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Local Structure and Point-Defect-Dependent Area-Selective Atomic Layer Deposition Approach for Facile Synthesis of p-Cu2O/n-ZnO Segmented Nanojunctions
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    Research Article

    Local Structure and Point-Defect-Dependent Area-Selective Atomic Layer Deposition Approach for Facile Synthesis of p-Cu2O/n-ZnO Segmented Nanojunctions
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    • Claudia de Melo
      Claudia de Melo
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
      Department of Materials Science and Engineering, Saarland University, D-66123 Saarbrücken, Germany
    • Maud Jullien
      Maud Jullien
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
      More by Maud Jullien
    • Jaafar Ghanbaja
      Jaafar Ghanbaja
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
    • François Montaigne
      François Montaigne
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
    • Jean-François Pierson
      Jean-François Pierson
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
    • Flavio Soldera
      Flavio Soldera
      Department of Materials Science and Engineering, Saarland University, D-66123 Saarbrücken, Germany
    • Federica Rigoni
      Federica Rigoni
      Department of Engineering Sciences and Mathematics, Division of Materials Science, Luleå University of Technology, 971 87 Luleå, Sweden
    • Nils Almqvist
      Nils Almqvist
      Department of Engineering Sciences and Mathematics, Division of Materials Science, Luleå University of Technology, 971 87 Luleå, Sweden
    • Alberto Vomiero
      Alberto Vomiero
      Department of Engineering Sciences and Mathematics, Division of Materials Science, Luleå University of Technology, 971 87 Luleå, Sweden
    • Frank Mücklich
      Frank Mücklich
      Department of Materials Science and Engineering, Saarland University, D-66123 Saarbrücken, Germany
    • David Horwat*
      David Horwat
      Université de Lorraine, CNRS, IJL, F-54000 Nancy, France
      *E-mail: [email protected]
      More by David Horwat
    Other Access OptionsSupporting Information (1)

    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2018, 10, 43, 37671–37678
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acsami.8b12584
    Published September 27, 2018
    Copyright © 2018 American Chemical Society

    Abstract

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    Area-selective atomic layer deposition (AS-ALD) has attracted much attention in recent years due to the possibility of achieving accurate patterns in nanoscale features, which render this technique compatible with the continuous downscaling in nanoelectronic devices. The growth selectivity is achieved by starting from different materials and results (ideally) in localized growth of a single material. We propose here a new concept, more subtle and general, in which a property of the substrate is modulated to achieve localized growth of different materials. This concept is demonstrated by selective growth of high-quality metallic Cu and semiconducting Cu2O thin films, achieved by changing the type of majority point defects in the ZnO underneath film exposed to the reactive species using a patterned bilayer structure composed of highly conductive and highly resistive areas, as confirmed by transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS). The selective growth of these materials in a patterned ZnO/Al-doped ZnO substrate allows the fabrication of p-Cu2O/n-ZnO nanojunctions showing a nonlinear rectifying behavior typical of a p–n junction, as confirmed by conductive atomic force microscopy (C-AFM). This process expands the spectra of materials that can be grown in a selective manner by ALD and opens up the possibility of fabricating different architectures, taking advantage of the area-selective deposition. This offers a variety of opportunities in the field of transparent electronics, catalysis, and photovoltaics.

    Copyright © 2018 American Chemical Society

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    Supporting Information

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    The Supporting Information is available free of charge on the ACS Publications website at DOI: 10.1021/acsami.8b12584.

    • Additional characterization data and figures (SEM micrographs, X-ray photoelectron spectroscopy, and examples of Cu2O and Cu deposition in other substrates) (PDF)

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    Cited By

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    This article is cited by 18 publications.

    1. Yerila Rodríguez-Martínez, Lídice Vaillant-Roca, Jaafar Ghanbaja, Sylvie Migot, Yann Battie, Sidi Ould Saad Hamady, David Horwat. One-Step Formation of Plasmonic Cu Nanodomains in p-Type Cu2O Matrix Films for Enhanced Photoconversion of n-ZnO/p-Cu2O Heterojunctions. ACS Applied Electronic Materials 2022, 4 (11) , 5527-5537. https://doi.org/10.1021/acsaelm.2c01132
    2. Jesse Saari, Harri Ali-Löytty, Minttu Maria Kauppinen, Markku Hannula, Ramsha Khan, Kimmo Lahtonen, Lauri Palmolahti, Antti Tukiainen, Henrik Grönbeck, Nikolai V. Tkachenko, Mika Valden. Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO2. The Journal of Physical Chemistry C 2022, 126 (9) , 4542-4554. https://doi.org/10.1021/acs.jpcc.1c10919
    3. Julia D. Lenef, Jaesung Jo, Orlando Trejo, David J. Mandia, Rebecca L. Peterson, Neil P. Dasgupta. Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology. The Journal of Physical Chemistry C 2021, 125 (17) , 9383-9390. https://doi.org/10.1021/acs.jpcc.1c00429
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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2018, 10, 43, 37671–37678
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acsami.8b12584
    Published September 27, 2018
    Copyright © 2018 American Chemical Society

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