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Electronic Structure Engineering via On-Plane Chemical Functionalization: A Comparison Study on Two-Dimensional Polysilane and Graphane
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    Electronic Structure Engineering via On-Plane Chemical Functionalization: A Comparison Study on Two-Dimensional Polysilane and Graphane
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    Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei, Anhui 230026, China
    * Corresponding author. E-mail: [email protected]
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    The Journal of Physical Chemistry C

    Cite this: J. Phys. Chem. C 2009, 113, 38, 16741–16746
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    https://doi.org/10.1021/jp904208g
    Published July 28, 2009
    Copyright © 2009 American Chemical Society

    Abstract

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    Two-dimensional materials are important for electronics applications. A natural way of electronic structure engineering for two-dimensional systems is on-plane chemical functionalization. On the basis of density functional theory, we study the electronic structures of fluorine-substituted planar polysilane and graphane. We find that carbon and silicon present very different surface chemistries. The indirect energy gap of planar polysilane becomes direct upon fluorine decoration, and its gap width is mainly determined by fluorine coverage regardless of its distribution on the surface. However, the electronic structure of fluorine doped graphane is very sensitive to the doping configuration, due to the competition between antibonding states and nearly free electron (NFE) states. With specific fluorine distribution patterns, zero-dimensional and one-dimensional NFE states can be obtained. Our results demonstrate the advantages of two-dimensional silicon based materials compared with carbon based materials, in the viewpoint of practical electronic structure engineering by surface chemical functionalization.

    Copyright © 2009 American Chemical Society

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    Supporting Information

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    Energy of optimized structures, band structure of some functionalized polysilane and graphane, and density of some band edge states. This material is available free of charge via the Internet at http://pubs.acs.org.

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    The Journal of Physical Chemistry C

    Cite this: J. Phys. Chem. C 2009, 113, 38, 16741–16746
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    https://doi.org/10.1021/jp904208g
    Published July 28, 2009
    Copyright © 2009 American Chemical Society

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