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Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
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    Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
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    Department of Materials Science and Engineering, National Taiwan University, Taipei 10617, Taiwan, Republic of China
    Research Center for Applied Sciences, Academia Sinica, 128 Sec. 2, Academia Road, Nankang, Taipei 11529, Taiwan
    § Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan 70101, Taiwan
    Graduate Institute of Electronic Engineering and Green Technology Research Center, Chang Gung University, Taoyuan 333, Taiwan
    # Kyoto Institute of Technology, Kyoto 606-8585, Japan
    || National Nano Device Laboratories, Hsinchu 30078, Taiwan
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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2013, 5, 2, 227–232
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    https://doi.org/10.1021/am301799j
    Published December 21, 2012
    Copyright © 2012 American Chemical Society

    Abstract

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    Remote plasma in situ atomic layer doping technique was applied to prepare an n-type nitrogen-doped ZnO (n-ZnO:N) layer upon p-type magnesium-doped GaN (p-GaN:Mg) to fabricate the n-ZnO:N/p-GaN:Mg heterojuntion light-emitting diodes. The room-temperature electroluminescence exhibits a dominant ultraviolet peak at λ ≈ 370 nm from ZnO band-edge emission and suppressed luminescence from GaN, as a result of the decrease in electron concentration in ZnO and reduced electron injection from n-ZnO:N to p-GaN:Mg because of the nitrogen incorporation. The result indicates that the in situ atomic layer doping technique is an effective approach to tailoring the electrical properties of materials in device applications.

    Copyright © 2012 American Chemical Society

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    Cited By

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    This article is cited by 15 publications.

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    7. Zhengning Gao, Parag Banerjee. Review Article: Atomic layer deposition of doped ZnO films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2019, 37 (5) https://doi.org/10.1116/1.5112777
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    11. L. Balakrishnan, S. Gokul Raj, S. R. Meher, K. Asokan, Z. C. Alex. Impact of 100 MeV Ag7+ SHI irradiation fluence and N incorporation on structural, optical, electrical and gas sensing properties of ZnO thin films. Applied Physics A 2015, 119 (4) , 1541-1553. https://doi.org/10.1007/s00339-015-9136-x
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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2013, 5, 2, 227–232
    Click to copy citationCitation copied!
    https://doi.org/10.1021/am301799j
    Published December 21, 2012
    Copyright © 2012 American Chemical Society

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