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Microstructural Characterization and Electrochemical Properties of RuO2 Thin Film Electrodes Prepared by Reactive Radio-Frequency Magnetron Sputtering

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I.N.F.M., Dipartimento di Chimica Fisica dell'Università, Calle Larga S. Marta 2137, 30123 Venezia, Italy, I.N.F.M., Dipartimento di Fisica dell'Università, via Marzolo 8, 35131 Padova and I.N.F.N., Laboratori Nazionali di Legnaro, via Romea 4, 35020 Legnaro, Italy, Dipartimento di Chimica Fisica dell'Università, Calle Larga S. Marta 2137, 30123 Venezia, Italy, and Dipartimento di Chimica dell'Università, via L. Borsari 46, 44100 Ferrara, Italy
Cite this: Chem. Mater. 2004, 16, 5, 946–952
Publication Date (Web):February 11, 2004
https://doi.org/10.1021/cm034610k
Copyright © 2004 American Chemical Society

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    Abstract

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    Ruthenium dioxide films were prepared by radio-frequency magnetron sputtering onto Si and Ti substrates. Films of different thicknesses (100−500 nm) were synthesized at substrate temperatures of 40, 350, and 450 °C. Their composition has been studied by Rutherford backscattering spectrometry, elastic recoil detection, and ion beam nuclear reaction analysis. Scanning electron microscopy and wide-angle X-ray scattering have been used for studying the surface texture of the samples and for their microstructural characterization, respectively. The electrochemical characterization by cyclic voltammetry has shown that, despite the high physical density of the films, compared with that obtained by the thermochemical methods, they exhibit large charge-storage capacities. For the materials synthesized at 350−450 °C, an explanation of these results has been sought in specific features of the RuO2 rutile-type cell and columnar texture of the oxide film. The much higher capacity of the films synthesized at 40 °C would be rather due to a poor sintering of the oxide phase. Study of the chlorine evolution reaction in the samples prepared at 350 and 450 °C points to a Volmer−Tafel mechanism, with a chemical desorption rate-determining step, and significant radical intermediate coverage. Films deposited at 40 °C exhibited an unsatisfactory wear resistance under the anodic polarization required for the chlorine evolution reaction investigation.

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     I.N.F.M., Dipartimento di Chimica Fisica dell'Università.

     I.N.F.M., Dipartimento di Fisica dell'Università and I.N.F.N., Laboratori Nazionali di Legnaro.

    §

     Dipartimento di Chimica Fisica dell'Università.

     Dipartimento di Chimica dell'Università.

    *

     Corresponding author.

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