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Single Etch Patterning of Stacked Silver and Molybdenum Alloy Layers on Glass Using Microcontact Wave Printing

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Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands, and Philips Applied Technologies, 5600 MD Eindhoven, The Netherlands
Cite this: J. Am. Chem. Soc. 2005, 127, 31, 10786–10787
Publication Date (Web):July 13, 2005
https://doi.org/10.1021/ja0523791
Copyright © 2005 American Chemical Society

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    Abstract

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    Stacked thin layers of silver alloy (AgPdCu) and MoCr layers on 10 × 15 cm2 glass substrates were patterned by microcontact wave printing and etching. Patterns of etch-resistant octadecanethiol self-assembled monolayers (SAMs) were wave printed with regular backplane stabilized PDMS stamps. Pattern development was achieved by etching both metal layers in a single step, employing a nitric acid-based etching bath. Trifluoroacetic acid and a nitrite salt were identified as essential bath components for a homogeneous etching process. Etch defects could be eliminated by the addition of a decanesulfonate, which stabilizes the SAM resist via a defect healing mechanism.

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     Philips Research.

     Philips Applied Technologies.

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    Figures S1−S7 and experimental details. This material is available free of charge via the Internet at http://pubs.acs.org.

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    Cited By

    This article is cited by 10 publications.

    1. Xiaoyan Mu, Aiting Gao, Dehui Wang, and Peng Yang . Self-Assembled Monolayer-Assisted Negative Lithography. Langmuir 2015, 31 (9) , 2922-2930. https://doi.org/10.1021/la504516e
    2. Stefan Tampier, Rainer Müller, Andrea Thorn, Eike Hübner and Nicolai Burzlaff . Synthesis, Structure, and Reactivity of Ruthenium Carboxylato and 2-Oxocarboxylato Complexes Bearing the Bis(3,5-dimethylpyrazol-1-yl)acetato Ligand. Inorganic Chemistry 2008, 47 (20) , 9624-9641. https://doi.org/10.1021/ic8000224
    3. Dirk Burdinski and, Martin H. Blees. Thiosulfate- and Thiosulfonate-Based Etchants for the Patterning of Gold Using Microcontact Printing. Chemistry of Materials 2007, 19 (16) , 3933-3944. https://doi.org/10.1021/cm070864k
    4. Etienne Menard,, Matthew A. Meitl,, Yugang Sun,, Jang-Ung Park,, Daniel Jay-Lee Shir,, Yun-Suk Nam,, Seokwoo Jeon, and, John A. Rogers. Micro- and Nanopatterning Techniques for Organic Electronic and Optoelectronic Systems. Chemical Reviews 2007, 107 (4) , 1117-1160. https://doi.org/10.1021/cr050139y
    5. Ruben B. A. Sharpe,, Dirk Burdinski,, Cees van der Marel,, Jan A. J. Jansen,, Jurriaan Huskens,, Harold J. W. Zandvliet,, David N. Reinhoudt, and, Bene Poelsema. Ink Dependence of Poly(dimethylsiloxane) Contamination in Microcontact Printing. Langmuir 2006, 22 (13) , 5945-5951. https://doi.org/10.1021/la053298l
    6. Milan Saalmink,, Cees van der Marel,, Henk R. Stapert, and, Dirk Burdinski. Positive Microcontact Printing with Mercaptoalkyloligo(ethylene glycol)s. Langmuir 2006, 22 (3) , 1016-1026. https://doi.org/10.1021/la052513v
    7. Jong‐Hyun Ahn, Matthew A. Meitl, Aflred J. Baca, Dahl‐Young Khang, Hoon‐Sik Kim, John A. Rogers. Transfer Printing Techniques and Inorganic Single‐Crystalline Materials for Flexible and Stretchable Electronics. 2008, 407-447. https://doi.org/10.1002/9780470407790.ch13
    8. Elie Bou Chakra, Benjamin Hannes, Gilles Dilosquer, Colin D. Mansfield, Michel Cabrera. A new instrument for automated microcontact printing with stamp load adjustment. Review of Scientific Instruments 2008, 79 (6) https://doi.org/10.1063/1.2936259
    9. Dirk Burdinski, Milan Saalmink, Jeroen P. W. G. van den Berg, Cees van der Marel. Universelle Tinte für den Mikrokontaktdruck. Angewandte Chemie 2006, 118 (26) , 4461-4465. https://doi.org/10.1002/ange.200600310
    10. Dirk Burdinski, Milan Saalmink, Jeroen P. W. G. van den Berg, Cees van der Marel. Universal Ink for Microcontact Printing. Angewandte Chemie International Edition 2006, 45 (26) , 4355-4358. https://doi.org/10.1002/anie.200600310

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