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Mechanically Tunable Three-Dimensional Elastomeric Network/Air Structures via Interference Lithography

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Institute for Soldier Nanotechnologies, Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, and Department of Materials Science and Engineering, Iowa State University, Ames, Iowa 50011
Cite this: Nano Lett. 2006, 6, 4, 740–743
Publication Date (Web):March 15, 2006
Copyright © 2006 American Chemical Society

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    Abstract Image

    We show how to employ an interference lithographic template (ILT) as a facile mold for fabricating three-dimensional bicontinuous PDMS (poly(dimethylsiloxane)) elastomeric structures and demonstrate the use of such a structure as a mechanically tunable PDMS/air phononic crystal. A positive photoresist was used to make the ILT, and after infiltration with PDMS, the resist was removed in a water-based basic solution which avoided PDMS swelling or pattern collapse occurring during the ILT removal process. Since the period of the structure is approximately 1 μm, the density of states of gigahertz phonons are altered by the phononic PDMS/air crystal. Brillouin light scattering (BLS) was employed to measure phononic modes of the structure as a function of mechanical strain. The results demonstrate that the phononic band diagram of such structures can be tuned mechanically.

     Massachusetts Institute of Technology.

     Iowa State University.


     Corresponding author:  tel, 617-253-5931; fax, 617-253-5859; e-mail, [email protected].

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