ACS Publications. Most Trusted. Most Cited. Most Read
My Activity
CONTENT TYPES

Subsurface Oxidation for Micropatterning Silicon (SOMS)

View Author Information
Departments of Chemistry & Biochemistry and Physics & Astronomy, Brigham Young University, Provo Utah, and Yield Engineering Systems, Livermore, California
* Corresponding authors. (M.R.L.) Tel: 801-422-1699. Fax: 801-422-0153. E-mail: [email protected]
†Department of Chemistry & Biochemistry, Brigham Young University.
‡Department of Physics & Astronomy, Brigham Young University.
§Yield Engineering Systems.
Cite this: Langmuir 2009, 25, 3, 1289–1291
Publication Date (Web):January 9, 2009
https://doi.org/10.1021/la803408x
Copyright © 2009 American Chemical Society

    Article Views

    595

    Altmetric

    -

    Citations

    LEARN ABOUT THESE METRICS
    Other access options
    Supporting Info (1)»

    Abstract

    Abstract Image

    Here we present a straightforward patterning technique for silicon: subsurface oxidation for micropatterning silicon (SOMS). In this method, a stencil mask is placed above a silicon surface. Radio-frequency plasma oxidation of the substrate creates a pattern of thicker oxide in the exposed regions. Etching with HF or KOH produces very shallow or much higher aspect ratio features on silicon, respectively, where patterning is confirmed by atomic force microscopy, scanning electron microscopy, and optical microscopy. The oxidation process itself is studied under a variety of reaction conditions, including higher and lower oxygen pressures (2 and 0.5 Torr), a variety of powers (50−400 W), different times and as a function of reagent purity (99.5 or 99.994% oxygen). SOMS can be easily executed in any normal chemistry laboratory with a plasma generator. Because of its simplicity, it may have industrial viability.

    Read this article

    To access this article, please review the available access options below.

    Get instant access

    Purchase Access

    Read this article for 48 hours. Check out below using your ACS ID or as a guest.

    Recommended

    Access through Your Institution

    You may have access to this article through your institution.

    Your institution does not have access to this content. You can change your affiliated institution below.

    Supporting Information

    ARTICLE SECTIONS
    Jump To

    Experimental details and a number of additional results, including details of silicon plasma oxidation and an AFM image of patterned surfaces. This material is available free of charge via the Internet at http://pubs.acs.org.

    Terms & Conditions

    Most electronic Supporting Information files are available without a subscription to ACS Web Editions. Such files may be downloaded by article for research use (if there is a public use license linked to the relevant article, that license may permit other uses). Permission may be obtained from ACS for other uses through requests via the RightsLink permission system: http://pubs.acs.org/page/copyright/permissions.html.

    Cited By

    This article is cited by 4 publications.

    1. Vipul Gupta, Nitesh Madaan, David S. Jensen, Shawn C. Kunzler, and Matthew R. Linford . Hydrogen Plasma Treatment of Silicon Dioxide for Improved Silane Deposition. Langmuir 2013, 29 (11) , 3604-3609. https://doi.org/10.1021/la304491x
    2. Nitesh Madaan, Aaron Terry, John Harb, Robert C. Davis, Helmut Schlaad, and Matthew R. Linford . Thiol–Ene–Thiol Photofunctionalization of Thiolated Monolayers with Polybutadiene and Functional Thiols, Including Thiolated DNA. The Journal of Physical Chemistry C 2011, 115 (46) , 22931-22938. https://doi.org/10.1021/jp206134g
    3. Feng Zhang, Ken Sautter, Adam M. Larsen, Daniel A. Findley, Robert C. Davis, Hussein Samha, and Matthew R. Linford . Chemical Vapor Deposition of Three Aminosilanes on Silicon Dioxide: Surface Characterization, Stability, Effects of Silane Concentration, and Cyanine Dye Adsorption. Langmuir 2010, 26 (18) , 14648-14654. https://doi.org/10.1021/la102447y
    4. Vipul Gupta, Anubhav Diwan, Delwyn Evans, Clive Telford, Matthew R. Linford. Self-termination in the gas-phase layer-by-layer growth of an aza silane and water on planar silicon and nylon substrates. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 2014, 32 (6) https://doi.org/10.1116/1.4899936

    Pair your accounts.

    Export articles to Mendeley

    Get article recommendations from ACS based on references in your Mendeley library.

    Pair your accounts.

    Export articles to Mendeley

    Get article recommendations from ACS based on references in your Mendeley library.

    You’ve supercharged your research process with ACS and Mendeley!

    STEP 1:
    Click to create an ACS ID

    Please note: If you switch to a different device, you may be asked to login again with only your ACS ID.

    Please note: If you switch to a different device, you may be asked to login again with only your ACS ID.

    Please note: If you switch to a different device, you may be asked to login again with only your ACS ID.

    MENDELEY PAIRING EXPIRED
    Your Mendeley pairing has expired. Please reconnect