Oxidized Gold as an Ultrathin Etch Resist Applied in Microcontact Printing
- Ruben B. A. Sharpe
- ,
- Dirk Burdinski
- ,
- Jurriaan Huskens
- ,
- Harold J. W. Zandvliet
- ,
- David N. Reinhoudt
- , and
- Bene Poelsema
Abstract
In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.
†
MESA+ Institute for Nanotechnology, University of Twente.
*
In papers with more than one author, the asterisk indicates the name of the author to whom inquiries about the paper should be addressed.
⊥
Philips Research.
‡
MESA+ Strategic Research Orientation “Nanofabrication”, University of Twente.
§
Supramolecular Chemistry and Technology & Molecular Nanofabrication groups, University of Twente.
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Solid State Physics, University of Twente.
Cited By
This article is cited by 2 publications.
- Zhikun Zheng,, Menglong Yang, and, Bailin Zhang. Reversible Nanopatterning on Self-Assembled Monolayers on Gold. The Journal of Physical Chemistry C 2008, 112 (17) , 6597-6604. https://doi.org/10.1021/jp077684i
- Kevin M. Cook, Gregory S. Ferguson. Gold oxide as a protecting group for regioselective surface chemistry. Chemical Communications 2011, 47 (46) , 12550. https://doi.org/10.1039/c1cc15742f