Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing
- Ruben B. A. Sharpe
- Dirk Burdinski
- Jurriaan Huskens
- Harold J. W. Zandvliet
- David N. Reinhoudt
- , and
- Bene Poelsema
In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.
MESA+ Institute for Nanotechnology, University of Twente.
In papers with more than one author, the asterisk indicates the name of the author to whom inquiries about the paper should be addressed.
MESA+ Strategic Research Orientation “Nanofabrication”, University of Twente.
Supramolecular Chemistry and Technology & Molecular Nanofabrication groups, University of Twente.
Solid State Physics, University of Twente.
This article is cited by 2 publications.
- Zhikun Zheng,, Menglong Yang, and, Bailin Zhang. Reversible Nanopatterning on Self-Assembled Monolayers on Gold. The Journal of Physical Chemistry C 2008, 112 (17) , 6597-6604. https://doi.org/10.1021/jp077684i
- Kevin M. Cook, Gregory S. Ferguson. Gold oxide as a protecting group for regioselective surface chemistry. Chemical Communications 2011, 47 (46) , 12550. https://doi.org/10.1039/c1cc15742f