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Surface-Mediated Aligned Growth of Monolayer MoS2 and In-Plane Heterostructures with Graphene on Sapphire

  • Kenshiro Suenaga
    Kenshiro Suenaga
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
  • Hyun Goo Ji
    Hyun Goo Ji
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
    More by Hyun Goo Ji
  • Yung-Chang Lin
    Yung-Chang Lin
    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
  • Tom Vincent
    Tom Vincent
    National Physical Laboratory (NPL), Teddington TW11 0LW, United Kingdom
    More by Tom Vincent
  • Mina Maruyama
    Mina Maruyama
    Graduate School of Pure and Applied Sciences, University of Tsukuba, Ibaraki 305-8571, Japan
  • Adha Sukma Aji
    Adha Sukma Aji
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
  • Yoshihiro Shiratsuchi
    Yoshihiro Shiratsuchi
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
  • Dong Ding
    Dong Ding
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
    More by Dong Ding
  • Kenji Kawahara
    Kenji Kawahara
    Global Innovation Center (GIC), Kyushu University, Fukuoka 816-8580, Japan
  • Susumu Okada
    Susumu Okada
    Graduate School of Pure and Applied Sciences, University of Tsukuba, Ibaraki 305-8571, Japan
    More by Susumu Okada
  • Vishal Panchal
    Vishal Panchal
    National Physical Laboratory (NPL), Teddington TW11 0LW, United Kingdom
  • Olga Kazakova
    Olga Kazakova
    National Physical Laboratory (NPL), Teddington TW11 0LW, United Kingdom
  • Hiroki Hibino
    Hiroki Hibino
    School of Science and Technology, Kwansei Gakuin University, Hyogo 669-1337, Japan
  • Kazu Suenaga
    Kazu Suenaga
    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
    More by Kazu Suenaga
  • , and 
  • Hiroki Ago*
    Hiroki Ago
    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
    Global Innovation Center (GIC), Kyushu University, Fukuoka 816-8580, Japan
    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
    *E-mail: [email protected]
    More by Hiroki Ago
Cite this: ACS Nano 2018, 12, 10, 10032–10044
Publication Date (Web):September 20, 2018
https://doi.org/10.1021/acsnano.8b04612
Copyright © 2018 American Chemical Society
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Abstract

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Aligned growth of transition metal dichalcogenides and related two-dimensional (2D) materials is essential for the synthesis of high-quality 2D films due to effective stitching of merging grains. Here, we demonstrate the controlled growth of highly aligned molybdenum disulfide (MoS2) on c-plane sapphire with two distinct orientations, which are highly controlled by tuning sulfur concentration. We found that the size of the aligned MoS2 grains is smaller and their photoluminescence is weaker as compared with those of the randomly oriented grains, signifying enhanced MoS2–substrate interaction in the aligned grains. This interaction induces strain in the aligned MoS2, which can be recognized from their high susceptibility to air oxidation. The surface-mediated MoS2 growth on sapphire was further developed to the rational synthesis of an in-plane MoS2–graphene heterostructure connected with the predefined orientation. The in-plane epitaxy was observed by low-energy electron microscopy. Transmission electron microscopy and scanning transmission electron microscopy suggest the alignment of a zigzag edge of MoS2 parallel to a zigzag edge of the neighboring graphene. Moreover, better electrical contact to MoS2 was obtained by the monolayer graphene compared with a conventional metal electrode. Our findings deepen the understanding of the chemical vapor deposition growth of 2D materials and also contribute to the tailored synthesis as well as applications of advanced 2D heterostructures.

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The Supporting Information is available free of charge on the ACS Publications website at DOI: 10.1021/acsnano.8b04612.

  • Photographs, XPS spectra and data, additional AFM, SEM, and CLSM images, contact angle measurement, KPFM analysis, and comparison of MoS2–graphene heterostructure devices (PDF)

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Cited By


This article is cited by 24 publications.

  1. Anh Tuan Hoang, Ajit K. Katiyar, Heechang Shin, Neeraj Mishra, Stiven Forti, Camilla Coletti, Jong-Hyun Ahn. Epitaxial Growth of Wafer-Scale Molybdenum Disulfide/Graphene Heterostructures by Metal–Organic Vapor-Phase Epitaxy and Their Application in Photodetectors. ACS Applied Materials & Interfaces 2020, 12 (39) , 44335-44344. https://doi.org/10.1021/acsami.0c12894
  2. Yunjeong Hwang, Sung Gu Kang, Naechul Shin. Inherent Resistance of Seed-Mediated Grown MoSe2 Monolayers to Defect Formation. ACS Applied Materials & Interfaces 2020, 12 (30) , 34297-34305. https://doi.org/10.1021/acsami.0c05558
  3. Jingwei Wang, Yi Luo, Xiangbin Cai, Run Shi, Weijun Wang, Tianran Li, Zefei Wu, Xian Zhang, Ouwen Peng, Abbas Amini, Chunmei Tang, Kai Liu, Ning Wang, Chun Cheng. Multiple Regulation over Growth Direction, Band Structure, and Dimension of Monolayer WS2 by a Quartz Substrate. Chemistry of Materials 2020, 32 (6) , 2508-2517. https://doi.org/10.1021/acs.chemmater.9b05124
  4. Che-yu Liu, Hsien-chih Huang, Wonsik Choi, Jeongdong Kim, Kyooho Jung, Wei Sun, Nelson Tansu, Weidong Zhou, Hao-chung Kuo, Xiuling Li. Hybrid Integration of n-MoS2/p-GaN Diodes by Quasi-van der Waals Epitaxy. ACS Applied Electronic Materials 2020, 2 (2) , 419-425. https://doi.org/10.1021/acsaelm.9b00607
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  22. Yajuan Liu, Jie Yin, Yuqing Zhou, Luo Sun, Wenjin Yue, Yueming Sun, Yuqiao Wang. Tuning Electron Transport Direction through the Deposition Sequence of MoS 2 and WS 2 on Fluorine‐Doped Tin Oxide for Improved Electrocatalytic Reduction Efficiency. ChemElectroChem 2019, 6 (10) , 2737-2740. https://doi.org/10.1002/celc.201900409
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