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Bonding Self-Assembled, Compact Organophosphonate Monolayers to the Native Oxide Surface of Silicon

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Contribution from the Department of Chemistry, Princeton University, Princeton, New Jersey 08544-1009
Cite this: J. Am. Chem. Soc. 2003, 125, 51, 16074–16080
Publication Date (Web):November 25, 2003
https://doi.org/10.1021/ja035956z
Copyright © 2003 American Chemical Society

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    Abstract

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    A new method is described to prepare strongly bonded, compact monolayer films of alkyl- or arylphosphonates on the native oxide surface of Si (SiO2/Si). This method is illustrated for octadecyl- and α-quarterthiophene-2-phosphonates. For both cases, AFM shows comprehensive coverage of the SiO2/Si surface. The thickness of the continuous film of 4TP/SiO2/Si was measured both by AFM and by X-ray reflectivity to be ca. 18 Å. Direct gravimetric analysis shows surface coverage by α-quarterthiophene-2-phosphonate to be about 0.66 nmol/cm2, which corresponds to molecular packing in the film close to that of crystalline α-quarterthiophene. Coverage by octadecylphosphonate was ca. 0.90 nmol/cm2, corresponding to a cross-sectional area of about 18.5 Å2/molecule, consistent with close-packed alkyl chains.

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    The 1H NMR spectrum (400 MHz; acetone-d6) of α-quarterthiophene-2-phosphonate diethyl ester (aromatic region) (PDF). This material is available free of charge via the Internet at http://pubs.acs.org.

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