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Direct Decomposition of NO Activated by Microwave Discharge
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    Direct Decomposition of NO Activated by Microwave Discharge
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    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China
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    Industrial & Engineering Chemistry Research

    Cite this: Ind. Eng. Chem. Res. 2003, 42, 24, 5993–5999
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    https://doi.org/10.1021/ie0304208
    Published November 1, 2003
    Copyright © 2003 American Chemical Society

    Abstract

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    The environmentally friendly removal of NO has been investigated using continuous microwave discharge (CMD) at atmospheric pressure. In these experiments, conversions of NO to N2 as well as NO2 were mainly observed for both dry and wet feed gas, which showed a great difference from those observed with other discharge methods. The effects of a series of reaction parameters, including microwave input power, O2 concentration, NO concentration, and gas flow rate, on the product distribution and energy efficiency were also studied. Under all reaction conditions, the conversions of NO to N2 were higher than those to NO2. The highest conversion of NO to N2 was 88%. The reaction rate of NO removal and the effects of the different discharge modes on NO conversion and product distribution are also discussed. Through comparison of the results of different discharge modes, it was found that the addition of CH4 apparently increased the conversion of NO to N2 as well as the energy efficiency. A possible reaction process is suggested.

    Copyright © 2003 American Chemical Society

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     To whom correspondence should be addressed. Address:  State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, P.O. Box 110, Dalian 116023, China. Tel.:  +86-411-4678404. Fax:  +86-411-4691570. E-mail:  [email protected].

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    This article is cited by 10 publications.

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    Industrial & Engineering Chemistry Research

    Cite this: Ind. Eng. Chem. Res. 2003, 42, 24, 5993–5999
    Click to copy citationCitation copied!
    https://doi.org/10.1021/ie0304208
    Published November 1, 2003
    Copyright © 2003 American Chemical Society

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