Facile Doping in Two-Dimensional Transition-Metal Dichalcogenides by UV LightClick to copy article linkArticle link copied!
- Thuc Hue Ly*Thuc Hue Ly*E-mail: [email protected]Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong, Kowloon 999077, Hong Kong, ChinaMore by Thuc Hue Ly
- Qingming DengQingming DengPhysics Department, School of Physics and Electronic Electrical Engineering & and Jiangsu Key Laboratory for Chemistry of Low-Dimensional Materials, Huaiyin Normal University, Huaian 223300, ChinaDepartment of Energy Conversion and Storage, Technical University of Denmark, Fysikvej, 2800 Kgs. Lyngby, DenmarkMore by Qingming Deng
- Manh Ha DoanManh Ha DoanIBS Center for Integrated Nanostructure Physics, Institute for Basic Science and Department of Energy Science, Sungkyunkwan University, Suwon 440-746, KoreaMore by Manh Ha Doan
- Lain-Jong LiLain-Jong LiPhysical Sciences and Engineering, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi ArabiaMore by Lain-Jong Li
- Jiong ZhaoJiong ZhaoDepartment of Applied Physics, The Hong Kong Polytechnic University, Kowloon 999077, Hong Kong, ChinaMore by Jiong Zhao
Abstract

Two-dimensional (2D) materials have been emerging as potential candidates for the next-generation materials in various technology fields. The performance of the devices based on these 2D materials depends on their intrinsic band structures as well as the extrinsic (doping) effects such as surrounding chemicals and environmental oxygen/moisture, which strongly determines their Fermi energy level. Herein, we report the UV treatments on the 2D transition-metal dichalcogenides, to controllably dope the samples without damaging the crystal structures or quenching the luminescence properties. More surprisingly, both n-type and p-type doping can be achieved depending on the initial status of the sample and the UV treatment conditions. The doping mechanisms were elaborated on the atomic scale with transmission electron microscopy and ab initio calculations. The facile doping by UV light has potential to be integrated with photolithography processes, aiming for the large-scale integrated device/circuits design and fabrications.
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