In Situ Scanning Transmission Electron Microscopy Study of MoS2 Formation on Graphene with a Deep-Learning Framework
- Yeongdong LeeYeongdong LeeCenter for Multidimensional Carbon Materials, Institute for Basic Science (IBS), Ulsan 44919, Republic of KoreaDepartment of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of KoreaMore by Yeongdong Lee
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- Jongyeong LeeJongyeong LeeCenter for Multidimensional Carbon Materials, Institute for Basic Science (IBS), Ulsan 44919, Republic of KoreaDepartment of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of KoreaMore by Jongyeong Lee
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- Handolsam ChungHandolsam ChungCenter for Multidimensional Carbon Materials, Institute for Basic Science (IBS), Ulsan 44919, Republic of KoreaDepartment of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of KoreaMore by Handolsam Chung
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- Jaemin KimJaemin KimCenter for Multidimensional Carbon Materials, Institute for Basic Science (IBS), Ulsan 44919, Republic of KoreaDepartment of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of KoreaMore by Jaemin Kim
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- Zonghoon Lee*Zonghoon Lee*Email: [email protected]Center for Multidimensional Carbon Materials, Institute for Basic Science (IBS), Ulsan 44919, Republic of KoreaDepartment of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of KoreaMore by Zonghoon Lee
Abstract

Atomic-scale information is essential for understanding and designing unique structures and properties of two-dimensional (2D) materials. Recent developments in in situ transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM) enable research to provide abundant insights into the growth of nanomaterials. In this study, 2D MoS2 is synthesized on a suspended graphene substrate inside a TEM column through thermolysis of the ammonium tetrathiomolybdate (NH4)2MoS4 precursor at 500 °C. To avoid misinterpretation of the in situ STEM images, a deep-learning framework, DeepSTEM, is developed. The DeepSTEM framework successfully reconstructs an object function in atomic-resolution STEM imaging for accurate determination of the atomic structure and dynamic analysis. In situ STEM imaging with DeepSTEM enables observation of the edge configuration, formation, and reknitting progress of MoS2 clusters with the formation of a mirror twin boundary. The synthesized MoS2/graphene heterostructure shows various twist angles, as revealed by atomic-resolution TEM. This deep-learning framework-assisted in situ STEM imaging provides atomic information for in-depth studies on the growth and structure of 2D materials and shows the potential use of deep-learning techniques in 2D material research.
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1. Introduction
2. Results and Discussion
Figure 1

Figure 1. Structure of the DeepSTEM framework. Input images are decoded to ψ, which corresponds to the object function of the STEM image. Ir is the result of the STEM image simulation when applying the PSF to the Fourier transform of the reconstructed object function.



Figure 2

Figure 2. (a) Atomic-resolution HAADF-STEM image of MoS2 on graphene. (b) Image of the reconstructed object function. (c) Intensity profiles of the experimental HAADF-STEM image and image of reconstructed object function are plotted as solid red lines from lower left to upper right in each image. The scale bar is 0.5 nm. Mo and S atoms are represented by cyan and orange spheres.
Figure 3

Figure 3. (a–c) Atomic-resolution HAADF-STEM images showing the edge configurations. The image was taken at a temperature of 500 °C. (d–f) Images of the reconstructed object function of (a–c) showing (d) Mo-ZZ, (e) Mo-Klein, and (f) S-ZZ. The scale bar is 0.5 nm. (g–i) Schematic atomic models based on the interpretation of (d–f). Mo and S atoms are represented by cyan and yellow spheres, respectively.
Figure 4

Figure 4. Time-elapsed images of the reconstructed object function showing MoS2 formation progress on graphene with temperature holding at 500 °C. The elapsed time is shown in the lower left of each image. (a) MoSx cluster is adsorbed on the graphene substrates. (b) MoSx reconstructs the MoS2 cluster. (c) MoS2 cluster shows a truncated triangular shape with Mo-ZZ, Mo-Klein, and S-ZZ edges. The remaining MoSx clusters are denoted by white solid arrows. (d) Upside MoSx cluster transforms into MoS2. (e) Downside MoSx clusters also transformed into MoS2. The MoS2 cluster shows a triangular shape with Mo-ZZ edges. The scale bar is 0.5 nm.
Figure 5

Figure 5. (a–c) Time-elapsed images of the reconstructed object function of MoS2 reknitting progress on graphene with temperature holding at 500 °C. The elapsed time is shown in the upper left of each image. (a) MoS2 clusters have a hole with Mo-ZZ and S-ZZ edges. Mo adatoms are noted by cyan dashed circles. (b) Hole starts to reknit with diffusion and atomic reconstruction. The orange solid line in (a,b) shows the roto-translational motion of MoS2 clusters. (c) Hole has reknitted and shows a mirror twin boundary, as denoted by a red dashed box. Mo and S atoms are represented by cyan and orange spheres, respectively. The scale bar is 0.5 nm..
3. Conclusions
4. Experimental Section
4.1. Fabrication of Suspended Graphene and Drop Casting of the MoS2 Precursor
4.2. In Situ STEM and MoS2 Orientation Analysis
4.3. Training Data
Supporting Information
The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsomega.1c03002.
Fabrication of suspended graphene and drop casting of the MoS2 precursor, in situ STEM and MoS2 orientation analysis, training data, images of the in situ heating holder and chip with suspended graphene, time-elapsed HAADF-STEM images of mobile Mo atoms on graphene at 500 °C, time-elapsed HAADF-STEM images of the roto-translational motion of MoS2 on graphene at 500 °C, atomic-resolution TEM image of MoS2 clusters on graphene and histogram of misorientation angles, HAADF-STEM image of MoS2 clusters, architecture of the DeepSTEM framework and Appendix A: autoencoder (PDF)
Terms & Conditions
Most electronic Supporting Information files are available without a subscription to ACS Web Editions. Such files may be downloaded by article for research use (if there is a public use license linked to the relevant article, that license may permit other uses). Permission may be obtained from ACS for other uses through requests via the RightsLink permission system: http://pubs.acs.org/page/copyright/permissions.html.
Acknowledgments
This work was supported by the Institute for Basic Science (IBS-R019-D1).
References
This article references 51 other publications.
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- 2Hong, S.; Lee, C.-S.; Lee, M.-H.; Lee, Y.; Ma, K. Y.; Kim, G.; Yoon, S. I.; Ihm, K.; Kim, K.-J.; Shin, T. J.; Kim, S. W.; Jeon, E.-c.; Jeon, H.; Kim, J.-Y.; Lee, H.-I.; Lee, Z.; Antidormi, A.; Roche, S.; Chhowalla, M.; Shin, H.-J.; Shin, H. S. Ultralow-dielectric-constant amorphous boron nitride. Nature 2020, 582, 511– 514, DOI: 10.1038/s41586-020-2375-9Google Scholar2https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXht1ClsrvK&md5=128c06c1a0b782858893c4dc68aca6e1Ultralow-dielectric-constant amorphous boron nitrideHong, Seokmo; Lee, Chang-Seok; Lee, Min-Hyun; Lee, Yeongdong; Ma, Kyung Yeol; Kim, Gwangwoo; Yoon, Seong In; Ihm, Kyuwook; Kim, Ki-Jeong; Shin, Tae Joo; Kim, Sang Won; Jeon, Eun-chae; Jeon, Hansol; Kim, Ju-Young; Lee, Hyung-Ik; Lee, Zonghoon; Antidormi, Aleandro; Roche, Stephan; Chhowalla, Manish; Shin, Hyeon-Jin; Shin, Hyeon SukNature (London, United Kingdom) (2020), 582 (7813), 511-514CODEN: NATUAS; ISSN:0028-0836. (Nature Research)Decrease in processing speed due to increased resistance and capacitance delay is a major obstacle for the down-scaling of electronics. Minimizing the dimensions of interconnects (metal wires that connect different electronic components on a chip) is crucial for the miniaturization of devices. Interconnects are isolated from each other by non-conducting (dielec.) layers. So far, research has mostly focused on decreasing the resistance of scaled interconnects because integration of dielecs. using low-temp. deposition processes compatible with complementary metal-oxide-semiconductors is tech. challenging. Interconnect isolation materials must have low relative dielec. consts. (κ values), serve as diffusion barriers against the migration of metal into semiconductors, and be thermally, chem. and mech. stable. Specifically, the International Road map for Devices and Systems recommends the development of dielecs. with κ values of less than 2 by 2028. Existing low-κ materials (such as silicon oxide derivs., org. compds. and aerogels) have κ values greater than 2 and poor thermo-mech. properties. Here, the authors report three-nanometer-thick amorphous boron nitride films with ultralow κ values of 1.78 and 1.16 (close to that of air, κ = 1) at operation frequencies of 100 kHz and 1 MHz, resp. The films are mech. and elec. robust, with a breakdown strength of 7.3 MV per cm, which exceeds requirements. Cross-sectional imaging reveals that amorphous boron nitride prevents the diffusion of cobalt atoms into silicon under very harsh conditions, in contrast to ref. barriers. The results demonstrate that amorphous boron nitride has excellent low-κ dielec. characteristics for high-performance electronics.
- 3Lee, C.-S.; Shin, K. W.; Song, H.-J.; Park, H.; Cho, Y.; Im, D.-H.; Lee, H.; Lee, J.-H.; Won, J. Y.; Chung, J. G.; Kim, C.; Byun, K.-E.; Lee, E.-K.; Kim, Y.; Ko, W.; Lim, H. J.; Park, S.; Shin, H.-J. Fabrication of Metal/Graphene Hybrid Interconnects by Direct Graphene Growth and Their Integration Properties. Adv. Electron. Mater. 2018, 4, 1700624, DOI: 10.1002/aelm.201700624Google ScholarThere is no corresponding record for this reference.
- 4Lo, C.-L.; Helfrecht, B. A.; He, Y.; Guzman, D. M.; Onofrio, N.; Zhang, S.; Weinstein, D.; Strachan, A.; Chen, Z. Opportunities and challenges of 2D materials in back-end-of-line interconnect scaling. J. Appl. Phys. 2020, 128, 080903, DOI: 10.1063/5.0013737Google Scholar4https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXhslWqtrjM&md5=ab36ce51296e4d05d37c8169763597bfOpportunities and challenges of 2D materials in back-end-of-line interconnect scalingLo, Chun-Li; Helfrecht, Benjamin A.; He, Yanbo; Guzman, David M.; Onofrio, Nicolas; Zhang, Shengjiao; Weinstein, Dana; Strachan, Alejandro; Chen, ZhihongJournal of Applied Physics (Melville, NY, United States) (2020), 128 (8), 080903CODEN: JAPIAU; ISSN:0021-8979. (American Institute of Physics)As the challenges in continued scaling of the integrated circuit technol. escalate every generation, there is an urgent need to find viable solns. for both the front-end-of-line (transistors) and the back-end-of-line (interconnects). For the interconnect technol., it is crucial to replace the conventional barrier and liner with much thinner alternatives so that the current driving capability of the interconnects can be maintained or even improved. Due to the inherent atomically thin body thicknesses, 2D materials have recently been proposed and explored as Cu diffusion barrier alternatives. In this Perspective article, a variety of 2D materials that have been studied, ranging from graphene, h-BN, MoS2, WSe2 to TaS2, will be reviewed. Their potentials will be evaluated based on several criteria, including fundamental material properties as well as the feasibility for technol. integration. Using TaS2 as an example, we demonstrate a large set of promising properties and point out that there remain challenges in the integration aspects with a few possible solns. waiting for validation. Applications of 2D materials for other functions in Cu interconnects and for different metal types will also be introduced, including electromigration, cobalt interconnects, and radio-frequency transmission lines. (c) 2020 American Institute of Physics.
- 5Novoselov, K. S.; Mishchenko, A.; Carvalho, A.; Castro Neto, A. H. 2D materials and van der Waals heterostructures. Science 2016, 353, aac9439, DOI: 10.1126/science.aac9439Google ScholarThere is no corresponding record for this reference.
- 6Manzeli, S.; Ovchinnikov, D.; Pasquier, D.; Yazyev, O. V.; Kis, A. 2D transition metal dichalcogenides. Nat. Rev. Mater. 2017, 2, 17033, DOI: 10.1038/natrevmats.2017.33Google Scholar6https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtVWmtr%252FO&md5=83d0f2b1adaae4e8cf09dceb3597f2da2D transition metal dichalcogenidesManzeli, Sajedeh; Ovchinnikov, Dmitry; Pasquier, Diego; Yazyev, Oleg V.; Kis, AndrasNature Reviews Materials (2017), 2 (2), 17033CODEN: NRMADL; ISSN:2058-8437. (Nature Publishing Group)A review. Graphene is very popular because of its many fascinating properties, but its lack of an electronic bandgap has stimulated the search for 2D materials with semiconducting character. Transition metal dichalcogenides (TMDCs), which are semiconductors of the type MX2, where M is a transition metal atom (such as Mo or W) and X is a chalcogen atom (such as S, Se or Te), provide a promising alternative. Because of its robustness, MoS2 is the most studied material in this family. TMDCs exhibit a unique combination of at.-scale thickness, direct bandgap, strong spin-orbit coupling and favorable electronic and mech. properties, which make them interesting for fundamental studies and for applications in high-end electronics, spintronics, optoelectronics, energy harvesting, flexible electronics, DNA sequencing and personalized medicine. In this Review, the methods used to synthesize TMDCs are examd. and their properties are discussed, with particular attention to their charge d. wave, superconductive and topol. phases. The use of TMCDs in nanoelectronic devices is also explored, along with strategies to improve charge carrier mobility, high frequency operation and the use of strain engineering to tailor their properties.
- 7Novoselov, K. S.; Jiang, D.; Schedin, F.; Booth, T. J.; Khotkevich, V. V.; Morozov, S. V.; Geim, A. K. Two-dimensional atomic crystals. Proc. Natl. Acad. Sci. U.S.A. 2005, 102, 10451– 10453, DOI: 10.1073/pnas.0502848102Google Scholar7https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD2MXntVSit7g%253D&md5=1ce9e5f5eb0f7b9abb033d4a690d49c3Two-dimensional atomic crystalsNovoselov, K. S.; Jiang, D.; Schedin, F.; Booth, T. J.; Khotkevich, V. V.; Morozov, S. V.; Geim, A. K.Proceedings of the National Academy of Sciences of the United States of America (2005), 102 (30), 10451-10453CODEN: PNASA6; ISSN:0027-8424. (National Academy of Sciences)The authors report free-standing at. crystals that are strictly 2-dimensional and can be viewed as individual at. planes pulled out of bulk crystals or as unrolled single-wall nanotubes. By using micromech. cleavage, the authors prepd. and studied a variety of 2-dimensional crystals including single layers of boron nitride, graphite, several dichalcogenides, and complex oxides. These atomically thin sheets (essentially gigantic 2-dimensional mols. unprotected from the immediate environment) are stable under ambient conditions, exhibit high crystal quality, and are continuous on a macroscopic scale.
- 8Kaushik, N.; Nipane, A.; Basheer, F.; Dubey, S.; Grover, S.; Deshmukh, M. M.; Lodha, S. Schottky barrier heights for Au and Pd contacts to MoS2. Appl. Phys. Lett. 2014, 105, 113505, DOI: 10.1063/1.4895767Google Scholar8https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2cXhsFGgsrrE&md5=3ed113ebcc6a0f77d935e8432e76dcddSchottky barrier heights for Au and Pd contacts to MoS2Kaushik, Naveen; Nipane, Ankur; Basheer, Firdous; Dubey, Sudipta; Grover, Sameer; Deshmukh, Mandar M.; Lodha, SaurabhApplied Physics Letters (2014), 105 (11), 113505/1-113505/4CODEN: APPLAB; ISSN:0003-6951. (American Institute of Physics)The search of a p-type metal contact on MoS2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quant. Schottky barrier heights for Au and Pd contacts to MoS2 obtained by analyzing low temp. transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 × 104 Ω.mm, resp. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS2 bandgap. (c) 2014 American Institute of Physics.
- 9Liu, Y.; Wu, H.; Cheng, H.-C.; Yang, S.; Zhu, E.; He, Q.; Ding, M.; Li, D.; Guo, J.; Weiss, N. O.; Huang, Y.; Duan, X. Toward barrier free contact to molybdenum disulfide using graphene electrodes. Nano Lett. 2015, 15, 3030– 3034, DOI: 10.1021/nl504957pGoogle Scholar9https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXms1OisL4%253D&md5=50b222c0146ba048b1c25264cf158133Toward Barrier Free Contact to Molybdenum Disulfide Using Graphene ElectrodesLiu, Yuan; Wu, Hao; Cheng, Hung-Chieh; Yang, Sen; Zhu, Enbo; He, Qiyuan; Ding, Mengning; Li, Dehui; Guo, Jian; Weiss, Nathan O.; Huang, Yu; Duan, XiangfengNano Letters (2015), 15 (5), 3030-3034CODEN: NALEFD; ISSN:1530-6984. (American Chemical Society)Two-dimensional layered semiconductors such as molybdenum disulfide (MoS2) have attracted tremendous interest as a new class of electronic materials. However, there are considerable challenges in making reliable contacts to these atomically thin materials. Here the authors present a new strategy by using graphene as the back electrodes to achieve ohmic contact to MoS2. With a finite d. of states, the Fermi level of graphene can be readily tuned by a gate potential to enable a nearly perfect band alignment with MoS2. The authors demonstrate for the 1st time a transparent contact to MoS2 with zero contact barrier and linear output behavior at cryogenic temps. (down to 1.9 K) for both monolayer and multilayer MoS2. Benefiting from the barrier-free transparent contacts, a metal-insulator transition can be obsd. in a two-terminal MoS2 device, a phenomenon that could be easily masked by Schottky barriers found in conventional metal-contacted MoS2 devices. With further passivation by boron nitride (BN) encapsulation, the authors demonstrate a record-high extrinsic (two-terminal) field effect mobility up to 1300 cm2/(V s) in MoS2 at low temp.
- 10Shi, Y.; Zhou, W.; Lu, A.-Y.; Fang, W.; Lee, Y.-H.; Hsu, A. L.; Kim, S. M.; Kim, K. K.; Yang, H. Y.; Li, L.-J.; Idrobo, J.-C.; Kong, J. van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates. Nano Lett. 2012, 12, 2784– 2791, DOI: 10.1021/nl204562jGoogle Scholar10https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC38Xns1eksrg%253D&md5=76857c2bd3a2b0bfc20a1b63cff77836van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth TemplatesShi, Yumeng; Zhou, Wu; Lu, Ang-Yu; Fang, Wenjing; Lee, Yi-Hsien; Hsu, Allen Long; Kim, Soo Min; Kim, Ki Kang; Yang, Hui Ying; Li, Lain-Jong; Idrobo, Juan-Carlos; Kong, JingNano Letters (2012), 12 (6), 2784-2791CODEN: NALEFD; ISSN:1530-6984. (American Chemical Society)The authors present a method for synthesizing MoS2/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, a much lower growth temp. of 400 °C is required for this procedure. The chem. vapor deposition of MoS2 on the graphene surface gives rise to single cryst. hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was transported to graphene surface by a carrier gas at room temp., which was then followed by post annealing. At an elevated temp., the precursor self-assembles to form MoS2 flakes epitaxially on the graphene surface via thermal decompn. With higher amt. of precursor delivered onto the graphene surface, a continuous MoS2 film on graphene can be obtained. This simple chem. vapor deposition method provides a unique approach for the synthesis of graphene heterostructures and surface functionalization of graphene. The synthesized two-dimensional MoS2/Graphene hybrids possess great potential toward the development of new optical and electronic devices as well as a wide variety of newly synthesizable compds. for catalysts.
- 11Wang, H. W.; Skeldon, P.; Thompson, G. E.; Wood, G. C. Synthesis and characterization of molybdenum disulphide formed from ammonium tetrathiomolybdate. J. Mater. Sci. 1997, 32, 497– 502, DOI: 10.1023/a:1018538424373Google Scholar11https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK2sXot1amuw%253D%253D&md5=f6f886224697ae0d7b3686e7da65c28dSynthesis and characterization of molybdenum disulfide formed from ammonium tetrathiomolybdateWang, H. W.; Skeldon, P.; Thompson, G. E.; Wood, G. C.Journal of Materials Science (1997), 32 (2), 497-502CODEN: JMTSAS; ISSN:0022-2461. (Chapman & Hall)An investigation was carried out on the possibility of in-situ formation of MoS2 within porous anodic films on aluminum, to improve subsequent tribol. behavior, by re-anodization in thiomolybdate electrolyte. Acidification of thiomolybdate was used to simulate the conditions for formation of the sulfide at the anodic film-electrolyte interface, followed by appropriate vacuum heat treatments to study possible temp. effects on the sulfide due to either friction or Joule heating during anodizing. The products of both acidification and heat treatment, characterized by x-ray powder diffraction and SEM, were compared with those formed by direct thermal decompn. of ammonium tetrathiomolybdate crystals. The ppt. formed by acidification was mainly amorphous molybdenum trisulfide (MoS3), which on heat treatment at 450° and 850° yielded 3R-MoS2 (identified by x-ray diffraction). 3R-MoS2 also formed by the thermal decompn. of thiomolybdate crystals. Thermogravimetric and differential thermal analyses showed that the decompn. of MoS3 to MoS2 occurred at 220-370° and revealed the sequence of reaction steps. Mainly amorphous MoS3 is formed as a consequence of pH changes in the film-electrolyte interface during re-anodizing but the product is relatively easily transformed to cryst. MoS2 upon moderate heating which may occur during wear processes.
- 12Sygellou, L. An in-situ photoelectron spectroscopy study of the thermal processing of ammonium tetrathiomolybdate, (NH4)2MoS4, precursor. Appl. Surf. Sci. 2019, 476, 1079– 1085, DOI: 10.1016/j.apsusc.2019.01.193Google Scholar12https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXitlOisL0%253D&md5=0a87598a76aca73189f91c97f953599fAn in-situ photoelectron spectroscopy study of the thermal processing of ammonium tetrathiomolybdate, (NH4)2MoS4, precursorSygellou, LabriniApplied Surface Science (2019), 476 (), 1079-1085CODEN: ASUSEE; ISSN:0169-4332. (Elsevier B.V.)Nano scale molybdenum disulfide (MoS2) is a very promising material for the next generation electronics and energy storage devices. The active defect sites located at the periphery of the lattice may influence certain redox reactions, thus classifying it as an excellent non-noble metal catalyst. One effective approach to synthesize large scale MoS2 films is through simple thermolysis of (NH4)2MoS4 precursor. Herein, a combined in situ X-ray and Ultra-Violet photoelectron spectroscopies (XPS/UPS) study has been carried out to follow the evolution of at. compn., the surface chem. species and the electronic properties (Work Function and Ionization Potential) during the thermal decompn. of (NH4)2MoS4 salt in Ultra High Vacuum conditions. It was found that, up to 400C, thermal conversion of (NH4)2MoS4 salt to transient intermediates, across amorphous MoSx phase have been performed towards to MoS2 out of significant percent of sulfur active sites. The active sites have been decreased upon heating at higher temps. Assignment of the thermally evolved active species at defect sites and the correlation of surface at. concn. combined with either the Ionization Potential or the Work Function of annealed MoSx nanoflakes makes this study a knowledgeable factor of awareness through electrocatalytic properties of MoS2-based nanostructures. Acknowledgement: We acknowledge support of this work by the project "National Infrastructure in Nanotechnol., Advanced Materials and Micro-/ Nanoelectronics" (MIS 5002772) which is implemented under the Action "Reinforcement of the Research and Innovation Infrastructure", funded by the Operational Program "Competitiveness, Entrepreneurship and Innovation" (NSRF 2014-2020) and co-financed by Greece and the European Union (European Regional Development Fund).
- 13Yang, J.; Gu, Y.; Lee, E.; Lee, H.; Park, S. H.; Cho, M.-H.; Kim, Y. H.; Kim, Y.-H.; Kim, H. Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system. Nanoscale 2015, 7, 9311– 9319, DOI: 10.1039/c5nr01486gGoogle Scholar13https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXmvFarsrk%253D&md5=864547d764ee6d6b2ab033db86b659bfWafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent systemYang, Jaehyun; Gu, Yeahyun; Lee, Eunha; Lee, Hyangsook; Park, Sang Han; Cho, Mann-Ho; Kim, Yong Ho; Kim, Yong-Hoon; Kim, HyoungsubNanoscale (2015), 7 (20), 9311-9319CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)The wafer-scale synthesis of two-dimensional molybdenum disulfide (MoS2) films, with high layer-controllability and uniformity, remains a significant challenge in the fields of nano and optoelectronics. Here, we report the highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route. Formulation of a dimethylformamide-based MoS2 precursor soln. mixed with addnl. amine- and amino alc.-based solvents (n-butylamine and 2-aminoethanol) allowed for the formation of a uniform coating of MoS2 thin films over a 2 in. wafer-scale SiO2/Si substrate. In addn., facile control of the av. no. of stacking layers is demonstrated by simply manipulating the concn. of the precursor soln. Various characterization results reveal that the synthesized MoS2 film has wafer-scale homogeneity with excellent cryst. quality and a stoichiometric chem. compn. To further demonstrate possible device applications, a mostly penta-layered MoS2 thin film was integrated into a top-gated field-effect transistor as the channel layer and we also successfully transferred our films onto transparent/flexible substrates.
- 14Yang, H.; Giri, A.; Moon, S.; Shin, S.; Myoung, J.-M.; Jeong, U. Highly scalable synthesis of MoS2 thin films with precise thickness control via polymer-assisted deposition. Chem. Mater. 2017, 29, 5772– 5776, DOI: 10.1021/acs.chemmater.7b01605Google Scholar14https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtVOns7bI&md5=72552a0d0d25c0e917cf42665ac22537Highly Scalable Synthesis of MoS2 Thin Films with Precise Thickness Control via Polymer-Assisted DepositionYang, Heeseung; Giri, Anupam; Moon, Sungmin; Shin, Sangbae; Myoung, Jae-Min; Jeong, UnyongChemistry of Materials (2017), 29 (14), 5772-5776CODEN: CMATEX; ISSN:0897-4756. (American Chemical Society)The versatile applications of MoS2 thin films demand large-scale synthesis with high uniformity in thickness and compn. Among several synthetic approaches, the two-step process including soln.-based precursor coating followed by thermolysis is advantageous in terms of cost and scalability. In this study, we developed a polymer-assisted deposition process to prep. a highly scalable polymer-precursor complex thin film and apply thermolysis at a relatively low temp. without sulfurization. This process enables fine control of the precursor film, which leads to precise thickness control of the resulting MoS2 film (≥2 nm). In addn., we demonstrate the fabrication of a MoS2-based photodetector with a broad spectral response and excellent performance, as indicated by its fast response time (≤1.0 ms) and high on-off ratio (104).
- 15Zhu, Y.; Yuan, D.; Zhang, H.; Xu, T.; Sun, L. Atomic-scale insights into the formation of 2D crystals from in situ transmission electron microscopy. Nano Res. 2021, 14, 1650– 1658, DOI: 10.1007/s12274-020-3034-zGoogle ScholarThere is no corresponding record for this reference.
- 16Mishra, R.; Ishikawa, R.; Lupini, A. R.; Pennycook, S. J. Single-atom dynamics in scanning transmission electron microscopy. MRS Bull. 2017, 42, 644– 652, DOI: 10.1557/mrs.2017.187Google Scholar16https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhsVKhurnP&md5=8f06721844c52906a1f511847ba8b02bSingle-atom dynamics in scanning transmission electron microscopyMishra, Rohan; Ishikawa, Ryo; Lupini, Andrew R.; Pennycook, Stephen J.MRS Bulletin (2017), 42 (9), 644-652CODEN: MRSBEA; ISSN:0883-7694. (Cambridge University Press)The correction of aberrations in the scanning transmission electron microscope (STEM) has simultaneously improved both spatial and temporal resoln., making it possible to capture the dynamics of single atoms inside materials, and resulting in new insights into the dynamic behavior of materials. In this article, we describe the different beam-matter interactions that lead to at. excitations by transferring energy and momentum. We review recent examples of sequential STEM imaging to demonstrate the dynamic behavior of single atoms both within materials, at dislocations, at grain and interface boundaries, and on surfaces. We also discuss the effects of such dynamic behavior on material properties. We end with a summary of ongoing instrumental and algorithm developments that we anticipate will improve the temporal resoln. significantly, allowing unprecedented insights into the dynamic behavior of materials at the at. scale.
- 17Su, C.; Tripathi, M.; Yan, Q.-B.; Wang, Z.; Zhang, Z.; Hofer, C.; Wang, H.; Basile, L.; Su, G.; Dong, M.; Meyer, J. C.; Kotakoski, J.; Kong, J.; Idrobo, J.-C.; Susi, T.; Li, J. Engineering single-atom dynamics with electron irradiation. Sci. Adv. 2019, 5, eaav2252 DOI: 10.1126/sciadv.aav2252Google ScholarThere is no corresponding record for this reference.
- 18Fei, L.; Lei, S.; Zhang, W.-B.; Lu, W.; Lin, Z.; Lam, C. H.; Chai, Y.; Wang, Y. Direct TEM observations of growth mechanisms of two-dimensional MoS2 flakes. Nat. Commun. 2016, 7, 12206, DOI: 10.1038/ncomms12206Google Scholar18https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXktFyqsrY%253D&md5=9589523341bfd399219d2c4bf2420ac3Direct TEM observations of growth mechanisms of two-dimensional MoS2 flakesFei, Linfeng; Lei, Shuijin; Zhang, Wei-Bing; Lu, Wei; Lin, Ziyuan; Lam, Chi Hang; Chai, Yang; Wang, YuNature Communications (2016), 7 (), 12206CODEN: NCAOBW; ISSN:2041-1723. (Nature Publishing Group)A microscopic understanding of the growth mechanism of two-dimensional materials is of particular importance for controllable synthesis of functional nanostructures. Because of the lack of direct and insightful observations, how to control the orientation and the size of two-dimensional material grains is still under debate. Here we discern distinct formation stages for MoS2 flakes from the thermolysis of ammonium thiomolybdates using in situ transmission electron microscopy. In the initial stage (400 °C), vertically aligned MoS2 structures grow in a layer-by-layer mode. With the increasing temp. of up to 780 °C, the orientation of MoS2 structures becomes horizontal. When the growth temp. reaches 850 °C, the cryst. size of MoS2 increases by merging adjacent flakes. Our study shows direct observations of MoS2 growth as the temp. evolves, and sheds light on the controllable orientation and grain size of two-dimensional materials.
- 19Sang, X.; Li, X.; Puretzky, A. A.; Geohegan, D. B.; Xiao, K.; Unocic, R. R. Atomic Insight into Thermolysis-Driven Growth of 2D MoS2. Adv. Funct. Mater. 2019, 29, 1902149, DOI: 10.1002/adfm.201902149Google Scholar19https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXpvFels7g%253D&md5=e99d85df6f3128e103467129498ff5fcAtomic Insight into Thermolysis-Driven Growth of 2D MoS2Sang, Xiahan; Li, Xufan; Puretzky, Alexander A.; Geohegan, David B.; Xiao, Kai; Unocic, Raymond R.Advanced Functional Materials (2019), 29 (52), 1902149CODEN: AFMDC6; ISSN:1616-301X. (Wiley-VCH Verlag GmbH & Co. KGaA)Understanding and controlling the transformations of transition metal dichalcogenides (TMDs) from amorphous precursors into 2-dimensional (2D) materials is important for guiding synthesis, directing fabrication, and tailoring functional properties. Here, the combined effects of thermal energy and electron beam irradn. are explored on the structural evolution of 2-dimensional MoS2 flakes through the thermal decompn. of a (NH4)2MoS4 precursor inside an ultrahigh vacuum (10-9 Torr) scanning transmission electron microscope (STEM). The influence of reaction temp., growth substrate, and the initial precursor morphol. on the resulting 2-dimensional MoS2 flake morphol., edge structures, and point defects are explored. Although thermal decompn. occurs extremely fast at elevated temps. and is difficult to capture using current STEM techniques, electron beam irradn. can induce local transformations at lower temps., enabling direct observation and interpretation of crit. growth steps including oriented attachment and transition from single- to multilayer structures at at. resoln. An increase in the no. of layers of the MoS2 flakes from island growth is studied using electron beam irradn. These findings provide insight into the growth mechanisms and factors that control the synthesis of few-layer MoS2 flakes through thermolysis and toward the prospect of atomically precise control and growth of 2-dimensional TMDs.
- 20Kondekar, N.; Boebinger, M. G.; Tian, M.; Kirmani, M. H.; McDowell, M. T. The Effect of Nickel on MoS2 Growth Revealed with in Situ Transmission Electron Microscopy. ACS Nano 2019, 13, 7117– 7126, DOI: 10.1021/acsnano.9b02528Google Scholar20https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXpvVCntr4%253D&md5=816f0cf4b7906a170c3c3c78805bfc03The Effect of Nickel on MoS2 Growth Revealed with in Situ Transmission Electron MicroscopyKondekar, Neha; Boebinger, Matthew G.; Tian, Mengkun; Kirmani, Mohammad Hamza; McDowell, Matthew T.ACS Nano (2019), 13 (6), 7117-7126CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)MoS2 has important applications in (electro)catalysis and as a semiconductor for electronic devices. Other chem. species are commonly added to MoS2 to increase catalytic activity or to alter electronic properties through substitutional or adsorption-based doping. While ground breaking work has been devoted to detg. the at.-scale structure of MoS2 and other layered transition-metal dichalcogenides (TMDCs), there is a lack of understanding of the dynamic processes that govern the evolution of these materials during synthesis. Here, in situ transmission electron microscopy (TEM) heating, in combination with larger length scale ex situ expts., is used to investigate the effects of added Ni on the growth of MoS2 during the thermolysis of the solid-state (NH4)2MoS4 precursor. Low concns. of Ni are obsd. to cause significant differences in the MoS2 crystn. and growth process, leading to an increase in MoS2 crystal size. This is likely a result of the altered mobility of interfaces between crystals during growth. These findings demonstrate the important role of addnl. elements in controlling the evolution of TMDCs during synthesis, which should be considered when designing these materials for a variety of applications.
- 21Morgan, A. J.; Martin, A. V.; D’Alfonso, A. J.; Putkunz, C. T.; Allen, L. J. Direct exit-wave reconstruction from a single defocused image. Ultramicroscopy 2011, 111, 1455– 1460, DOI: 10.1016/j.ultramic.2011.07.005Google Scholar21https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC3MXhtF2kurnK&md5=174ec075159e4e5e80a7763c5ccbd775Direct exit-wave reconstruction from a single defocused imageMorgan, A. J.; Martin, A. V.; D'Alfonso, A. J.; Putkunz, C. T.; Allen, L. J.Ultramicroscopy (2011), 111 (9-10), 1455-1460CODEN: ULTRD6; ISSN:0304-3991. (Elsevier B.V.)We propose a direct, non-iterative method for the exact recovery of the complex wave in the exit-surface plane of a coherently illuminated object from a single defocused image. The method is applicable for a wide range of illumination conditions. The defocus range is subject to certain conditions, which if satisfied allow the complex exit-surface wave to be directly recovered by solving a set of linear equations. These linear equations, whose coeffs. depend on the incident illumination, are obtained by analyzing the autocorrelation function of an auxiliary wave which is related to the exit-surface wave in a simple way. This autocorrelation is constructed by taking the inverse Fourier transform of the defocused image. We present an exptl. proof of concept by recovering the exit-surface wave of a microfiber illuminated by a plane wave formed using a HeNe laser.
- 22Kirkland, E. J. Improved high resolution image processing of bright field electron micrographs: I. Theory. Ultramicroscopy 1984, 15, 151– 172, DOI: 10.1016/0304-3991(84)90037-8Google ScholarThere is no corresponding record for this reference.
- 23Nellist, P. D.; Pennycook, S. J. Accurate structure determination from image reconstruction in ADF STEM. J. Microsc. 1998, 190, 159– 170, DOI: 10.1046/j.1365-2818.1998.3260881.xGoogle Scholar23https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK1cXjtVGlsLo%253D&md5=62bb61825582968d645d7bc90f2f59c3Accurate structure determination from image reconstruction in ADF STEMNellist, P. D.; Pennycook, S. J.Journal of Microscopy (Oxford) (1998), 190 (1/2), 159-170CODEN: JMICAR; ISSN:0022-2720. (Blackwell Science Ltd.)Annular dark-field (ADF) imaging in a scanning transmission electron microscope results in direct structure images of the at. configuration of the specimen. Since such images are almost perfectly incoherent they can be treated as a convolution between a point-spread function, which is simply the intensity of the illuminating electron probe, and a sharply peaked object function that represents the projected structure of the specimen. Knowledge of the object function for an image region of perfect crystal allows the point-spread function to be directly detd. for that image. We examine how the object function for an image can then be reconstructed using a Wiener filter, the CLEAN algorithm and a max. entropy reconstruction. Prior information is required to perform a reconstruction, and we discuss what nature of prior information is suitable for ADF imaging.
- 24Nellist, P. D.; Pennycook, S. J. Probe and object function reconstruction in incoherent scanning transmission electron microscope imaging. Scanning Microsc. 1997, 11, 81– 90Google ScholarThere is no corresponding record for this reference.
- 25Kazubek, M. Wavelet domain image denoising by thresholding and Wiener filtering. IEEE Signal Process. Lett. 2003, 10, 324– 326, DOI: 10.1109/lsp.2003.818225Google ScholarThere is no corresponding record for this reference.
- 26Ede, J. M. Deep learning in electron microscopy. Mach. Learn.: Sci. Technol. 2021, 2, 011004, DOI: 10.1088/2632-2153/abd614Google ScholarThere is no corresponding record for this reference.
- 27Madsen, J.; Liu, P.; Kling, J.; Wagner, J. B.; Hansen, T. W.; Winther, O.; Schiøtz, J. A Deep Learning Approach to Identify Local Structures in Atomic-Resolution Transmission Electron Microscopy Images. Adv. Theory Simul. 2018, 1, 1800037, DOI: 10.1002/adts.201800037Google ScholarThere is no corresponding record for this reference.
- 28Lee, J.; Lee, Y.; Kim, J.; Lee, Z. Contrast Transfer Function-Based Exit-Wave Reconstruction and Denoising of Atomic-Resolution Transmission Electron Microscopy Images of Graphene and Cu Single Atom Substitutions by Deep Learning Framework. Nanomaterials 2020, 10, 1977, DOI: 10.3390/nano10101977Google Scholar28https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXisVemsLzI&md5=b8fa84d7a5528ff68cd4a82e0ecb5c7bContrast transfer function-based exit-wave reconstruction and denoising of atomic-resolution transmission electron microscopy images of graphene and Cu single atom substitutions by deep learning frameworkLee, Jongyeong; Lee, Yeongdong; Kim, Jaemin; Lee, ZonghoonNanomaterials (2020), 10 (10), 1977CODEN: NANOKO; ISSN:2079-4991. (MDPI AG)The exit wave is the state of a uniform plane incident electron wave exiting immediately after passing through a specimen and before the at.-resoln. transmission electron microscopy (ARTEM) image is modified by the aberration of the optical system and the incoherence effect of the electron. Although exit-wave reconstruction has been developed to prevent the misinterpretation of ARTEM images, there have been limitations in the use of conventional exit-wave reconstruction in ARTEM studies of the structure and dynamics of two-dimensional materials. In this study, we propose a framework that consists of the convolutional dual-decoder autoencoder to reconstruct the exit wave and denoise ARTEM images. We calcd. the contrast transfer function (CTF) for real ARTEM and assigned the output of each decoder to the CTF as the amplitude and phase of the exit wave. We present exit-wave reconstruction expts. with ARTEM images of monolayer graphene and compare the findings with those of a simulated exit wave. Cu single atom substitution in monolayer graphene was, for the first time, directly identified through exit-wave reconstruction expts. Our exit-wave reconstruction expts. show that the performance of the denoising task is improved when compared to the Wiener filter in terms of the signal-to-noise ratio, peak signal-to-noise ratio, and structural similarity index map metrics.
- 29Nellist, P. D.; Pennycook, S. J. The principles and interpretation of annular dark-field Z-contrast imaging. Adv. Imaging Electron Phys. 2000, 113, 147– 203, DOI: 10.1016/s1076-5670(00)80013-0Google ScholarThere is no corresponding record for this reference.
- 30Kramer, M. A. Nonlinear Principal Component Analysis Using Autoassociative Neural Networks. AlChE J. 1991, 37, 233– 243, DOI: 10.1002/aic.690370209Google Scholar30https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK3MXht1Ghsbs%253D&md5=a4e705cbc4913ffd04e6cf62c4e81aabNonlinear principal component analysis using autoassociative neural networksKramer, Mark A.AIChE Journal (1991), 37 (2), 233-43CODEN: AICEAC; ISSN:0001-1541.Nonlinear-principal-component anal. (NLPCA), is a novel technique for multivariate data anal., similar to the method of principal-component anal. (PCA). NLPCA like PCA, is used to identify and remove correlations among problem variables as an aid to dimensionality redn., visualization, and exploratory data anal. While PCA identifies only linear correlations between variables, NLPCA uncovers both linear and nonlinear correlations, without restriction on the character of the nonlinearities present in the data. NLPCA operates by training a feedforward neural network to perform the identity mapping, where the network inputs are reproduced at the output layer. The network contains an internal bottleneck layer (contg. fewer nodes than input or output layers), which forces the network to develop a compact representation of the input data and 2 addnl. hidden layers. The NLPCA method is demonstrated by using time-dependent, simulated batch-reaction data. NLPCA can reduce dimensionality and produce a feature space map resembling the actual distribution of the underlying system parameters.
- 31Zemlin, F.; Weiss, K.; Schiske, P.; Kunath, W.; Herrmann, K.-H. Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms. Ultramicroscopy 1978, 3, 49– 60, DOI: 10.1016/s0304-3991(78)80006-0Google ScholarThere is no corresponding record for this reference.
- 32Kingma, D. P.; Ba, J. Adam: A Method for Stochastic Optimization. arXiv.org, e-Print Arch., Comput. Sci.. 2014, arXiv:1412.6980.Google ScholarThere is no corresponding record for this reference.
- 33Geim, A. K.; Novoselov, K. S. The rise of graphene. Nat. Mater. 2007, 6, 183– 191, DOI: 10.1038/nmat1849Google Scholar33https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD2sXit1Khtrg%253D&md5=c2c02ce70a1725e6c559c173156568c5The rise of grapheneGeim, A. K.; Novoselov, K. S.Nature Materials (2007), 6 (3), 183-191CODEN: NMAACR; ISSN:1476-1122. (Nature Publishing Group)A review. Graphene is a rapidly rising star on the horizon of materials science and condensed-matter physics. This strictly two-dimensional material exhibits exceptionally high crystal and electronic quality, and, despite its short history, has already revealed a cornucopia of new physics and potential applications, which are briefly discussed here. Whereas one can be certain of the realness of applications only when com. products appear, graphene no longer requires any further proof of its importance in terms of fundamental physics. Owing to its unusual electronic spectrum, graphene has led to the emergence of a new paradigm of 'relativistic' condensed-matter physics, where quantum relativistic phenomena, some of which are unobservable in high-energy physics, can now be mimicked and tested in table-top expts. More generally, graphene represents a conceptually new class of materials that are only one atom thick, and, on this basis, offers new inroads into low-dimensional physics that has never ceased to surprise and continues to provide a fertile ground for applications.
- 34Li, X.; Cai, W.; An, J.; Kim, S.; Nah, J.; Yang, D.; Piner, R.; Velamakanni, A.; Jung, I.; Tutuc, E.; Banerjee, S. K.; Colombo, L.; Ruoff, R. S. Large-Area Synthesis of High-Quality and Uniform Graphene Films on Copper Foils. Science 2009, 324, 1312– 1314, DOI: 10.1126/science.1171245Google Scholar34https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD1MXms12gtbY%253D&md5=d5d5a8564d2dac69173cf0696d21eb3eLarge-Area Synthesis of High-Quality and Uniform Graphene Films on Copper FoilsLi, Xuesong; Cai, Weiwei; An, Jinho; Kim, Seyoung; Nah, Junghyo; Yang, Dongxing; Piner, Richard; Velamakanni, Aruna; Jung, Inhwa; Tutuc, Emanuel; Banerjee, Sanjay K.; Colombo, Luigi; Ruoff, Rodney S.Science (Washington, DC, United States) (2009), 324 (5932), 1312-1314CODEN: SCIEAS; ISSN:0036-8075. (American Association for the Advancement of Science)Graphene was attracting great interest because of its distinctive band structure and phys. properties. Today, graphene is limited to small sizes because it is produced mostly by exfoliating graphite. The authors grew large-area graphene films of the order of centimeters on Cu substrates by CVD using methane. The films are predominantly single-layer graphene, with a small percentage (<5%) of the area having few layers, and are continuous across Cu surface steps and grain boundaries. The low soly. of C in Cu appears to help make this growth process self-limiting. The authors also developed graphene film transfer processes to arbitrary substrates, and dual-gated field-effect transistors fabricated on Si/SiO2 substrates showed electron mobilities ≤4050 cm2/V-s at room temp.
- 35van der Zande, A. M.; Huang, P. Y.; Chenet, D. A.; Berkelbach, T. C.; You, Y.; Lee, G.-H.; Heinz, T. F.; Reichman, D. R.; Muller, D. A.; Hone, J. C. Grains and grain boundaries in highly crystalline monolayer molybdenum disulphide. Nat. Mater. 2013, 12, 554– 561, DOI: 10.1038/nmat3633Google Scholar35https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC3sXntVaqur0%253D&md5=c4789fee1f590a181e13e224eef5ef95Grains and grain boundaries in highly crystalline monolayer molybdenum disulphidevan der Zande, Arend M.; Huang, Pinshane Y.; Chenet, Daniel A.; Berkelbach, Timothy C.; You, YuMeng; Lee, Gwan-Hyoung; Heinz, Tony F.; Reichman, David R.; Muller, David A.; Hone, James C.Nature Materials (2013), 12 (6), 554-561CODEN: NMAACR; ISSN:1476-1122. (Nature Publishing Group)Recent progress in large-area synthesis of monolayer MoS2, a new 2D direct-band gap semiconductor, is paving the way for applications in atomically thin electronics. Little is known, however, about the microstructure of this material. Here we have refined chem. vapor deposition synthesis to grow highly cryst. islands of monolayer MoS2 up to 120 μm in size with optical and elec. properties comparable or superior to exfoliated samples. Using transmission electron microscopy, we correlate lattice orientation, edge morphol. and crystallinity with island shape to demonstrate that triangular islands are single crystals. The crystals merge to form faceted tilt and mirror twin boundaries that are stitched together by lines of 8- and 4-membered rings. D. functional theory reveals localized mid-gap states arising from these 8-4 defects. Mirror twin boundaries cause strong photoluminescence quenching whereas tilt boundaries cause strong enhancement. Meanwhile, mirror twin boundaries slightly increase the measured in-plane elec. cond., whereas tilt boundaries slightly decrease the cond.
- 36Xu, W.; Li, S.; Zhou, S.; Lee, J. K.; Wang, S.; Sarwat, S. G.; Wang, X.; Bhaskaran, H.; Pasta, M.; Warner, J. H. Large dendritic monolayer MoS2 grown by atmospheric pressure chemical vapor deposition for electrocatalysis. ACS Appl. Mater. Interfaces 2018, 10, 4630– 4639, DOI: 10.1021/acsami.7b14861Google Scholar36https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhsVSjsro%253D&md5=d89b9317f1e7e8700be1245895396bf3Large Dendritic Monolayer MoS2 Grown by Atmospheric Pressure Chemical Vapor Deposition for ElectrocatalysisXu, Wenshuo; Li, Sha; Zhou, Si; Lee, Ja Kyung; Wang, Shanshan; Sarwat, Syed Ghazi; Wang, Xiaochen; Bhaskaran, Harish; Pasta, Mauro; Warner, Jamie H.ACS Applied Materials & Interfaces (2018), 10 (5), 4630-4639CODEN: AAMICK; ISSN:1944-8244. (American Chemical Society)The edge sites of MoS2 are catalytically active for the H evolution reaction (HER), and growing monolayer structures that are edge-rich is desirable. Here, the authors show the prodn. of large-area highly branched MoS2 dendrites on amorphous SiO2/Si substrates using an atm. pressure CVD and explore their use in electrocatalysis. By tailoring the substrate construction, the monolayer MoS2 evolves from triangular to dendritic morphol. because of the change of growth conditions. The rough edges endow dendritic MoS2 with a fractal dimension down to 1.54. The highly cryst. basal plane and the edge of the dendrites are visualized at at. resoln. using an annular dark field scanning transmission electron microscope. The monolayer dendrites exhibit strong photoluminescence, which is indicative of the direct band gap emission, which is preserved after being transferred. Post-transfer S annealing restores the structural defects and decreases the n-type doping in MoS2 monolayers. The annealed MoS2 dendrites show good and highly durable HER performance on the glassy C with a large exchange c.d. of 32 μA cmgeo-2, demonstrating its viability as an efficient HER catalyst.
- 37Schweiger, H.; Raybaud, P.; Kresse, G.; Toulhoat, H. Shape and edge sites modifications of MoS2 catalytic nanoparticles induced by working conditions: A theoretical study. J. Catal. 2002, 207, 76– 87, DOI: 10.1006/jcat.2002.3508Google Scholar37https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD38Xit1yjt78%253D&md5=ef9f184753087174cd18e2f4479a0fc2Shape and Edge Sites Modifications of MoS2 Catalytic Nanoparticles Induced by Working Conditions: A Theoretical StudySchweiger, Hannes; Raybaud, Pascal; Kresse, Georg; Toulhoat, HerveJournal of Catalysis (2002), 207 (1), 76-87CODEN: JCTLA5; ISSN:0021-9517. (Academic Press)Detn. of the morphol. and electronic properties of single-layer nanosize MoS2 particles is of considerable interest for a better understanding of the active phase of hydrotreating catalysts. We propose an original approach, based on d. functional calcns. applied to various types of MoS2 clusters contg. up to 200 atoms, to evaluate accurately the surface energies of the Mo-edge and S-edge terminated surfaces. The results are expressed as a function of the chem. potential of sulfur, which is in turn controlled by the temp. and the ratio of partial pressures of H2S and H2. Gibbs-Curie-Wulff equil. morphologies reveal that a high chem. potential of sulfur leads to triangular-shaped particles terminated by the Mo-edge surface, giving an interpretation of the observations made recently by scanning tunneling microscopy (STM). Simulations of the STM images for the most stable clusters reveal a qual. good agreement with expts. Moreover, our approach predicts that varying the potential of sulfur modifies the local Mo-edge structure and the shape of the nanoparticles. Finally, the thermodn. diagram for a MoS2 particle with a realistic size shows that the creation of one sulfur vacancy at the corner and on the edge is possible under HDS working conditions. (c) 2002 Academic Press.
- 38Zhu, D.; Shu, H.; Jiang, F.; Lv, D.; Asokan, V.; Omar, O.; Yuan, J.; Zhang, Z.; Jin, C. Capture the growth kinetics of CVD growth of two-dimensional MoS2. npj 2D Mater. Appl. 2017, 1, 8, DOI: 10.1038/s41699-017-0010-xGoogle ScholarThere is no corresponding record for this reference.
- 39Pan, H.; Zhang, Y.-W. Edge-dependent structural, electronic and magnetic properties of MoS2 nanoribbons. J. Mater. Chem. 2012, 22, 7280– 7290, DOI: 10.1039/c2jm15906fGoogle Scholar39https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC38Xkt1Clu7c%253D&md5=ce0224bf38f5053396c98f23ee9c91c5Edge-dependent structural, electronic and magnetic properties of MoS2 nanoribbonsPan, Hui; Zhang, Yong-WeiJournal of Materials Chemistry (2012), 22 (15), 7280-7290CODEN: JMACEP; ISSN:0959-9428. (Royal Society of Chemistry)Two-dimensional materials have various applications in next-generation nanodevices because of their easy fabrication and particular properties. In this work, we studied the effects of edge structures on the edge stability, and electronic and magnetic properties of MoS2 nanoribbons by first-principles calcns. We predicted that S-terminated zigzag nanoribbons are the most stable even without hydrogen satn. because of their low and neg. edge energies, although hydrogen satn. of the edge states can stabilize other nanoribbons with different edge structures. MoS2 zigzag nanoribbons are metallic and ferromagnetic. Importantly, their cond. may be semiconducting (n- or p-type) or half metallic by controlling the edge structures satd. with H atoms. The magnetic states of the MoS2 zigzag nanoribbons are enhanced by H-satn. and are much stronger than those of graphene zigzag nanoribbons. The armchair nanoribbons are semiconducting, with bandgaps increased by the hydrogen satn. of their edge states, and are nonmagnetic. These MoS2 nanoribbons with versatile functions may have applications in spintronics, nanodevices, and energy harvesting.
- 40Wang, L.; Zhou, X.; Ma, T.; Liu, D.; Gao, L.; Li, X.; Zhang, J.; Hu, Y.; Wang, H.; Dai, Y.; Luo, J. Superlubricity of a graphene/MoS2 heterostructure: a combined experimental and DFT study. Nanoscale 2017, 9, 10846– 10853, DOI: 10.1039/c7nr01451aGoogle Scholar40https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtV2qt77J&md5=cfa5e393dfd5ead15667e6111f62d22eSuperlubricity of a graphene/MoS2 heterostructure: a combined experimental and DFT studyWang, Linfeng; Zhou, Xiang; Ma, Tianbao; Liu, Dameng; Gao, Lei; Li, Xin; Zhang, Jun; Hu, Yuanzhong; Wang, Hui; Dai, Yadong; Luo, JianbinNanoscale (2017), 9 (30), 10846-10853CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)Graphene and other two-dimensional materials have been proved to be able to offer low friction. Here we assembled van der Waals heterostructures with graphene and molybdenum disulfide monolayers. The Raman spectrum together with a modified linear chain model indicate a two-orders-of-magnitude decrease in the interlayer lateral force const., as compared with their homogeneous bilayers, indicating a possible routine to achieve superlubricity. The decrease in the interlayer lateral force const. is consistent with the ultrasmall potential energy corrugation during sliding, which is derived from d. functional theory calcns. The potential energy corrugation is found to be detd. by the sliding-induced interfacial charge d. fluctuation, suggesting a new perspective to understand the phys. origin of the at. scale friction of two-dimensional materials.
- 41Batzill, M. Mirror twin grain boundaries in molybdenum dichalcogenides. J. Phys.: Condens. Matter 2018, 30, 493001, DOI: 10.1088/1361-648x/aae9cfGoogle Scholar41https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXktFCksbo%253D&md5=2a1966747095ef0b7bed7620b49c58f7Mirror twin grain boundaries in molybdenum dichalcogenidesBatzill, MatthiasJournal of Physics: Condensed Matter (2018), 30 (49), 493001/1-493001/15CODEN: JCOMEL; ISSN:0953-8984. (IOP Publishing Ltd.)A review. Mirror twin grain boundaries (MTBs) exist at the interface between 2 grains of 60° rotated hexagonal transition metal dichalcogenides (TMDC). These grain boundaries form a regular at. structure that extends in one dimension and thus may be described as a one-dimensional (1D) lattice embedded in the 2-dimensional TMDC. In this review, the different at. structures and compns. of these MTBs are discussed. The obvious formation of MTBs is by coalescence of 2 twinned grains. However, in MoSe2 and MoTe2 a different formation mechanism was revealed for the formation of Mo-rich MTBs. Excess Mo can be incorporated into the TMDC lattices. These excess Mo atoms can then reorganize into closed, triangular MTB-loops that can grow in size by adding more Mo atoms to them. This mechanism gave dense MTB networks in MoSe2 and MoTe2. Such MTB networks were obsd. in samples grown by MBE and consequently their presence needs to be considered in understanding the properties of MBE grown MoSe2 and MoTe2. D. functional theory as well as photoemission spectroscopy of MTB networks showed that MTBs exhibit dispersing 1-dimensional-bands that intersect the Fermi-level, thus suggesting that these are 1-dimensional electron systems. Consequently, exptl. data were interpreted to reveal a charge d. wave (or Peierls) instability, as well as a Tomonaga-Luttinger liq. behavior for electrons confined in 1D. These observations and the controversies that remain in the interpretation of some data are discussed. The metallic properties of the MTBs and their formation in dense networks also sparked the potential use of such crystal modifications for making metallic contacts to MoTe2 or MoSe2. Also, these crystal modifications may also boost the catalytic properties of these materials.
- 42Kim, J. H.; Kim, S. Y.; Park, S. O.; Jung, G. Y.; Song, S.; Sohn, A.; Kim, S. W.; Kwak, S. K.; Kwon, S. Y.; Lee, Z. Antiphase Boundaries as Faceted Metallic Wires in 2D Transition Metal Dichalcogenides. Adv. Sci. 2020, 7, 2000788, DOI: 10.1002/advs.202000788Google Scholar42https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXis1Cktb7L&md5=556ffb35c07f678cc3eb95874ef730d5Antiphase Boundaries as Faceted Metallic Wires in 2D Transition Metal DichalcogenidesKim, Jung Hwa; Kim, Se-Yang; Park, Sung O.; Jung, Gwan Yeong; Song, Seunguk; Sohn, Ahrum; Kim, Sang-Woo; Kwak, Sang Kyu; Kwon, Soon-Yong; Lee, ZonghoonAdvanced Science (Weinheim, Germany) (2020), 7 (15), 2000788CODEN: ASDCCF; ISSN:2198-3844. (Wiley-VCH Verlag GmbH & Co. KGaA)Antiphase boundaries (APBs) in 2D transition metal dichalcogenides have attracted wide interest as 1D metallic wires embedded in a semiconducting matrix, which could be exploited in fully 2D-integrated circuits. Here, the anisotropic morphologies of APBs (i.e., linear and saw-toothed APBs) in the nanoscale are investigated. The exptl. and computational results show that despite their anisotropic nanoscale morphologies, all APBs adopt a predominantly chalcogen-oriented dense structure to maintain the energetically most stable at. configuration. Moreover, the effect of the nanoscale morphol. of an APB on electron transport from two-probe field effect transistor measurements is investigated. A saw-toothed APB has a considerably lower electron mobility than a linear APB, indicating that kinks between facets are the main factors of scattering. The observations contribute to the systematical understanding of the faceted APBs and its impact on elec. transport behavior and it could potentially extend the applications of 2D materials through defect engineering to achieve the desired properties.
- 43Zhou, S.; Wang, S.; Shi, Z.; Sawada, H.; Kirkland, A. I.; Li, J.; Warner, J. H. Atomically sharp interlayer stacking shifts at anti-phase grain boundaries in overlapping MoS2 secondary layers. Nanoscale 2018, 10, 16692– 16702, DOI: 10.1039/c8nr04486dGoogle Scholar43https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhs1WhsbzK&md5=a52c08deea4733d2f50250ba1ef630b5Atomically sharp interlayer stacking shifts at anti-phase grain boundaries in overlapping MoS2 secondary layersZhou, Si; Wang, Shanshan; Shi, Zhe; Sawada, Hidetaka; Kirkland, Angus I.; Li, Ju; Warner, Jamie H.Nanoscale (2018), 10 (35), 16692-16702CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)When secondary domains nucleate and grow on the surface of monolayer MoS2, they can extend across grain boundaries in the underlying monolayer MoS2 and form overlapping sections. We present an at. level study of overlapping antiphase grain boundaries (GBs) in MoS2 monolayer-bilayers using aberration-cor. annular dark field scanning transmission electron microscopy. In particular we focus on the antiphase GB within a monolayer and track its propagation through an overlapping bilayer domain. We show that this leads to an atomically sharp interface between 2H and 3R interlayer stacking in the bilayer region. We have studied the micro-nanoscale "meandering" of the antiphase GB in MoS2, which shows a directional dependence on the d. of 4 and 8 member ring defects, as well as sharp turning angles 90°-100° that are mediated by a special 8-member ring defect. D. functional theory has been used to explore the overlapping interlayer stacking around the antiphase GBs, confirming our exptl. findings. These results show that overlapping secondary bilayer MoS2 domains cause at. structure modification to underlying anti-phase GB sites to accommodate the van der Waals interactions.
- 44Du, L.; Yu, H.; Liao, M.; Wang, S.; Xie, L.; Lu, X.; Zhu, J.; Li, N.; Shen, C.; Chen, P.; Yang, R.; Shi, D.; Zhang, G. Modulating PL and electronic structures of MoS2/graphene heterostructures via interlayer twisting angle. Appl. Phys. Lett. 2017, 111, 263106, DOI: 10.1063/1.5011120Google Scholar44https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhvVektQ%253D%253D&md5=6f7dcf199e5633941c0ce80a9307c318Modulating PL and electronic structures of MoS2/graphene heterostructures via interlayer twisting angleDu, Luojun; Yu, Hua; Liao, Mengzhou; Wang, Shuopei; Xie, Li; Lu, Xiaobo; Zhu, Jianqi; Li, Na; Shen, Cheng; Chen, Peng; Yang, Rong; Shi, Dongxia; Zhang, GuangyuApplied Physics Letters (2017), 111 (26), 263106/1-263106/5CODEN: APPLAB; ISSN:0003-6951. (American Institute of Physics)Stacking two-dimensional materials into van der Waals heterostructures with distinct interlayer twisting angles opens up new strategies for electronic structure and phys. property engineering. Here, we investigate how the interlayer twisting angles affect the photoluminescence (PL) and Raman spectra of the MoS2/graphene heterostructures. Based on a series of heterostructure samples with different interlayer twisting angles, we found that the PL and Raman spectra of the monolayer MoS2 in these heterostructures are strongly twisting angle dependent. When the interlayer twisting angle evolves from 0° to 30°, both the PL intensity and emission energy increase, while the splitting of the E2g Raman mode decreases gradually. The obsd. phenomena are attributed to the twisting angle dependent interlayer interaction and misorientation-induced lattice strain between MoS2 and graphene. (c) 2017 American Institute of Physics.
- 45Liao, M.; Wu, Z.-W.; Du, L.; Zhang, T.; Wei, Z.; Zhu, J.; Yu, H.; Tang, J.; Gu, L.; Xing, Y.; Yang, R.; Shi, D.; Yao, Y.; Zhang, G. Twist angle-dependent conductivities across MoS2/graphene heterojunctions. Nat. Commun. 2018, 9, 4068, DOI: 10.1038/s41467-018-06555-wGoogle Scholar45https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A280%3ADC%252BB3czmtVWkug%253D%253D&md5=07735dcb7862261e9d969dd90d775bf0Twist angle-dependent conductivities across MoS2/graphene heterojunctionsLiao Mengzhou; Du Luojun; Zhang Tingting; Wei Zheng; Zhu Jianqi; Yu Hua; Tang Jian; Gu Lin; Yang Rong; Shi Dongxia; Zhang Guangyu; Liao Mengzhou; Du Luojun; Zhang Tingting; Wei Zheng; Zhu Jianqi; Yu Hua; Tang Jian; Gu Lin; Yang Rong; Shi Dongxia; Zhang Guangyu; Wu Ze-Wen; Zhang Tingting; Xing Yanxia; Yao Yugui; Yang Rong; Shi Dongxia; Zhang Guangyu; Zhang GuangyuNature communications (2018), 9 (1), 4068 ISSN:.Van der Waals heterostructures stacked from different two-dimensional materials offer a unique platform for addressing many fundamental physics and construction of advanced devices. Twist angle between the two individual layers plays a crucial role in tuning the heterostructure properties. Here we report the experimental investigation of the twist angle-dependent conductivities in MoS2/graphene van der Waals heterojunctions. We found that the vertical conductivity of the heterojunction can be tuned by ∼5 times under different twist configurations, and the highest/lowest conductivity occurs at a twist angle of 0°/30°. Density functional theory simulations suggest that this conductivity change originates from the transmission coefficient difference in the heterojunctions with different twist angles. Our work provides a guidance in using the MoS2/graphene heterojunction for electronics, especially on reducing the contact resistance in MoS2 devices as well as other TMDCs devices contacted by graphene.
- 46Büch, H.; Rossi, A.; Forti, S.; Convertino, D.; Tozzini, V.; Coletti, C. Superlubricity of epitaxial monolayer WS2 on graphene. Nano Res. 2018, 11, 5946– 5956, DOI: 10.1007/s12274-018-2108-7Google ScholarThere is no corresponding record for this reference.
- 47Azizi, A.; Eichfeld, S.; Geschwind, G.; Zhang, K.; Jiang, B.; Mukherjee, D.; Hossain, L.; Piasecki, A. F.; Kabius, B.; Robinson, J. A.; Alem, N. Freestanding van der Waals Heterostructures of Graphene and Transition Metal Dichalcogenides. ACS Nano 2015, 9, 4882– 4890, DOI: 10.1021/acsnano.5b01677Google Scholar47https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXms1OmsrY%253D&md5=83deb118ea1c36c4b6259f67817afd0cFreestanding van der Waals Heterostructures of Graphene and Transition Metal DichalcogenidesAzizi, Amin; Eichfeld, Sarah; Geschwind, Gayle; Zhang, Kehao; Jiang, Bin; Mukherjee, Debangshu; Hossain, Lorraine; Piasecki, Aleksander F.; Kabius, Bernd; Robinson, Joshua A.; Alem, NasimACS Nano (2015), 9 (5), 4882-4890CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)Vertical stacking of two-dimensional (2D) crystals has recently attracted substantial interest due to unique properties and potential applications they can introduce. However, little is known about their microstructure because fabrication of the 2-dimensional heterostructures on a rigid substrate limits one's ability to directly study their at. and chem. structures using electron microscopy. This study demonstrates a unique approach to create atomically thin freestanding van der Waals heterostructures-WSe2/graphene and MoS2/graphene-as ideal model systems to study the nucleation and growth mechanisms in heterostructures. The authors use TEM imaging and diffraction to show epitaxial growth of the freestanding WSe2/graphene heterostructure, while no epitaxy is maintained in the MoS2/graphene heterostructure. Ultra-high-resoln. aberration-cor. scanning TEM (STEM) shows growth of monolayer WSe2 and MoS2 triangles on graphene membranes and reveals their edge morphol. and crystallinity. Photoluminescence measurements indicate a significant quenching of the photoluminescence response for the transition metal dichalcogenides on freestanding graphene, compared to those on a rigid substrate, such as sapphire and epitaxial graphene. Using a combination of (S)TEM imaging and electron diffraction anal., this study also reveals the significant role of defects on the heterostructure growth. The direct growth technique applied here enables the authors to study the heterostructure nucleation and growth mechanisms at the at. level without sample handling and transfer. Importantly, this approach can be used to study a wide spectrum of van der Waals heterostructures.
- 48Shi, J.; Liu, M.; Wen, J.; Ren, X.; Zhou, X.; Ji, Q.; Ma, D.; Zhang, Y.; Jin, C.; Chen, H.; Deng, S.; Xu, N.; Liu, Z.; Zhang, Y. All Chemical Vapor Deposition Synthesis and Intrinsic Bandgap Observation of MoS2/Graphene Heterostructures. Adv. Mater. 2015, 27, 7086– 7092, DOI: 10.1002/adma.201503342Google Scholar48https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXhs1WlsbvK&md5=344671187bc6ef6c88376b97f573bd21All Chemical Vapor Deposition Synthesis and Intrinsic Bandgap Observation of MoS2/Graphene HeterostructuresShi, Jianping; Liu, Mengxi; Wen, Jinxiu; Ren, Xibiao; Zhou, Xiebo; Ji, Qingqing; Ma, Donglin; Zhang, Yu; Jin, Chuanhong; Chen, Huanjun; Deng, Shaozhi; Xu, Ningsheng; Liu, Zhongfan; Zhang, YanfengAdvanced Materials (Weinheim, Germany) (2015), 27 (44), 7086-7092CODEN: ADVMEW; ISSN:0935-9648. (Wiley-VCH Verlag GmbH & Co. KGaA)By exploiting an all-CVD approach, the authors have successfully fabricated large area, thickness uniform, and high quality MoS2 /graphene vertical heterostructures with clean interfaces on conventional Au foil substrates. Spectroscopic characterizations reveal that the in-between graphene weakens the interface interaction between MoS2 and Au. This to some extend provide us a unique pathway for constructing a nearly freestanding MoS2 monolayer, which is evidenced by its very weak n-doping level and its intrinsic band feature according to STM/STS characterizations. Moreover, the MoS2/Graphene heterostructure is transferable onto arbitrary substrates, which will stimulate further in-depth investigations on the intrinsic electronic properties of monolayer MoS2 , and facilitate the development of ground breaking optoelectronic devices.
- 49Miwa, J. A.; Dendzik, M.; Grønborg, S. S.; Bianchi, M.; Lauritsen, J. V.; Hofmann, P.; Ulstrup, S. Van der Waals Epitaxy of Two-Dimensional MoS2–Graphene Heterostructures in Ultrahigh Vacuum. ACS Nano 2015, 9, 6502– 6510, DOI: 10.1021/acsnano.5b02345Google Scholar49https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXpsFOhtr0%253D&md5=a9dc452d7985d5a470e5f234232886f9Van der Waals Epitaxy of Two-Dimensional MoS2-Graphene Heterostructures in Ultrahigh VacuumMiwa, Jill A.; Dendzik, Maciej; Groenborg, Signe S.; Bianchi, Marco; Lauritsen, Jeppe V.; Hofmann, Philip; Ulstrup, SoerenACS Nano (2015), 9 (6), 6502-6510CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)In this work, we demonstrate direct van der Waals epitaxy of MoS2-graphene heterostructures on a semiconducting silicon carbide (SiC) substrate under ultrahigh vacuum conditions. Angle-resolved photoemission spectroscopy (ARPES) measurements show that the electronic structure of free-standing single-layer (SL) MoS2 is retained in these heterostructures due to the weak van der Waals interaction between adjacent materials. The MoS2 synthesis is based on a reactive phys. vapor deposition technique involving Mo evapn. and sulfurization in a H2S atm. on a template consisting of epitaxially grown graphene on SiC. Using scanning tunneling microscopy, we study the seeding of Mo on this substrate and the evolution from nanoscale MoS2 islands to SL and bilayer (BL) MoS2 sheets during H2S exposure. Our ARPES measurements of SL and BL MoS2 on graphene reveal the coexistence of the Dirac states of graphene and the expected valence band of MoS2 with the band max. shifted to the corner of the Brillouin zone at ‾K in the SL limit. We confirm the 2D character of these electronic states via a lack of dispersion with photon energy. The growth of epitaxial MoS2-graphene heterostructures on SiC opens new opportunities for further in situ studies of the fundamental properties of these complex materials, as well as perspectives for implementing them in various device schemes to exploit their many promising electronic and optical properties.
- 50Ago, H.; Endo, H.; Solís-Fernández, P.; Takizawa, R.; Ohta, Y.; Fujita, Y.; Yamamoto, K.; Tsuji, M. Controlled van der Waals Epitaxy of Monolayer MoS2 Triangular Domains on Graphene. ACS Appl. Mater. Interfaces 2015, 7, 5265– 5273, DOI: 10.1021/am508569mGoogle Scholar50https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXjtVentb0%253D&md5=32fca588c1995a8175f4e7603802eb69Controlled van der Waals Epitaxy of Monolayer MoS2 Triangular Domains on GrapheneAgo, Hiroki; Endo, Hiroko; Solis-Fernandez, Pablo; Takizawa, Rina; Ohta, Yujiro; Fujita, Yusuke; Yamamoto, Kazuhiro; Tsuji, MasaharuACS Applied Materials & Interfaces (2015), 7 (9), 5265-5273CODEN: AAMICK; ISSN:1944-8244. (American Chemical Society)Multilayered heterostructures of two-dimensional materials have recently attracted increased interest because of their unique electronic and optical properties. Here, the authors present CVD growth of triangular crystals of monolayer MoS2 on single-cryst. hexagonal graphene domains which are also grown by CVD. MoS2 grows selectively on the graphene domains rather than on the bare supporting SiO2 surface. Reflecting the heteroepitaxy of the growth process, the MoS2 domains grown on graphene present two preferred equiv. orientations. The interaction between the MoS2 and the graphene induced an upshift of the Raman G and 2-dimensional bands of the graphene, while significant photoluminescence quenching was obsd. for the monolayer MoS2. Also, photoinduced current modulation along with an optical memory effect was demonstrated for the MoS2-graphene heterostructure. The authors' work highlights that heterostructures synthesized by CVD offer an effective interlayer van der Waals interaction which can be developed for large-area multilayer electronic and photonic devices.
- 51Liu, X.; Balla, I.; Bergeron, H.; Campbell, G. P.; Bedzyk, M. J.; Hersam, M. C. Rotationally Commensurate Growth of MoS2 on Epitaxial Graphene. ACS Nano 2016, 10, 1067– 1075, DOI: 10.1021/acsnano.5b06398Google Scholar51https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXhvVarsLbI&md5=146285e61a1cf559def35f4efbb4fe51Rotationally Commensurate Growth of MoS2 on Epitaxial GrapheneLiu, Xiaolong; Balla, Itamar; Bergeron, Hadallia; Campbell, Gavin P.; Bedzyk, Michael J.; Hersam, Mark C.ACS Nano (2016), 10 (1), 1067-1075CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)Atomically thin MoS2/graphene heterostructures are promising candidates for nanoelectronic and optoelectronic technologies. Among different graphene substrates, epitaxial graphene (EG) on SiC provides several potential advantages for such heterostructures, including high electronic quality, tunable substrate coupling, wafer-scale processability, and cryst. ordering that can template commensurate growth. Exploiting these attributes, the authors demonstrate here the thickness-controlled van der Waals epitaxial growth of MoS2 on EG via CVD, giving rise to transfer-free synthesis of a two-dimensional heterostructure with registry between its constituent materials. The rotational commensurability obsd. between the MoS2 and EG is driven by the energetically favorable alignment of their resp. lattices and results in nearly strain-free MoS2, as evidenced by synchrotron x-ray scattering and at.-resoln. scanning tunneling microscopy (STM). The electronic nature of the MoS2/EG heterostructure is elucidated with STM and scanning tunneling spectroscopy, which reveals bias-dependent apparent thickness, band bending, and a reduced band gap of ∼0.4 eV at the monolayer MoS2 edges.
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Abstract
Figure 1
Figure 1. Structure of the DeepSTEM framework. Input images are decoded to ψ, which corresponds to the object function of the STEM image. Ir is the result of the STEM image simulation when applying the PSF to the Fourier transform of the reconstructed object function.
Figure 2
Figure 2. (a) Atomic-resolution HAADF-STEM image of MoS2 on graphene. (b) Image of the reconstructed object function. (c) Intensity profiles of the experimental HAADF-STEM image and image of reconstructed object function are plotted as solid red lines from lower left to upper right in each image. The scale bar is 0.5 nm. Mo and S atoms are represented by cyan and orange spheres.
Figure 3
Figure 3. (a–c) Atomic-resolution HAADF-STEM images showing the edge configurations. The image was taken at a temperature of 500 °C. (d–f) Images of the reconstructed object function of (a–c) showing (d) Mo-ZZ, (e) Mo-Klein, and (f) S-ZZ. The scale bar is 0.5 nm. (g–i) Schematic atomic models based on the interpretation of (d–f). Mo and S atoms are represented by cyan and yellow spheres, respectively.
Figure 4
Figure 4. Time-elapsed images of the reconstructed object function showing MoS2 formation progress on graphene with temperature holding at 500 °C. The elapsed time is shown in the lower left of each image. (a) MoSx cluster is adsorbed on the graphene substrates. (b) MoSx reconstructs the MoS2 cluster. (c) MoS2 cluster shows a truncated triangular shape with Mo-ZZ, Mo-Klein, and S-ZZ edges. The remaining MoSx clusters are denoted by white solid arrows. (d) Upside MoSx cluster transforms into MoS2. (e) Downside MoSx clusters also transformed into MoS2. The MoS2 cluster shows a triangular shape with Mo-ZZ edges. The scale bar is 0.5 nm.
Figure 5
Figure 5. (a–c) Time-elapsed images of the reconstructed object function of MoS2 reknitting progress on graphene with temperature holding at 500 °C. The elapsed time is shown in the upper left of each image. (a) MoS2 clusters have a hole with Mo-ZZ and S-ZZ edges. Mo adatoms are noted by cyan dashed circles. (b) Hole starts to reknit with diffusion and atomic reconstruction. The orange solid line in (a,b) shows the roto-translational motion of MoS2 clusters. (c) Hole has reknitted and shows a mirror twin boundary, as denoted by a red dashed box. Mo and S atoms are represented by cyan and orange spheres, respectively. The scale bar is 0.5 nm..
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ARTICLE SECTIONSThis article references 51 other publications.
- 1Khan, K.; Tareen, A. K.; Aslam, M.; Wang, R.; Zhang, Y.; Mahmood, A.; Ouyang, Z.; Zhang, H.; Guo, Z. Recent developments in emerging two-dimensional materials and their applications. J. Mater. Chem. C 2020, 8, 387– 440, DOI: 10.1039/c9tc04187gGoogle Scholar1https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXitFyru7fN&md5=19a18deda00a51e74e5cde14cab13a5bRecent developments in emerging two-dimensional materials and their applicationsKhan, Karim; Tareen, Ayesha Khan; Aslam, Muhammad; Wang, Renheng; Zhang, Yupeng; Mahmood, Asif; Ouyang, Zhengbiao; Zhang, Han; Guo, ZhongyiJournal of Materials Chemistry C: Materials for Optical and Electronic Devices (2020), 8 (2), 387-440CODEN: JMCCCX; ISSN:2050-7534. (Royal Society of Chemistry)The technol. evolution has been progressing for centuries and will possibly increase at a higher rate in the 21st century. Currently, in this age of nanotechnol., the discovery of more economical and sustainable novel materials has considerably increased. The abundance of two-dimensional (2D) materials has endowed them with a broad material platform in tech. studies and in the expansion of nano- and at.-level applications. The innovation of graphene has motivated considerable attention to the study of other novel 2D materials, known as modern day "alchemy", by which scientists are trying to convert most possible periodic table elements into 2D material structures and forms. 2D material devices with high quality and good optical encoder performance have a multitude of industrial applications. However, their stability and large size restrict their applications, but these problems can be overcome by functionalization and substrate-based formation of 2D materials. Therefore, via this review, first, basic attributes of 2D materials are described, and the mechanisms to further enhance their properties are also summarized. Second, the applications of 2D materials are discussed, along with their advantages and disadvantages. Finally, some effective device-fabrication approaches, such as heterostructure approaches, are applied to further enhance the properties of 2D materials; their novel device applications and opportunities are also presented. This updated review may provide new avenues for 2D material synthesis and development of more efficient devices compared to conventional devices in different fields.
- 2Hong, S.; Lee, C.-S.; Lee, M.-H.; Lee, Y.; Ma, K. Y.; Kim, G.; Yoon, S. I.; Ihm, K.; Kim, K.-J.; Shin, T. J.; Kim, S. W.; Jeon, E.-c.; Jeon, H.; Kim, J.-Y.; Lee, H.-I.; Lee, Z.; Antidormi, A.; Roche, S.; Chhowalla, M.; Shin, H.-J.; Shin, H. S. Ultralow-dielectric-constant amorphous boron nitride. Nature 2020, 582, 511– 514, DOI: 10.1038/s41586-020-2375-9Google Scholar2https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXht1ClsrvK&md5=128c06c1a0b782858893c4dc68aca6e1Ultralow-dielectric-constant amorphous boron nitrideHong, Seokmo; Lee, Chang-Seok; Lee, Min-Hyun; Lee, Yeongdong; Ma, Kyung Yeol; Kim, Gwangwoo; Yoon, Seong In; Ihm, Kyuwook; Kim, Ki-Jeong; Shin, Tae Joo; Kim, Sang Won; Jeon, Eun-chae; Jeon, Hansol; Kim, Ju-Young; Lee, Hyung-Ik; Lee, Zonghoon; Antidormi, Aleandro; Roche, Stephan; Chhowalla, Manish; Shin, Hyeon-Jin; Shin, Hyeon SukNature (London, United Kingdom) (2020), 582 (7813), 511-514CODEN: NATUAS; ISSN:0028-0836. (Nature Research)Decrease in processing speed due to increased resistance and capacitance delay is a major obstacle for the down-scaling of electronics. Minimizing the dimensions of interconnects (metal wires that connect different electronic components on a chip) is crucial for the miniaturization of devices. Interconnects are isolated from each other by non-conducting (dielec.) layers. So far, research has mostly focused on decreasing the resistance of scaled interconnects because integration of dielecs. using low-temp. deposition processes compatible with complementary metal-oxide-semiconductors is tech. challenging. Interconnect isolation materials must have low relative dielec. consts. (κ values), serve as diffusion barriers against the migration of metal into semiconductors, and be thermally, chem. and mech. stable. Specifically, the International Road map for Devices and Systems recommends the development of dielecs. with κ values of less than 2 by 2028. Existing low-κ materials (such as silicon oxide derivs., org. compds. and aerogels) have κ values greater than 2 and poor thermo-mech. properties. Here, the authors report three-nanometer-thick amorphous boron nitride films with ultralow κ values of 1.78 and 1.16 (close to that of air, κ = 1) at operation frequencies of 100 kHz and 1 MHz, resp. The films are mech. and elec. robust, with a breakdown strength of 7.3 MV per cm, which exceeds requirements. Cross-sectional imaging reveals that amorphous boron nitride prevents the diffusion of cobalt atoms into silicon under very harsh conditions, in contrast to ref. barriers. The results demonstrate that amorphous boron nitride has excellent low-κ dielec. characteristics for high-performance electronics.
- 3Lee, C.-S.; Shin, K. W.; Song, H.-J.; Park, H.; Cho, Y.; Im, D.-H.; Lee, H.; Lee, J.-H.; Won, J. Y.; Chung, J. G.; Kim, C.; Byun, K.-E.; Lee, E.-K.; Kim, Y.; Ko, W.; Lim, H. J.; Park, S.; Shin, H.-J. Fabrication of Metal/Graphene Hybrid Interconnects by Direct Graphene Growth and Their Integration Properties. Adv. Electron. Mater. 2018, 4, 1700624, DOI: 10.1002/aelm.201700624Google ScholarThere is no corresponding record for this reference.
- 4Lo, C.-L.; Helfrecht, B. A.; He, Y.; Guzman, D. M.; Onofrio, N.; Zhang, S.; Weinstein, D.; Strachan, A.; Chen, Z. Opportunities and challenges of 2D materials in back-end-of-line interconnect scaling. J. Appl. Phys. 2020, 128, 080903, DOI: 10.1063/5.0013737Google Scholar4https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXhslWqtrjM&md5=ab36ce51296e4d05d37c8169763597bfOpportunities and challenges of 2D materials in back-end-of-line interconnect scalingLo, Chun-Li; Helfrecht, Benjamin A.; He, Yanbo; Guzman, David M.; Onofrio, Nicolas; Zhang, Shengjiao; Weinstein, Dana; Strachan, Alejandro; Chen, ZhihongJournal of Applied Physics (Melville, NY, United States) (2020), 128 (8), 080903CODEN: JAPIAU; ISSN:0021-8979. (American Institute of Physics)As the challenges in continued scaling of the integrated circuit technol. escalate every generation, there is an urgent need to find viable solns. for both the front-end-of-line (transistors) and the back-end-of-line (interconnects). For the interconnect technol., it is crucial to replace the conventional barrier and liner with much thinner alternatives so that the current driving capability of the interconnects can be maintained or even improved. Due to the inherent atomically thin body thicknesses, 2D materials have recently been proposed and explored as Cu diffusion barrier alternatives. In this Perspective article, a variety of 2D materials that have been studied, ranging from graphene, h-BN, MoS2, WSe2 to TaS2, will be reviewed. Their potentials will be evaluated based on several criteria, including fundamental material properties as well as the feasibility for technol. integration. Using TaS2 as an example, we demonstrate a large set of promising properties and point out that there remain challenges in the integration aspects with a few possible solns. waiting for validation. Applications of 2D materials for other functions in Cu interconnects and for different metal types will also be introduced, including electromigration, cobalt interconnects, and radio-frequency transmission lines. (c) 2020 American Institute of Physics.
- 5Novoselov, K. S.; Mishchenko, A.; Carvalho, A.; Castro Neto, A. H. 2D materials and van der Waals heterostructures. Science 2016, 353, aac9439, DOI: 10.1126/science.aac9439Google ScholarThere is no corresponding record for this reference.
- 6Manzeli, S.; Ovchinnikov, D.; Pasquier, D.; Yazyev, O. V.; Kis, A. 2D transition metal dichalcogenides. Nat. Rev. Mater. 2017, 2, 17033, DOI: 10.1038/natrevmats.2017.33Google Scholar6https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtVWmtr%252FO&md5=83d0f2b1adaae4e8cf09dceb3597f2da2D transition metal dichalcogenidesManzeli, Sajedeh; Ovchinnikov, Dmitry; Pasquier, Diego; Yazyev, Oleg V.; Kis, AndrasNature Reviews Materials (2017), 2 (2), 17033CODEN: NRMADL; ISSN:2058-8437. (Nature Publishing Group)A review. Graphene is very popular because of its many fascinating properties, but its lack of an electronic bandgap has stimulated the search for 2D materials with semiconducting character. Transition metal dichalcogenides (TMDCs), which are semiconductors of the type MX2, where M is a transition metal atom (such as Mo or W) and X is a chalcogen atom (such as S, Se or Te), provide a promising alternative. Because of its robustness, MoS2 is the most studied material in this family. TMDCs exhibit a unique combination of at.-scale thickness, direct bandgap, strong spin-orbit coupling and favorable electronic and mech. properties, which make them interesting for fundamental studies and for applications in high-end electronics, spintronics, optoelectronics, energy harvesting, flexible electronics, DNA sequencing and personalized medicine. In this Review, the methods used to synthesize TMDCs are examd. and their properties are discussed, with particular attention to their charge d. wave, superconductive and topol. phases. The use of TMCDs in nanoelectronic devices is also explored, along with strategies to improve charge carrier mobility, high frequency operation and the use of strain engineering to tailor their properties.
- 7Novoselov, K. S.; Jiang, D.; Schedin, F.; Booth, T. J.; Khotkevich, V. V.; Morozov, S. V.; Geim, A. K. Two-dimensional atomic crystals. Proc. Natl. Acad. Sci. U.S.A. 2005, 102, 10451– 10453, DOI: 10.1073/pnas.0502848102Google Scholar7https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD2MXntVSit7g%253D&md5=1ce9e5f5eb0f7b9abb033d4a690d49c3Two-dimensional atomic crystalsNovoselov, K. S.; Jiang, D.; Schedin, F.; Booth, T. J.; Khotkevich, V. V.; Morozov, S. V.; Geim, A. K.Proceedings of the National Academy of Sciences of the United States of America (2005), 102 (30), 10451-10453CODEN: PNASA6; ISSN:0027-8424. (National Academy of Sciences)The authors report free-standing at. crystals that are strictly 2-dimensional and can be viewed as individual at. planes pulled out of bulk crystals or as unrolled single-wall nanotubes. By using micromech. cleavage, the authors prepd. and studied a variety of 2-dimensional crystals including single layers of boron nitride, graphite, several dichalcogenides, and complex oxides. These atomically thin sheets (essentially gigantic 2-dimensional mols. unprotected from the immediate environment) are stable under ambient conditions, exhibit high crystal quality, and are continuous on a macroscopic scale.
- 8Kaushik, N.; Nipane, A.; Basheer, F.; Dubey, S.; Grover, S.; Deshmukh, M. M.; Lodha, S. Schottky barrier heights for Au and Pd contacts to MoS2. Appl. Phys. Lett. 2014, 105, 113505, DOI: 10.1063/1.4895767Google Scholar8https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2cXhsFGgsrrE&md5=3ed113ebcc6a0f77d935e8432e76dcddSchottky barrier heights for Au and Pd contacts to MoS2Kaushik, Naveen; Nipane, Ankur; Basheer, Firdous; Dubey, Sudipta; Grover, Sameer; Deshmukh, Mandar M.; Lodha, SaurabhApplied Physics Letters (2014), 105 (11), 113505/1-113505/4CODEN: APPLAB; ISSN:0003-6951. (American Institute of Physics)The search of a p-type metal contact on MoS2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quant. Schottky barrier heights for Au and Pd contacts to MoS2 obtained by analyzing low temp. transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 × 104 Ω.mm, resp. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS2 bandgap. (c) 2014 American Institute of Physics.
- 9Liu, Y.; Wu, H.; Cheng, H.-C.; Yang, S.; Zhu, E.; He, Q.; Ding, M.; Li, D.; Guo, J.; Weiss, N. O.; Huang, Y.; Duan, X. Toward barrier free contact to molybdenum disulfide using graphene electrodes. Nano Lett. 2015, 15, 3030– 3034, DOI: 10.1021/nl504957pGoogle Scholar9https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXms1OisL4%253D&md5=50b222c0146ba048b1c25264cf158133Toward Barrier Free Contact to Molybdenum Disulfide Using Graphene ElectrodesLiu, Yuan; Wu, Hao; Cheng, Hung-Chieh; Yang, Sen; Zhu, Enbo; He, Qiyuan; Ding, Mengning; Li, Dehui; Guo, Jian; Weiss, Nathan O.; Huang, Yu; Duan, XiangfengNano Letters (2015), 15 (5), 3030-3034CODEN: NALEFD; ISSN:1530-6984. (American Chemical Society)Two-dimensional layered semiconductors such as molybdenum disulfide (MoS2) have attracted tremendous interest as a new class of electronic materials. However, there are considerable challenges in making reliable contacts to these atomically thin materials. Here the authors present a new strategy by using graphene as the back electrodes to achieve ohmic contact to MoS2. With a finite d. of states, the Fermi level of graphene can be readily tuned by a gate potential to enable a nearly perfect band alignment with MoS2. The authors demonstrate for the 1st time a transparent contact to MoS2 with zero contact barrier and linear output behavior at cryogenic temps. (down to 1.9 K) for both monolayer and multilayer MoS2. Benefiting from the barrier-free transparent contacts, a metal-insulator transition can be obsd. in a two-terminal MoS2 device, a phenomenon that could be easily masked by Schottky barriers found in conventional metal-contacted MoS2 devices. With further passivation by boron nitride (BN) encapsulation, the authors demonstrate a record-high extrinsic (two-terminal) field effect mobility up to 1300 cm2/(V s) in MoS2 at low temp.
- 10Shi, Y.; Zhou, W.; Lu, A.-Y.; Fang, W.; Lee, Y.-H.; Hsu, A. L.; Kim, S. M.; Kim, K. K.; Yang, H. Y.; Li, L.-J.; Idrobo, J.-C.; Kong, J. van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates. Nano Lett. 2012, 12, 2784– 2791, DOI: 10.1021/nl204562jGoogle Scholar10https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC38Xns1eksrg%253D&md5=76857c2bd3a2b0bfc20a1b63cff77836van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth TemplatesShi, Yumeng; Zhou, Wu; Lu, Ang-Yu; Fang, Wenjing; Lee, Yi-Hsien; Hsu, Allen Long; Kim, Soo Min; Kim, Ki Kang; Yang, Hui Ying; Li, Lain-Jong; Idrobo, Juan-Carlos; Kong, JingNano Letters (2012), 12 (6), 2784-2791CODEN: NALEFD; ISSN:1530-6984. (American Chemical Society)The authors present a method for synthesizing MoS2/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, a much lower growth temp. of 400 °C is required for this procedure. The chem. vapor deposition of MoS2 on the graphene surface gives rise to single cryst. hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was transported to graphene surface by a carrier gas at room temp., which was then followed by post annealing. At an elevated temp., the precursor self-assembles to form MoS2 flakes epitaxially on the graphene surface via thermal decompn. With higher amt. of precursor delivered onto the graphene surface, a continuous MoS2 film on graphene can be obtained. This simple chem. vapor deposition method provides a unique approach for the synthesis of graphene heterostructures and surface functionalization of graphene. The synthesized two-dimensional MoS2/Graphene hybrids possess great potential toward the development of new optical and electronic devices as well as a wide variety of newly synthesizable compds. for catalysts.
- 11Wang, H. W.; Skeldon, P.; Thompson, G. E.; Wood, G. C. Synthesis and characterization of molybdenum disulphide formed from ammonium tetrathiomolybdate. J. Mater. Sci. 1997, 32, 497– 502, DOI: 10.1023/a:1018538424373Google Scholar11https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK2sXot1amuw%253D%253D&md5=f6f886224697ae0d7b3686e7da65c28dSynthesis and characterization of molybdenum disulfide formed from ammonium tetrathiomolybdateWang, H. W.; Skeldon, P.; Thompson, G. E.; Wood, G. C.Journal of Materials Science (1997), 32 (2), 497-502CODEN: JMTSAS; ISSN:0022-2461. (Chapman & Hall)An investigation was carried out on the possibility of in-situ formation of MoS2 within porous anodic films on aluminum, to improve subsequent tribol. behavior, by re-anodization in thiomolybdate electrolyte. Acidification of thiomolybdate was used to simulate the conditions for formation of the sulfide at the anodic film-electrolyte interface, followed by appropriate vacuum heat treatments to study possible temp. effects on the sulfide due to either friction or Joule heating during anodizing. The products of both acidification and heat treatment, characterized by x-ray powder diffraction and SEM, were compared with those formed by direct thermal decompn. of ammonium tetrathiomolybdate crystals. The ppt. formed by acidification was mainly amorphous molybdenum trisulfide (MoS3), which on heat treatment at 450° and 850° yielded 3R-MoS2 (identified by x-ray diffraction). 3R-MoS2 also formed by the thermal decompn. of thiomolybdate crystals. Thermogravimetric and differential thermal analyses showed that the decompn. of MoS3 to MoS2 occurred at 220-370° and revealed the sequence of reaction steps. Mainly amorphous MoS3 is formed as a consequence of pH changes in the film-electrolyte interface during re-anodizing but the product is relatively easily transformed to cryst. MoS2 upon moderate heating which may occur during wear processes.
- 12Sygellou, L. An in-situ photoelectron spectroscopy study of the thermal processing of ammonium tetrathiomolybdate, (NH4)2MoS4, precursor. Appl. Surf. Sci. 2019, 476, 1079– 1085, DOI: 10.1016/j.apsusc.2019.01.193Google Scholar12https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXitlOisL0%253D&md5=0a87598a76aca73189f91c97f953599fAn in-situ photoelectron spectroscopy study of the thermal processing of ammonium tetrathiomolybdate, (NH4)2MoS4, precursorSygellou, LabriniApplied Surface Science (2019), 476 (), 1079-1085CODEN: ASUSEE; ISSN:0169-4332. (Elsevier B.V.)Nano scale molybdenum disulfide (MoS2) is a very promising material for the next generation electronics and energy storage devices. The active defect sites located at the periphery of the lattice may influence certain redox reactions, thus classifying it as an excellent non-noble metal catalyst. One effective approach to synthesize large scale MoS2 films is through simple thermolysis of (NH4)2MoS4 precursor. Herein, a combined in situ X-ray and Ultra-Violet photoelectron spectroscopies (XPS/UPS) study has been carried out to follow the evolution of at. compn., the surface chem. species and the electronic properties (Work Function and Ionization Potential) during the thermal decompn. of (NH4)2MoS4 salt in Ultra High Vacuum conditions. It was found that, up to 400C, thermal conversion of (NH4)2MoS4 salt to transient intermediates, across amorphous MoSx phase have been performed towards to MoS2 out of significant percent of sulfur active sites. The active sites have been decreased upon heating at higher temps. Assignment of the thermally evolved active species at defect sites and the correlation of surface at. concn. combined with either the Ionization Potential or the Work Function of annealed MoSx nanoflakes makes this study a knowledgeable factor of awareness through electrocatalytic properties of MoS2-based nanostructures. Acknowledgement: We acknowledge support of this work by the project "National Infrastructure in Nanotechnol., Advanced Materials and Micro-/ Nanoelectronics" (MIS 5002772) which is implemented under the Action "Reinforcement of the Research and Innovation Infrastructure", funded by the Operational Program "Competitiveness, Entrepreneurship and Innovation" (NSRF 2014-2020) and co-financed by Greece and the European Union (European Regional Development Fund).
- 13Yang, J.; Gu, Y.; Lee, E.; Lee, H.; Park, S. H.; Cho, M.-H.; Kim, Y. H.; Kim, Y.-H.; Kim, H. Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system. Nanoscale 2015, 7, 9311– 9319, DOI: 10.1039/c5nr01486gGoogle Scholar13https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXmvFarsrk%253D&md5=864547d764ee6d6b2ab033db86b659bfWafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent systemYang, Jaehyun; Gu, Yeahyun; Lee, Eunha; Lee, Hyangsook; Park, Sang Han; Cho, Mann-Ho; Kim, Yong Ho; Kim, Yong-Hoon; Kim, HyoungsubNanoscale (2015), 7 (20), 9311-9319CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)The wafer-scale synthesis of two-dimensional molybdenum disulfide (MoS2) films, with high layer-controllability and uniformity, remains a significant challenge in the fields of nano and optoelectronics. Here, we report the highly thickness controllable growth of uniform MoS2 thin films on the wafer-scale via a spin-coating route. Formulation of a dimethylformamide-based MoS2 precursor soln. mixed with addnl. amine- and amino alc.-based solvents (n-butylamine and 2-aminoethanol) allowed for the formation of a uniform coating of MoS2 thin films over a 2 in. wafer-scale SiO2/Si substrate. In addn., facile control of the av. no. of stacking layers is demonstrated by simply manipulating the concn. of the precursor soln. Various characterization results reveal that the synthesized MoS2 film has wafer-scale homogeneity with excellent cryst. quality and a stoichiometric chem. compn. To further demonstrate possible device applications, a mostly penta-layered MoS2 thin film was integrated into a top-gated field-effect transistor as the channel layer and we also successfully transferred our films onto transparent/flexible substrates.
- 14Yang, H.; Giri, A.; Moon, S.; Shin, S.; Myoung, J.-M.; Jeong, U. Highly scalable synthesis of MoS2 thin films with precise thickness control via polymer-assisted deposition. Chem. Mater. 2017, 29, 5772– 5776, DOI: 10.1021/acs.chemmater.7b01605Google Scholar14https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtVOns7bI&md5=72552a0d0d25c0e917cf42665ac22537Highly Scalable Synthesis of MoS2 Thin Films with Precise Thickness Control via Polymer-Assisted DepositionYang, Heeseung; Giri, Anupam; Moon, Sungmin; Shin, Sangbae; Myoung, Jae-Min; Jeong, UnyongChemistry of Materials (2017), 29 (14), 5772-5776CODEN: CMATEX; ISSN:0897-4756. (American Chemical Society)The versatile applications of MoS2 thin films demand large-scale synthesis with high uniformity in thickness and compn. Among several synthetic approaches, the two-step process including soln.-based precursor coating followed by thermolysis is advantageous in terms of cost and scalability. In this study, we developed a polymer-assisted deposition process to prep. a highly scalable polymer-precursor complex thin film and apply thermolysis at a relatively low temp. without sulfurization. This process enables fine control of the precursor film, which leads to precise thickness control of the resulting MoS2 film (≥2 nm). In addn., we demonstrate the fabrication of a MoS2-based photodetector with a broad spectral response and excellent performance, as indicated by its fast response time (≤1.0 ms) and high on-off ratio (104).
- 15Zhu, Y.; Yuan, D.; Zhang, H.; Xu, T.; Sun, L. Atomic-scale insights into the formation of 2D crystals from in situ transmission electron microscopy. Nano Res. 2021, 14, 1650– 1658, DOI: 10.1007/s12274-020-3034-zGoogle ScholarThere is no corresponding record for this reference.
- 16Mishra, R.; Ishikawa, R.; Lupini, A. R.; Pennycook, S. J. Single-atom dynamics in scanning transmission electron microscopy. MRS Bull. 2017, 42, 644– 652, DOI: 10.1557/mrs.2017.187Google Scholar16https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhsVKhurnP&md5=8f06721844c52906a1f511847ba8b02bSingle-atom dynamics in scanning transmission electron microscopyMishra, Rohan; Ishikawa, Ryo; Lupini, Andrew R.; Pennycook, Stephen J.MRS Bulletin (2017), 42 (9), 644-652CODEN: MRSBEA; ISSN:0883-7694. (Cambridge University Press)The correction of aberrations in the scanning transmission electron microscope (STEM) has simultaneously improved both spatial and temporal resoln., making it possible to capture the dynamics of single atoms inside materials, and resulting in new insights into the dynamic behavior of materials. In this article, we describe the different beam-matter interactions that lead to at. excitations by transferring energy and momentum. We review recent examples of sequential STEM imaging to demonstrate the dynamic behavior of single atoms both within materials, at dislocations, at grain and interface boundaries, and on surfaces. We also discuss the effects of such dynamic behavior on material properties. We end with a summary of ongoing instrumental and algorithm developments that we anticipate will improve the temporal resoln. significantly, allowing unprecedented insights into the dynamic behavior of materials at the at. scale.
- 17Su, C.; Tripathi, M.; Yan, Q.-B.; Wang, Z.; Zhang, Z.; Hofer, C.; Wang, H.; Basile, L.; Su, G.; Dong, M.; Meyer, J. C.; Kotakoski, J.; Kong, J.; Idrobo, J.-C.; Susi, T.; Li, J. Engineering single-atom dynamics with electron irradiation. Sci. Adv. 2019, 5, eaav2252 DOI: 10.1126/sciadv.aav2252Google ScholarThere is no corresponding record for this reference.
- 18Fei, L.; Lei, S.; Zhang, W.-B.; Lu, W.; Lin, Z.; Lam, C. H.; Chai, Y.; Wang, Y. Direct TEM observations of growth mechanisms of two-dimensional MoS2 flakes. Nat. Commun. 2016, 7, 12206, DOI: 10.1038/ncomms12206Google Scholar18https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXktFyqsrY%253D&md5=9589523341bfd399219d2c4bf2420ac3Direct TEM observations of growth mechanisms of two-dimensional MoS2 flakesFei, Linfeng; Lei, Shuijin; Zhang, Wei-Bing; Lu, Wei; Lin, Ziyuan; Lam, Chi Hang; Chai, Yang; Wang, YuNature Communications (2016), 7 (), 12206CODEN: NCAOBW; ISSN:2041-1723. (Nature Publishing Group)A microscopic understanding of the growth mechanism of two-dimensional materials is of particular importance for controllable synthesis of functional nanostructures. Because of the lack of direct and insightful observations, how to control the orientation and the size of two-dimensional material grains is still under debate. Here we discern distinct formation stages for MoS2 flakes from the thermolysis of ammonium thiomolybdates using in situ transmission electron microscopy. In the initial stage (400 °C), vertically aligned MoS2 structures grow in a layer-by-layer mode. With the increasing temp. of up to 780 °C, the orientation of MoS2 structures becomes horizontal. When the growth temp. reaches 850 °C, the cryst. size of MoS2 increases by merging adjacent flakes. Our study shows direct observations of MoS2 growth as the temp. evolves, and sheds light on the controllable orientation and grain size of two-dimensional materials.
- 19Sang, X.; Li, X.; Puretzky, A. A.; Geohegan, D. B.; Xiao, K.; Unocic, R. R. Atomic Insight into Thermolysis-Driven Growth of 2D MoS2. Adv. Funct. Mater. 2019, 29, 1902149, DOI: 10.1002/adfm.201902149Google Scholar19https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXpvFels7g%253D&md5=e99d85df6f3128e103467129498ff5fcAtomic Insight into Thermolysis-Driven Growth of 2D MoS2Sang, Xiahan; Li, Xufan; Puretzky, Alexander A.; Geohegan, David B.; Xiao, Kai; Unocic, Raymond R.Advanced Functional Materials (2019), 29 (52), 1902149CODEN: AFMDC6; ISSN:1616-301X. (Wiley-VCH Verlag GmbH & Co. KGaA)Understanding and controlling the transformations of transition metal dichalcogenides (TMDs) from amorphous precursors into 2-dimensional (2D) materials is important for guiding synthesis, directing fabrication, and tailoring functional properties. Here, the combined effects of thermal energy and electron beam irradn. are explored on the structural evolution of 2-dimensional MoS2 flakes through the thermal decompn. of a (NH4)2MoS4 precursor inside an ultrahigh vacuum (10-9 Torr) scanning transmission electron microscope (STEM). The influence of reaction temp., growth substrate, and the initial precursor morphol. on the resulting 2-dimensional MoS2 flake morphol., edge structures, and point defects are explored. Although thermal decompn. occurs extremely fast at elevated temps. and is difficult to capture using current STEM techniques, electron beam irradn. can induce local transformations at lower temps., enabling direct observation and interpretation of crit. growth steps including oriented attachment and transition from single- to multilayer structures at at. resoln. An increase in the no. of layers of the MoS2 flakes from island growth is studied using electron beam irradn. These findings provide insight into the growth mechanisms and factors that control the synthesis of few-layer MoS2 flakes through thermolysis and toward the prospect of atomically precise control and growth of 2-dimensional TMDs.
- 20Kondekar, N.; Boebinger, M. G.; Tian, M.; Kirmani, M. H.; McDowell, M. T. The Effect of Nickel on MoS2 Growth Revealed with in Situ Transmission Electron Microscopy. ACS Nano 2019, 13, 7117– 7126, DOI: 10.1021/acsnano.9b02528Google Scholar20https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXpvVCntr4%253D&md5=816f0cf4b7906a170c3c3c78805bfc03The Effect of Nickel on MoS2 Growth Revealed with in Situ Transmission Electron MicroscopyKondekar, Neha; Boebinger, Matthew G.; Tian, Mengkun; Kirmani, Mohammad Hamza; McDowell, Matthew T.ACS Nano (2019), 13 (6), 7117-7126CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)MoS2 has important applications in (electro)catalysis and as a semiconductor for electronic devices. Other chem. species are commonly added to MoS2 to increase catalytic activity or to alter electronic properties through substitutional or adsorption-based doping. While ground breaking work has been devoted to detg. the at.-scale structure of MoS2 and other layered transition-metal dichalcogenides (TMDCs), there is a lack of understanding of the dynamic processes that govern the evolution of these materials during synthesis. Here, in situ transmission electron microscopy (TEM) heating, in combination with larger length scale ex situ expts., is used to investigate the effects of added Ni on the growth of MoS2 during the thermolysis of the solid-state (NH4)2MoS4 precursor. Low concns. of Ni are obsd. to cause significant differences in the MoS2 crystn. and growth process, leading to an increase in MoS2 crystal size. This is likely a result of the altered mobility of interfaces between crystals during growth. These findings demonstrate the important role of addnl. elements in controlling the evolution of TMDCs during synthesis, which should be considered when designing these materials for a variety of applications.
- 21Morgan, A. J.; Martin, A. V.; D’Alfonso, A. J.; Putkunz, C. T.; Allen, L. J. Direct exit-wave reconstruction from a single defocused image. Ultramicroscopy 2011, 111, 1455– 1460, DOI: 10.1016/j.ultramic.2011.07.005Google Scholar21https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC3MXhtF2kurnK&md5=174ec075159e4e5e80a7763c5ccbd775Direct exit-wave reconstruction from a single defocused imageMorgan, A. J.; Martin, A. V.; D'Alfonso, A. J.; Putkunz, C. T.; Allen, L. J.Ultramicroscopy (2011), 111 (9-10), 1455-1460CODEN: ULTRD6; ISSN:0304-3991. (Elsevier B.V.)We propose a direct, non-iterative method for the exact recovery of the complex wave in the exit-surface plane of a coherently illuminated object from a single defocused image. The method is applicable for a wide range of illumination conditions. The defocus range is subject to certain conditions, which if satisfied allow the complex exit-surface wave to be directly recovered by solving a set of linear equations. These linear equations, whose coeffs. depend on the incident illumination, are obtained by analyzing the autocorrelation function of an auxiliary wave which is related to the exit-surface wave in a simple way. This autocorrelation is constructed by taking the inverse Fourier transform of the defocused image. We present an exptl. proof of concept by recovering the exit-surface wave of a microfiber illuminated by a plane wave formed using a HeNe laser.
- 22Kirkland, E. J. Improved high resolution image processing of bright field electron micrographs: I. Theory. Ultramicroscopy 1984, 15, 151– 172, DOI: 10.1016/0304-3991(84)90037-8Google ScholarThere is no corresponding record for this reference.
- 23Nellist, P. D.; Pennycook, S. J. Accurate structure determination from image reconstruction in ADF STEM. J. Microsc. 1998, 190, 159– 170, DOI: 10.1046/j.1365-2818.1998.3260881.xGoogle Scholar23https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK1cXjtVGlsLo%253D&md5=62bb61825582968d645d7bc90f2f59c3Accurate structure determination from image reconstruction in ADF STEMNellist, P. D.; Pennycook, S. J.Journal of Microscopy (Oxford) (1998), 190 (1/2), 159-170CODEN: JMICAR; ISSN:0022-2720. (Blackwell Science Ltd.)Annular dark-field (ADF) imaging in a scanning transmission electron microscope results in direct structure images of the at. configuration of the specimen. Since such images are almost perfectly incoherent they can be treated as a convolution between a point-spread function, which is simply the intensity of the illuminating electron probe, and a sharply peaked object function that represents the projected structure of the specimen. Knowledge of the object function for an image region of perfect crystal allows the point-spread function to be directly detd. for that image. We examine how the object function for an image can then be reconstructed using a Wiener filter, the CLEAN algorithm and a max. entropy reconstruction. Prior information is required to perform a reconstruction, and we discuss what nature of prior information is suitable for ADF imaging.
- 24Nellist, P. D.; Pennycook, S. J. Probe and object function reconstruction in incoherent scanning transmission electron microscope imaging. Scanning Microsc. 1997, 11, 81– 90Google ScholarThere is no corresponding record for this reference.
- 25Kazubek, M. Wavelet domain image denoising by thresholding and Wiener filtering. IEEE Signal Process. Lett. 2003, 10, 324– 326, DOI: 10.1109/lsp.2003.818225Google ScholarThere is no corresponding record for this reference.
- 26Ede, J. M. Deep learning in electron microscopy. Mach. Learn.: Sci. Technol. 2021, 2, 011004, DOI: 10.1088/2632-2153/abd614Google ScholarThere is no corresponding record for this reference.
- 27Madsen, J.; Liu, P.; Kling, J.; Wagner, J. B.; Hansen, T. W.; Winther, O.; Schiøtz, J. A Deep Learning Approach to Identify Local Structures in Atomic-Resolution Transmission Electron Microscopy Images. Adv. Theory Simul. 2018, 1, 1800037, DOI: 10.1002/adts.201800037Google ScholarThere is no corresponding record for this reference.
- 28Lee, J.; Lee, Y.; Kim, J.; Lee, Z. Contrast Transfer Function-Based Exit-Wave Reconstruction and Denoising of Atomic-Resolution Transmission Electron Microscopy Images of Graphene and Cu Single Atom Substitutions by Deep Learning Framework. Nanomaterials 2020, 10, 1977, DOI: 10.3390/nano10101977Google Scholar28https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXisVemsLzI&md5=b8fa84d7a5528ff68cd4a82e0ecb5c7bContrast transfer function-based exit-wave reconstruction and denoising of atomic-resolution transmission electron microscopy images of graphene and Cu single atom substitutions by deep learning frameworkLee, Jongyeong; Lee, Yeongdong; Kim, Jaemin; Lee, ZonghoonNanomaterials (2020), 10 (10), 1977CODEN: NANOKO; ISSN:2079-4991. (MDPI AG)The exit wave is the state of a uniform plane incident electron wave exiting immediately after passing through a specimen and before the at.-resoln. transmission electron microscopy (ARTEM) image is modified by the aberration of the optical system and the incoherence effect of the electron. Although exit-wave reconstruction has been developed to prevent the misinterpretation of ARTEM images, there have been limitations in the use of conventional exit-wave reconstruction in ARTEM studies of the structure and dynamics of two-dimensional materials. In this study, we propose a framework that consists of the convolutional dual-decoder autoencoder to reconstruct the exit wave and denoise ARTEM images. We calcd. the contrast transfer function (CTF) for real ARTEM and assigned the output of each decoder to the CTF as the amplitude and phase of the exit wave. We present exit-wave reconstruction expts. with ARTEM images of monolayer graphene and compare the findings with those of a simulated exit wave. Cu single atom substitution in monolayer graphene was, for the first time, directly identified through exit-wave reconstruction expts. Our exit-wave reconstruction expts. show that the performance of the denoising task is improved when compared to the Wiener filter in terms of the signal-to-noise ratio, peak signal-to-noise ratio, and structural similarity index map metrics.
- 29Nellist, P. D.; Pennycook, S. J. The principles and interpretation of annular dark-field Z-contrast imaging. Adv. Imaging Electron Phys. 2000, 113, 147– 203, DOI: 10.1016/s1076-5670(00)80013-0Google ScholarThere is no corresponding record for this reference.
- 30Kramer, M. A. Nonlinear Principal Component Analysis Using Autoassociative Neural Networks. AlChE J. 1991, 37, 233– 243, DOI: 10.1002/aic.690370209Google Scholar30https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADyaK3MXht1Ghsbs%253D&md5=a4e705cbc4913ffd04e6cf62c4e81aabNonlinear principal component analysis using autoassociative neural networksKramer, Mark A.AIChE Journal (1991), 37 (2), 233-43CODEN: AICEAC; ISSN:0001-1541.Nonlinear-principal-component anal. (NLPCA), is a novel technique for multivariate data anal., similar to the method of principal-component anal. (PCA). NLPCA like PCA, is used to identify and remove correlations among problem variables as an aid to dimensionality redn., visualization, and exploratory data anal. While PCA identifies only linear correlations between variables, NLPCA uncovers both linear and nonlinear correlations, without restriction on the character of the nonlinearities present in the data. NLPCA operates by training a feedforward neural network to perform the identity mapping, where the network inputs are reproduced at the output layer. The network contains an internal bottleneck layer (contg. fewer nodes than input or output layers), which forces the network to develop a compact representation of the input data and 2 addnl. hidden layers. The NLPCA method is demonstrated by using time-dependent, simulated batch-reaction data. NLPCA can reduce dimensionality and produce a feature space map resembling the actual distribution of the underlying system parameters.
- 31Zemlin, F.; Weiss, K.; Schiske, P.; Kunath, W.; Herrmann, K.-H. Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms. Ultramicroscopy 1978, 3, 49– 60, DOI: 10.1016/s0304-3991(78)80006-0Google ScholarThere is no corresponding record for this reference.
- 32Kingma, D. P.; Ba, J. Adam: A Method for Stochastic Optimization. arXiv.org, e-Print Arch., Comput. Sci.. 2014, arXiv:1412.6980.Google ScholarThere is no corresponding record for this reference.
- 33Geim, A. K.; Novoselov, K. S. The rise of graphene. Nat. Mater. 2007, 6, 183– 191, DOI: 10.1038/nmat1849Google Scholar33https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD2sXit1Khtrg%253D&md5=c2c02ce70a1725e6c559c173156568c5The rise of grapheneGeim, A. K.; Novoselov, K. S.Nature Materials (2007), 6 (3), 183-191CODEN: NMAACR; ISSN:1476-1122. (Nature Publishing Group)A review. Graphene is a rapidly rising star on the horizon of materials science and condensed-matter physics. This strictly two-dimensional material exhibits exceptionally high crystal and electronic quality, and, despite its short history, has already revealed a cornucopia of new physics and potential applications, which are briefly discussed here. Whereas one can be certain of the realness of applications only when com. products appear, graphene no longer requires any further proof of its importance in terms of fundamental physics. Owing to its unusual electronic spectrum, graphene has led to the emergence of a new paradigm of 'relativistic' condensed-matter physics, where quantum relativistic phenomena, some of which are unobservable in high-energy physics, can now be mimicked and tested in table-top expts. More generally, graphene represents a conceptually new class of materials that are only one atom thick, and, on this basis, offers new inroads into low-dimensional physics that has never ceased to surprise and continues to provide a fertile ground for applications.
- 34Li, X.; Cai, W.; An, J.; Kim, S.; Nah, J.; Yang, D.; Piner, R.; Velamakanni, A.; Jung, I.; Tutuc, E.; Banerjee, S. K.; Colombo, L.; Ruoff, R. S. Large-Area Synthesis of High-Quality and Uniform Graphene Films on Copper Foils. Science 2009, 324, 1312– 1314, DOI: 10.1126/science.1171245Google Scholar34https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD1MXms12gtbY%253D&md5=d5d5a8564d2dac69173cf0696d21eb3eLarge-Area Synthesis of High-Quality and Uniform Graphene Films on Copper FoilsLi, Xuesong; Cai, Weiwei; An, Jinho; Kim, Seyoung; Nah, Junghyo; Yang, Dongxing; Piner, Richard; Velamakanni, Aruna; Jung, Inhwa; Tutuc, Emanuel; Banerjee, Sanjay K.; Colombo, Luigi; Ruoff, Rodney S.Science (Washington, DC, United States) (2009), 324 (5932), 1312-1314CODEN: SCIEAS; ISSN:0036-8075. (American Association for the Advancement of Science)Graphene was attracting great interest because of its distinctive band structure and phys. properties. Today, graphene is limited to small sizes because it is produced mostly by exfoliating graphite. The authors grew large-area graphene films of the order of centimeters on Cu substrates by CVD using methane. The films are predominantly single-layer graphene, with a small percentage (<5%) of the area having few layers, and are continuous across Cu surface steps and grain boundaries. The low soly. of C in Cu appears to help make this growth process self-limiting. The authors also developed graphene film transfer processes to arbitrary substrates, and dual-gated field-effect transistors fabricated on Si/SiO2 substrates showed electron mobilities ≤4050 cm2/V-s at room temp.
- 35van der Zande, A. M.; Huang, P. Y.; Chenet, D. A.; Berkelbach, T. C.; You, Y.; Lee, G.-H.; Heinz, T. F.; Reichman, D. R.; Muller, D. A.; Hone, J. C. Grains and grain boundaries in highly crystalline monolayer molybdenum disulphide. Nat. Mater. 2013, 12, 554– 561, DOI: 10.1038/nmat3633Google Scholar35https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC3sXntVaqur0%253D&md5=c4789fee1f590a181e13e224eef5ef95Grains and grain boundaries in highly crystalline monolayer molybdenum disulphidevan der Zande, Arend M.; Huang, Pinshane Y.; Chenet, Daniel A.; Berkelbach, Timothy C.; You, YuMeng; Lee, Gwan-Hyoung; Heinz, Tony F.; Reichman, David R.; Muller, David A.; Hone, James C.Nature Materials (2013), 12 (6), 554-561CODEN: NMAACR; ISSN:1476-1122. (Nature Publishing Group)Recent progress in large-area synthesis of monolayer MoS2, a new 2D direct-band gap semiconductor, is paving the way for applications in atomically thin electronics. Little is known, however, about the microstructure of this material. Here we have refined chem. vapor deposition synthesis to grow highly cryst. islands of monolayer MoS2 up to 120 μm in size with optical and elec. properties comparable or superior to exfoliated samples. Using transmission electron microscopy, we correlate lattice orientation, edge morphol. and crystallinity with island shape to demonstrate that triangular islands are single crystals. The crystals merge to form faceted tilt and mirror twin boundaries that are stitched together by lines of 8- and 4-membered rings. D. functional theory reveals localized mid-gap states arising from these 8-4 defects. Mirror twin boundaries cause strong photoluminescence quenching whereas tilt boundaries cause strong enhancement. Meanwhile, mirror twin boundaries slightly increase the measured in-plane elec. cond., whereas tilt boundaries slightly decrease the cond.
- 36Xu, W.; Li, S.; Zhou, S.; Lee, J. K.; Wang, S.; Sarwat, S. G.; Wang, X.; Bhaskaran, H.; Pasta, M.; Warner, J. H. Large dendritic monolayer MoS2 grown by atmospheric pressure chemical vapor deposition for electrocatalysis. ACS Appl. Mater. Interfaces 2018, 10, 4630– 4639, DOI: 10.1021/acsami.7b14861Google Scholar36https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhsVSjsro%253D&md5=d89b9317f1e7e8700be1245895396bf3Large Dendritic Monolayer MoS2 Grown by Atmospheric Pressure Chemical Vapor Deposition for ElectrocatalysisXu, Wenshuo; Li, Sha; Zhou, Si; Lee, Ja Kyung; Wang, Shanshan; Sarwat, Syed Ghazi; Wang, Xiaochen; Bhaskaran, Harish; Pasta, Mauro; Warner, Jamie H.ACS Applied Materials & Interfaces (2018), 10 (5), 4630-4639CODEN: AAMICK; ISSN:1944-8244. (American Chemical Society)The edge sites of MoS2 are catalytically active for the H evolution reaction (HER), and growing monolayer structures that are edge-rich is desirable. Here, the authors show the prodn. of large-area highly branched MoS2 dendrites on amorphous SiO2/Si substrates using an atm. pressure CVD and explore their use in electrocatalysis. By tailoring the substrate construction, the monolayer MoS2 evolves from triangular to dendritic morphol. because of the change of growth conditions. The rough edges endow dendritic MoS2 with a fractal dimension down to 1.54. The highly cryst. basal plane and the edge of the dendrites are visualized at at. resoln. using an annular dark field scanning transmission electron microscope. The monolayer dendrites exhibit strong photoluminescence, which is indicative of the direct band gap emission, which is preserved after being transferred. Post-transfer S annealing restores the structural defects and decreases the n-type doping in MoS2 monolayers. The annealed MoS2 dendrites show good and highly durable HER performance on the glassy C with a large exchange c.d. of 32 μA cmgeo-2, demonstrating its viability as an efficient HER catalyst.
- 37Schweiger, H.; Raybaud, P.; Kresse, G.; Toulhoat, H. Shape and edge sites modifications of MoS2 catalytic nanoparticles induced by working conditions: A theoretical study. J. Catal. 2002, 207, 76– 87, DOI: 10.1006/jcat.2002.3508Google Scholar37https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BD38Xit1yjt78%253D&md5=ef9f184753087174cd18e2f4479a0fc2Shape and Edge Sites Modifications of MoS2 Catalytic Nanoparticles Induced by Working Conditions: A Theoretical StudySchweiger, Hannes; Raybaud, Pascal; Kresse, Georg; Toulhoat, HerveJournal of Catalysis (2002), 207 (1), 76-87CODEN: JCTLA5; ISSN:0021-9517. (Academic Press)Detn. of the morphol. and electronic properties of single-layer nanosize MoS2 particles is of considerable interest for a better understanding of the active phase of hydrotreating catalysts. We propose an original approach, based on d. functional calcns. applied to various types of MoS2 clusters contg. up to 200 atoms, to evaluate accurately the surface energies of the Mo-edge and S-edge terminated surfaces. The results are expressed as a function of the chem. potential of sulfur, which is in turn controlled by the temp. and the ratio of partial pressures of H2S and H2. Gibbs-Curie-Wulff equil. morphologies reveal that a high chem. potential of sulfur leads to triangular-shaped particles terminated by the Mo-edge surface, giving an interpretation of the observations made recently by scanning tunneling microscopy (STM). Simulations of the STM images for the most stable clusters reveal a qual. good agreement with expts. Moreover, our approach predicts that varying the potential of sulfur modifies the local Mo-edge structure and the shape of the nanoparticles. Finally, the thermodn. diagram for a MoS2 particle with a realistic size shows that the creation of one sulfur vacancy at the corner and on the edge is possible under HDS working conditions. (c) 2002 Academic Press.
- 38Zhu, D.; Shu, H.; Jiang, F.; Lv, D.; Asokan, V.; Omar, O.; Yuan, J.; Zhang, Z.; Jin, C. Capture the growth kinetics of CVD growth of two-dimensional MoS2. npj 2D Mater. Appl. 2017, 1, 8, DOI: 10.1038/s41699-017-0010-xGoogle ScholarThere is no corresponding record for this reference.
- 39Pan, H.; Zhang, Y.-W. Edge-dependent structural, electronic and magnetic properties of MoS2 nanoribbons. J. Mater. Chem. 2012, 22, 7280– 7290, DOI: 10.1039/c2jm15906fGoogle Scholar39https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC38Xkt1Clu7c%253D&md5=ce0224bf38f5053396c98f23ee9c91c5Edge-dependent structural, electronic and magnetic properties of MoS2 nanoribbonsPan, Hui; Zhang, Yong-WeiJournal of Materials Chemistry (2012), 22 (15), 7280-7290CODEN: JMACEP; ISSN:0959-9428. (Royal Society of Chemistry)Two-dimensional materials have various applications in next-generation nanodevices because of their easy fabrication and particular properties. In this work, we studied the effects of edge structures on the edge stability, and electronic and magnetic properties of MoS2 nanoribbons by first-principles calcns. We predicted that S-terminated zigzag nanoribbons are the most stable even without hydrogen satn. because of their low and neg. edge energies, although hydrogen satn. of the edge states can stabilize other nanoribbons with different edge structures. MoS2 zigzag nanoribbons are metallic and ferromagnetic. Importantly, their cond. may be semiconducting (n- or p-type) or half metallic by controlling the edge structures satd. with H atoms. The magnetic states of the MoS2 zigzag nanoribbons are enhanced by H-satn. and are much stronger than those of graphene zigzag nanoribbons. The armchair nanoribbons are semiconducting, with bandgaps increased by the hydrogen satn. of their edge states, and are nonmagnetic. These MoS2 nanoribbons with versatile functions may have applications in spintronics, nanodevices, and energy harvesting.
- 40Wang, L.; Zhou, X.; Ma, T.; Liu, D.; Gao, L.; Li, X.; Zhang, J.; Hu, Y.; Wang, H.; Dai, Y.; Luo, J. Superlubricity of a graphene/MoS2 heterostructure: a combined experimental and DFT study. Nanoscale 2017, 9, 10846– 10853, DOI: 10.1039/c7nr01451aGoogle Scholar40https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2sXhtV2qt77J&md5=cfa5e393dfd5ead15667e6111f62d22eSuperlubricity of a graphene/MoS2 heterostructure: a combined experimental and DFT studyWang, Linfeng; Zhou, Xiang; Ma, Tianbao; Liu, Dameng; Gao, Lei; Li, Xin; Zhang, Jun; Hu, Yuanzhong; Wang, Hui; Dai, Yadong; Luo, JianbinNanoscale (2017), 9 (30), 10846-10853CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)Graphene and other two-dimensional materials have been proved to be able to offer low friction. Here we assembled van der Waals heterostructures with graphene and molybdenum disulfide monolayers. The Raman spectrum together with a modified linear chain model indicate a two-orders-of-magnitude decrease in the interlayer lateral force const., as compared with their homogeneous bilayers, indicating a possible routine to achieve superlubricity. The decrease in the interlayer lateral force const. is consistent with the ultrasmall potential energy corrugation during sliding, which is derived from d. functional theory calcns. The potential energy corrugation is found to be detd. by the sliding-induced interfacial charge d. fluctuation, suggesting a new perspective to understand the phys. origin of the at. scale friction of two-dimensional materials.
- 41Batzill, M. Mirror twin grain boundaries in molybdenum dichalcogenides. J. Phys.: Condens. Matter 2018, 30, 493001, DOI: 10.1088/1361-648x/aae9cfGoogle Scholar41https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1MXktFCksbo%253D&md5=2a1966747095ef0b7bed7620b49c58f7Mirror twin grain boundaries in molybdenum dichalcogenidesBatzill, MatthiasJournal of Physics: Condensed Matter (2018), 30 (49), 493001/1-493001/15CODEN: JCOMEL; ISSN:0953-8984. (IOP Publishing Ltd.)A review. Mirror twin grain boundaries (MTBs) exist at the interface between 2 grains of 60° rotated hexagonal transition metal dichalcogenides (TMDC). These grain boundaries form a regular at. structure that extends in one dimension and thus may be described as a one-dimensional (1D) lattice embedded in the 2-dimensional TMDC. In this review, the different at. structures and compns. of these MTBs are discussed. The obvious formation of MTBs is by coalescence of 2 twinned grains. However, in MoSe2 and MoTe2 a different formation mechanism was revealed for the formation of Mo-rich MTBs. Excess Mo can be incorporated into the TMDC lattices. These excess Mo atoms can then reorganize into closed, triangular MTB-loops that can grow in size by adding more Mo atoms to them. This mechanism gave dense MTB networks in MoSe2 and MoTe2. Such MTB networks were obsd. in samples grown by MBE and consequently their presence needs to be considered in understanding the properties of MBE grown MoSe2 and MoTe2. D. functional theory as well as photoemission spectroscopy of MTB networks showed that MTBs exhibit dispersing 1-dimensional-bands that intersect the Fermi-level, thus suggesting that these are 1-dimensional electron systems. Consequently, exptl. data were interpreted to reveal a charge d. wave (or Peierls) instability, as well as a Tomonaga-Luttinger liq. behavior for electrons confined in 1D. These observations and the controversies that remain in the interpretation of some data are discussed. The metallic properties of the MTBs and their formation in dense networks also sparked the potential use of such crystal modifications for making metallic contacts to MoTe2 or MoSe2. Also, these crystal modifications may also boost the catalytic properties of these materials.
- 42Kim, J. H.; Kim, S. Y.; Park, S. O.; Jung, G. Y.; Song, S.; Sohn, A.; Kim, S. W.; Kwak, S. K.; Kwon, S. Y.; Lee, Z. Antiphase Boundaries as Faceted Metallic Wires in 2D Transition Metal Dichalcogenides. Adv. Sci. 2020, 7, 2000788, DOI: 10.1002/advs.202000788Google Scholar42https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BB3cXis1Cktb7L&md5=556ffb35c07f678cc3eb95874ef730d5Antiphase Boundaries as Faceted Metallic Wires in 2D Transition Metal DichalcogenidesKim, Jung Hwa; Kim, Se-Yang; Park, Sung O.; Jung, Gwan Yeong; Song, Seunguk; Sohn, Ahrum; Kim, Sang-Woo; Kwak, Sang Kyu; Kwon, Soon-Yong; Lee, ZonghoonAdvanced Science (Weinheim, Germany) (2020), 7 (15), 2000788CODEN: ASDCCF; ISSN:2198-3844. (Wiley-VCH Verlag GmbH & Co. KGaA)Antiphase boundaries (APBs) in 2D transition metal dichalcogenides have attracted wide interest as 1D metallic wires embedded in a semiconducting matrix, which could be exploited in fully 2D-integrated circuits. Here, the anisotropic morphologies of APBs (i.e., linear and saw-toothed APBs) in the nanoscale are investigated. The exptl. and computational results show that despite their anisotropic nanoscale morphologies, all APBs adopt a predominantly chalcogen-oriented dense structure to maintain the energetically most stable at. configuration. Moreover, the effect of the nanoscale morphol. of an APB on electron transport from two-probe field effect transistor measurements is investigated. A saw-toothed APB has a considerably lower electron mobility than a linear APB, indicating that kinks between facets are the main factors of scattering. The observations contribute to the systematical understanding of the faceted APBs and its impact on elec. transport behavior and it could potentially extend the applications of 2D materials through defect engineering to achieve the desired properties.
- 43Zhou, S.; Wang, S.; Shi, Z.; Sawada, H.; Kirkland, A. I.; Li, J.; Warner, J. H. Atomically sharp interlayer stacking shifts at anti-phase grain boundaries in overlapping MoS2 secondary layers. Nanoscale 2018, 10, 16692– 16702, DOI: 10.1039/c8nr04486dGoogle Scholar43https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhs1WhsbzK&md5=a52c08deea4733d2f50250ba1ef630b5Atomically sharp interlayer stacking shifts at anti-phase grain boundaries in overlapping MoS2 secondary layersZhou, Si; Wang, Shanshan; Shi, Zhe; Sawada, Hidetaka; Kirkland, Angus I.; Li, Ju; Warner, Jamie H.Nanoscale (2018), 10 (35), 16692-16702CODEN: NANOHL; ISSN:2040-3372. (Royal Society of Chemistry)When secondary domains nucleate and grow on the surface of monolayer MoS2, they can extend across grain boundaries in the underlying monolayer MoS2 and form overlapping sections. We present an at. level study of overlapping antiphase grain boundaries (GBs) in MoS2 monolayer-bilayers using aberration-cor. annular dark field scanning transmission electron microscopy. In particular we focus on the antiphase GB within a monolayer and track its propagation through an overlapping bilayer domain. We show that this leads to an atomically sharp interface between 2H and 3R interlayer stacking in the bilayer region. We have studied the micro-nanoscale "meandering" of the antiphase GB in MoS2, which shows a directional dependence on the d. of 4 and 8 member ring defects, as well as sharp turning angles 90°-100° that are mediated by a special 8-member ring defect. D. functional theory has been used to explore the overlapping interlayer stacking around the antiphase GBs, confirming our exptl. findings. These results show that overlapping secondary bilayer MoS2 domains cause at. structure modification to underlying anti-phase GB sites to accommodate the van der Waals interactions.
- 44Du, L.; Yu, H.; Liao, M.; Wang, S.; Xie, L.; Lu, X.; Zhu, J.; Li, N.; Shen, C.; Chen, P.; Yang, R.; Shi, D.; Zhang, G. Modulating PL and electronic structures of MoS2/graphene heterostructures via interlayer twisting angle. Appl. Phys. Lett. 2017, 111, 263106, DOI: 10.1063/1.5011120Google Scholar44https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC1cXhvVektQ%253D%253D&md5=6f7dcf199e5633941c0ce80a9307c318Modulating PL and electronic structures of MoS2/graphene heterostructures via interlayer twisting angleDu, Luojun; Yu, Hua; Liao, Mengzhou; Wang, Shuopei; Xie, Li; Lu, Xiaobo; Zhu, Jianqi; Li, Na; Shen, Cheng; Chen, Peng; Yang, Rong; Shi, Dongxia; Zhang, GuangyuApplied Physics Letters (2017), 111 (26), 263106/1-263106/5CODEN: APPLAB; ISSN:0003-6951. (American Institute of Physics)Stacking two-dimensional materials into van der Waals heterostructures with distinct interlayer twisting angles opens up new strategies for electronic structure and phys. property engineering. Here, we investigate how the interlayer twisting angles affect the photoluminescence (PL) and Raman spectra of the MoS2/graphene heterostructures. Based on a series of heterostructure samples with different interlayer twisting angles, we found that the PL and Raman spectra of the monolayer MoS2 in these heterostructures are strongly twisting angle dependent. When the interlayer twisting angle evolves from 0° to 30°, both the PL intensity and emission energy increase, while the splitting of the E2g Raman mode decreases gradually. The obsd. phenomena are attributed to the twisting angle dependent interlayer interaction and misorientation-induced lattice strain between MoS2 and graphene. (c) 2017 American Institute of Physics.
- 45Liao, M.; Wu, Z.-W.; Du, L.; Zhang, T.; Wei, Z.; Zhu, J.; Yu, H.; Tang, J.; Gu, L.; Xing, Y.; Yang, R.; Shi, D.; Yao, Y.; Zhang, G. Twist angle-dependent conductivities across MoS2/graphene heterojunctions. Nat. Commun. 2018, 9, 4068, DOI: 10.1038/s41467-018-06555-wGoogle Scholar45https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A280%3ADC%252BB3czmtVWkug%253D%253D&md5=07735dcb7862261e9d969dd90d775bf0Twist angle-dependent conductivities across MoS2/graphene heterojunctionsLiao Mengzhou; Du Luojun; Zhang Tingting; Wei Zheng; Zhu Jianqi; Yu Hua; Tang Jian; Gu Lin; Yang Rong; Shi Dongxia; Zhang Guangyu; Liao Mengzhou; Du Luojun; Zhang Tingting; Wei Zheng; Zhu Jianqi; Yu Hua; Tang Jian; Gu Lin; Yang Rong; Shi Dongxia; Zhang Guangyu; Wu Ze-Wen; Zhang Tingting; Xing Yanxia; Yao Yugui; Yang Rong; Shi Dongxia; Zhang Guangyu; Zhang GuangyuNature communications (2018), 9 (1), 4068 ISSN:.Van der Waals heterostructures stacked from different two-dimensional materials offer a unique platform for addressing many fundamental physics and construction of advanced devices. Twist angle between the two individual layers plays a crucial role in tuning the heterostructure properties. Here we report the experimental investigation of the twist angle-dependent conductivities in MoS2/graphene van der Waals heterojunctions. We found that the vertical conductivity of the heterojunction can be tuned by ∼5 times under different twist configurations, and the highest/lowest conductivity occurs at a twist angle of 0°/30°. Density functional theory simulations suggest that this conductivity change originates from the transmission coefficient difference in the heterojunctions with different twist angles. Our work provides a guidance in using the MoS2/graphene heterojunction for electronics, especially on reducing the contact resistance in MoS2 devices as well as other TMDCs devices contacted by graphene.
- 46Büch, H.; Rossi, A.; Forti, S.; Convertino, D.; Tozzini, V.; Coletti, C. Superlubricity of epitaxial monolayer WS2 on graphene. Nano Res. 2018, 11, 5946– 5956, DOI: 10.1007/s12274-018-2108-7Google ScholarThere is no corresponding record for this reference.
- 47Azizi, A.; Eichfeld, S.; Geschwind, G.; Zhang, K.; Jiang, B.; Mukherjee, D.; Hossain, L.; Piasecki, A. F.; Kabius, B.; Robinson, J. A.; Alem, N. Freestanding van der Waals Heterostructures of Graphene and Transition Metal Dichalcogenides. ACS Nano 2015, 9, 4882– 4890, DOI: 10.1021/acsnano.5b01677Google Scholar47https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXms1OmsrY%253D&md5=83deb118ea1c36c4b6259f67817afd0cFreestanding van der Waals Heterostructures of Graphene and Transition Metal DichalcogenidesAzizi, Amin; Eichfeld, Sarah; Geschwind, Gayle; Zhang, Kehao; Jiang, Bin; Mukherjee, Debangshu; Hossain, Lorraine; Piasecki, Aleksander F.; Kabius, Bernd; Robinson, Joshua A.; Alem, NasimACS Nano (2015), 9 (5), 4882-4890CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)Vertical stacking of two-dimensional (2D) crystals has recently attracted substantial interest due to unique properties and potential applications they can introduce. However, little is known about their microstructure because fabrication of the 2-dimensional heterostructures on a rigid substrate limits one's ability to directly study their at. and chem. structures using electron microscopy. This study demonstrates a unique approach to create atomically thin freestanding van der Waals heterostructures-WSe2/graphene and MoS2/graphene-as ideal model systems to study the nucleation and growth mechanisms in heterostructures. The authors use TEM imaging and diffraction to show epitaxial growth of the freestanding WSe2/graphene heterostructure, while no epitaxy is maintained in the MoS2/graphene heterostructure. Ultra-high-resoln. aberration-cor. scanning TEM (STEM) shows growth of monolayer WSe2 and MoS2 triangles on graphene membranes and reveals their edge morphol. and crystallinity. Photoluminescence measurements indicate a significant quenching of the photoluminescence response for the transition metal dichalcogenides on freestanding graphene, compared to those on a rigid substrate, such as sapphire and epitaxial graphene. Using a combination of (S)TEM imaging and electron diffraction anal., this study also reveals the significant role of defects on the heterostructure growth. The direct growth technique applied here enables the authors to study the heterostructure nucleation and growth mechanisms at the at. level without sample handling and transfer. Importantly, this approach can be used to study a wide spectrum of van der Waals heterostructures.
- 48Shi, J.; Liu, M.; Wen, J.; Ren, X.; Zhou, X.; Ji, Q.; Ma, D.; Zhang, Y.; Jin, C.; Chen, H.; Deng, S.; Xu, N.; Liu, Z.; Zhang, Y. All Chemical Vapor Deposition Synthesis and Intrinsic Bandgap Observation of MoS2/Graphene Heterostructures. Adv. Mater. 2015, 27, 7086– 7092, DOI: 10.1002/adma.201503342Google Scholar48https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXhs1WlsbvK&md5=344671187bc6ef6c88376b97f573bd21All Chemical Vapor Deposition Synthesis and Intrinsic Bandgap Observation of MoS2/Graphene HeterostructuresShi, Jianping; Liu, Mengxi; Wen, Jinxiu; Ren, Xibiao; Zhou, Xiebo; Ji, Qingqing; Ma, Donglin; Zhang, Yu; Jin, Chuanhong; Chen, Huanjun; Deng, Shaozhi; Xu, Ningsheng; Liu, Zhongfan; Zhang, YanfengAdvanced Materials (Weinheim, Germany) (2015), 27 (44), 7086-7092CODEN: ADVMEW; ISSN:0935-9648. (Wiley-VCH Verlag GmbH & Co. KGaA)By exploiting an all-CVD approach, the authors have successfully fabricated large area, thickness uniform, and high quality MoS2 /graphene vertical heterostructures with clean interfaces on conventional Au foil substrates. Spectroscopic characterizations reveal that the in-between graphene weakens the interface interaction between MoS2 and Au. This to some extend provide us a unique pathway for constructing a nearly freestanding MoS2 monolayer, which is evidenced by its very weak n-doping level and its intrinsic band feature according to STM/STS characterizations. Moreover, the MoS2/Graphene heterostructure is transferable onto arbitrary substrates, which will stimulate further in-depth investigations on the intrinsic electronic properties of monolayer MoS2 , and facilitate the development of ground breaking optoelectronic devices.
- 49Miwa, J. A.; Dendzik, M.; Grønborg, S. S.; Bianchi, M.; Lauritsen, J. V.; Hofmann, P.; Ulstrup, S. Van der Waals Epitaxy of Two-Dimensional MoS2–Graphene Heterostructures in Ultrahigh Vacuum. ACS Nano 2015, 9, 6502– 6510, DOI: 10.1021/acsnano.5b02345Google Scholar49https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXpsFOhtr0%253D&md5=a9dc452d7985d5a470e5f234232886f9Van der Waals Epitaxy of Two-Dimensional MoS2-Graphene Heterostructures in Ultrahigh VacuumMiwa, Jill A.; Dendzik, Maciej; Groenborg, Signe S.; Bianchi, Marco; Lauritsen, Jeppe V.; Hofmann, Philip; Ulstrup, SoerenACS Nano (2015), 9 (6), 6502-6510CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)In this work, we demonstrate direct van der Waals epitaxy of MoS2-graphene heterostructures on a semiconducting silicon carbide (SiC) substrate under ultrahigh vacuum conditions. Angle-resolved photoemission spectroscopy (ARPES) measurements show that the electronic structure of free-standing single-layer (SL) MoS2 is retained in these heterostructures due to the weak van der Waals interaction between adjacent materials. The MoS2 synthesis is based on a reactive phys. vapor deposition technique involving Mo evapn. and sulfurization in a H2S atm. on a template consisting of epitaxially grown graphene on SiC. Using scanning tunneling microscopy, we study the seeding of Mo on this substrate and the evolution from nanoscale MoS2 islands to SL and bilayer (BL) MoS2 sheets during H2S exposure. Our ARPES measurements of SL and BL MoS2 on graphene reveal the coexistence of the Dirac states of graphene and the expected valence band of MoS2 with the band max. shifted to the corner of the Brillouin zone at ‾K in the SL limit. We confirm the 2D character of these electronic states via a lack of dispersion with photon energy. The growth of epitaxial MoS2-graphene heterostructures on SiC opens new opportunities for further in situ studies of the fundamental properties of these complex materials, as well as perspectives for implementing them in various device schemes to exploit their many promising electronic and optical properties.
- 50Ago, H.; Endo, H.; Solís-Fernández, P.; Takizawa, R.; Ohta, Y.; Fujita, Y.; Yamamoto, K.; Tsuji, M. Controlled van der Waals Epitaxy of Monolayer MoS2 Triangular Domains on Graphene. ACS Appl. Mater. Interfaces 2015, 7, 5265– 5273, DOI: 10.1021/am508569mGoogle Scholar50https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXjtVentb0%253D&md5=32fca588c1995a8175f4e7603802eb69Controlled van der Waals Epitaxy of Monolayer MoS2 Triangular Domains on GrapheneAgo, Hiroki; Endo, Hiroko; Solis-Fernandez, Pablo; Takizawa, Rina; Ohta, Yujiro; Fujita, Yusuke; Yamamoto, Kazuhiro; Tsuji, MasaharuACS Applied Materials & Interfaces (2015), 7 (9), 5265-5273CODEN: AAMICK; ISSN:1944-8244. (American Chemical Society)Multilayered heterostructures of two-dimensional materials have recently attracted increased interest because of their unique electronic and optical properties. Here, the authors present CVD growth of triangular crystals of monolayer MoS2 on single-cryst. hexagonal graphene domains which are also grown by CVD. MoS2 grows selectively on the graphene domains rather than on the bare supporting SiO2 surface. Reflecting the heteroepitaxy of the growth process, the MoS2 domains grown on graphene present two preferred equiv. orientations. The interaction between the MoS2 and the graphene induced an upshift of the Raman G and 2-dimensional bands of the graphene, while significant photoluminescence quenching was obsd. for the monolayer MoS2. Also, photoinduced current modulation along with an optical memory effect was demonstrated for the MoS2-graphene heterostructure. The authors' work highlights that heterostructures synthesized by CVD offer an effective interlayer van der Waals interaction which can be developed for large-area multilayer electronic and photonic devices.
- 51Liu, X.; Balla, I.; Bergeron, H.; Campbell, G. P.; Bedzyk, M. J.; Hersam, M. C. Rotationally Commensurate Growth of MoS2 on Epitaxial Graphene. ACS Nano 2016, 10, 1067– 1075, DOI: 10.1021/acsnano.5b06398Google Scholar51https://chemport.cas.org/services/resolver?origin=ACS&resolution=options&coi=1%3ACAS%3A528%3ADC%252BC2MXhvVarsLbI&md5=146285e61a1cf559def35f4efbb4fe51Rotationally Commensurate Growth of MoS2 on Epitaxial GrapheneLiu, Xiaolong; Balla, Itamar; Bergeron, Hadallia; Campbell, Gavin P.; Bedzyk, Michael J.; Hersam, Mark C.ACS Nano (2016), 10 (1), 1067-1075CODEN: ANCAC3; ISSN:1936-0851. (American Chemical Society)Atomically thin MoS2/graphene heterostructures are promising candidates for nanoelectronic and optoelectronic technologies. Among different graphene substrates, epitaxial graphene (EG) on SiC provides several potential advantages for such heterostructures, including high electronic quality, tunable substrate coupling, wafer-scale processability, and cryst. ordering that can template commensurate growth. Exploiting these attributes, the authors demonstrate here the thickness-controlled van der Waals epitaxial growth of MoS2 on EG via CVD, giving rise to transfer-free synthesis of a two-dimensional heterostructure with registry between its constituent materials. The rotational commensurability obsd. between the MoS2 and EG is driven by the energetically favorable alignment of their resp. lattices and results in nearly strain-free MoS2, as evidenced by synchrotron x-ray scattering and at.-resoln. scanning tunneling microscopy (STM). The electronic nature of the MoS2/EG heterostructure is elucidated with STM and scanning tunneling spectroscopy, which reveals bias-dependent apparent thickness, band bending, and a reduced band gap of ∼0.4 eV at the monolayer MoS2 edges.
Supporting Information
Supporting Information
ARTICLE SECTIONSThe Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsomega.1c03002.
Fabrication of suspended graphene and drop casting of the MoS2 precursor, in situ STEM and MoS2 orientation analysis, training data, images of the in situ heating holder and chip with suspended graphene, time-elapsed HAADF-STEM images of mobile Mo atoms on graphene at 500 °C, time-elapsed HAADF-STEM images of the roto-translational motion of MoS2 on graphene at 500 °C, atomic-resolution TEM image of MoS2 clusters on graphene and histogram of misorientation angles, HAADF-STEM image of MoS2 clusters, architecture of the DeepSTEM framework and Appendix A: autoencoder (PDF)
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