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Patterning Carbazole–Phenylazomethine Dendrimer Films

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† Chemical Resources Laboratory, Tokyo Institute of Technology, 4259 Nagatsutacho, Midoriku, Yokohama 226-8503, Japan
‡ Department of Chemistry and Department of Chemical Engineering, University of Houston, Houston, Texas 77204-5003, United States
*E-mail: [email protected] (K.Y.); [email protected] (R.C.A.).
Cite this: Macromolecules 2012, 45, 3, 1288–1295
Publication Date (Web):January 26, 2012
https://doi.org/10.1021/ma202485h
Copyright © 2012 American Chemical Society
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    Abstract

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    The synthesis of double-layer-type dendrimers with carbazole and phenylazomethine as the dendron with a symmetric tetraphenylmethane core is reported. Structural modeling studies showed that the G3 dendrimer has a rigid and spherical structure. These dendrimers were thermally stable (Td10% over 500 °C) with the TGA-MS study revealing a degradation mechanism occurring first at the inner-layer phenylazomethine group. The metal (Lewis acid) complexation property of these dendrimers was also studied. Electrochemical measurements showed that these dendrimers have the appropriate HOMO level as a hole-transporting material with electropolymerizability on the peripheral carbazole groups. A photo-cross-linking property of the dendrimer film was also observed. Finally, electro-nanopatterning with conducting AFM and photopatterning of the dendrimer film were demonstrated. Thus, the new dendrimer is a potential hole-transporting material that is patternable through oxidation of the peripheral carbazole units by either photochemical or electrochemical methods.

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