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Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates

  • Angelos Xomalis*
    Angelos Xomalis
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
    *Email: [email protected]
  • Caroline Hain
    Caroline Hain
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
    Bern University of Applied Sciences, Institute for Applied Laser, Photonics and Surface Technologies ALPS, Biel/Bienne 2502, Switzerland
    EPFL, École Polytechnique Fédérale de Lausanne, Laboratory for Photovoltaics and Thin Film Electronics, Neuchâtel 2000, Switzerland
  • Alexander Groetsch
    Alexander Groetsch
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
  • Fedor F. Klimashin
    Fedor F. Klimashin
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
  • Thomas Nelis
    Thomas Nelis
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
    Bern University of Applied Sciences, Institute for Applied Laser, Photonics and Surface Technologies ALPS, Biel/Bienne 2502, Switzerland
    More by Thomas Nelis
  • Johann Michler
    Johann Michler
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
  • , and 
  • Jakob Schwiedrzik*
    Jakob Schwiedrzik
    Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Thun 3602, Switzerland
    *Email: [email protected]
Cite this: ACS Appl. Nano Mater. 2023, 6, 5, 3388–3394
Publication Date (Web):February 22, 2023
https://doi.org/10.1021/acsanm.2c05161
Copyright © 2023 American Chemical Society

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    Abstract

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    Resist-based lithographic tools, such as electron beam (e-beam) and photolithography, drive today’s state-of-the-art nanoscale fabrication. However, the multistep nature of these processes, expensive resists, and multiple other consumables limit their potential for cost-effective nanotechnology. Here, we report a one-step, resist-free, and scalable methodology for directly structuring thin metallic films on flexible polymeric substrates via e-beam patterning. Controlling e-beam dose results in nanostructures as small as 5 nm in height with a sub-micrometer lateral resolution. We structure nanoscale thick films (100 nm) of Al, TiN, and Au on standard Kapton tape to highlight the universal use of our nanopatterning methodology. Further, we utilize direct e-beam writing to create various high-resolution biomimetic surfaces directly onto ceramic thin films. In addition, we assemble architectured mechanical metamaterials comprising crack “traps”, which confine cracks and prevent overall material/device failure. Such a resist-free lithographic tool can reduce fabrication cost dramatically and may be used for different applications varying from biomimetic and architectured metamaterials to strain-resilient flexible electronics and wearable devices.

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    The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsanm.2c05161.

    • E-beam patterning lateral resolution; patterned film cross sections; XRD film characterization and comparison with state-of-the-art nanofabrication techniques (PDF)

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    Cited By

    This article is cited by 1 publications.

    1. Zhiwen Shu, Fuhua Ye, Peng Liu, Pei Zeng, Huikang Liang, Lei Chen, Xiaoqing Zhang, Yiqin Chen, Zhichao Fan, Jianwu Yu, Huigao Duan. Programmable Nanoscale Crack Lithography for Multiscale PMMA Patterns. ACS Applied Materials & Interfaces 2023, 15 (23) , 28349-28357. https://doi.org/10.1021/acsami.3c02625

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