física de la Materia Condensada & Departamento de Física Aplicada & Instituto Nicolás Cabrera, Universidad Autónoma de Madrid, Madrid 28049, SpainMore by Jose Manuel Diez
- Jan Gärtner
- Alberto Anadón
- Maria VarelaMaria VarelaDepartamento de Física de Materiales and Instituto Pluridisciplinar, Universidad Complutense de Madrid, Ciudad Universitaria, Madrid 28040, SpainMore by Maria Varela
- Julio CamareroJulio CamareroDepartamento de Física de la Materia Condensada & Departamento de Física Aplicada & Instituto Nicolás Cabrera, Universidad Autónoma de Madrid, Madrid 28049, SpainMore by Julio Camarero
- Thomas MikolajickThomas MikolajickNaMLab gGmbH, Nöthnitzer Strasse 64a, Dresden 01187, GermanyInstitute of Semiconductors and Microsystems, Technische Universität Dresden, Nöthnitzer Strasse 64, Dresden 01187, GermanyMore by Thomas Mikolajick
- Paolo Perna
- Stefan SlesazeckStefan SlesazeckNaMLab gGmbH, Nöthnitzer Strasse 64a, Dresden 01187, GermanyMore by Stefan Slesazeck
Abstract

While technologically challenging, the integration of ferroelectric thin films with graphene spintronics potentially allows the realization of highly efficient, electrically tunable, nonvolatile memories through control of the interfacial spin–orbit driven interaction occurring at graphene/Co interfaces deposited on heavy metal supports. Here, the integration of ferroelectric Hf0.5Zr0.5O2 on graphene/Co/heavy metal epitaxial stacks is investigated via the implementation of several nucleation methods in atomic layer deposition. By employing in situ Al2O3 as a nucleation layer sandwiched between Hf0.5Zr0.5O2 and graphene, the Hf0.5Zr0.5O2 demonstrates a remanent polarization (2Pr) of 19.2 μC/cm2. Using an ex situ, naturally oxidized sputtered Ta layer for nucleation, we could control 2Pr via the interlayer thickness, reaching maximum values of 28 μC/cm2 with low coercive fields. Magnetic hysteresis measurements taken before and after atomic layer deposition show strong perpendicular magnetic anisotropy, with minimal deviations in the magnetization reversal pathways due to the Hf0.5Zr0.5O2 deposition process, thus pointing to a good preservation of the magnetic stack including single-layer graphene. X-ray diffraction measurements further confirm that the high-quality interfaces demonstrated in the stack remain unperturbed by the ferroelectric deposition and anneal. The proposed graphene-based ferroelectric/magnetic structures offer the strong advantages of ferroelectricity and ferromagnetism at room temperature, enabling the development of novel magneto-electric and nonvolatile in-memory spin–orbit logic architectures with low power switching.
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This article is cited by 5 publications.
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- Tetiana Zakusylo, Alberto Quintana, Veniero Lenzi, José P. B. Silva, Luís Marques, José Luís Ortolá Yano, Jike Lyu, Jordi Sort, Florencio Sánchez, Ignasi Fina. Robust multiferroicity and magnetic modulation of the ferroelectric imprint field in heterostructures comprising epitaxial Hf
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- Suzanne Lancaster, Stefan Slesazeck, Thomas Mikolajick. On the Thickness Scaling of Ferroelectric Hafnia. IEEE Transactions on Materials for Electron Devices 2024, 1 , 36-48. https://doi.org/10.1109/TMAT.2024.3423665
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