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Density Multiplication of Highly Periodic Sub-5 nm Supramolecular Dendrimer Cylinders on Block Copolymer Lamellar-Assisted High-Resolution Patterns

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Download Hi-Res ImageDownload to MS-PowerPointCite This:Langmuir 2023, 39, 50, 18229-18237
    Article

    Density Multiplication of Highly Periodic Sub-5 nm Supramolecular Dendrimer Cylinders on Block Copolymer Lamellar-Assisted High-Resolution Patterns
    Click to copy article linkArticle link copied!

    • Juhwan Lee
      Juhwan Lee
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      Korea Advanced Institute of Science and Technology (KAIST) Institute for Nanocentury, Yuseong-gu, Daejeon 34141, Korea
      Department of Chemistry and Nano Science, Ewha Womans University, Seoul 03760, Korea
      More by Juhwan Lee
    • Heejin Park
      Heejin Park
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      Korea Advanced Institute of Science and Technology (KAIST) Institute for Nanocentury, Yuseong-gu, Daejeon 34141, Korea
      More by Heejin Park
    • Wonmoo Lee
      Wonmoo Lee
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      Korea Advanced Institute of Science and Technology (KAIST) Institute for Nanocentury, Yuseong-gu, Daejeon 34141, Korea
      More by Wonmoo Lee
    • Kangho Park
      Kangho Park
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      Korea Advanced Institute of Science and Technology (KAIST) Institute for Nanocentury, Yuseong-gu, Daejeon 34141, Korea
      Semiconductor R&D Center, Samsung Electronics Inc, 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, Korea
      More by Kangho Park
    • Kiok Kwon
      Kiok Kwon
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      Korea Advanced Institute of Science and Technology (KAIST) Institute for Nanocentury, Yuseong-gu, Daejeon 34141, Korea
      Green Chemistry and Materials Group, Research Institute of Sustainable Manufacturing System, Korea Institute of Industrial Technology, Cheonan 31056, Korea
      More by Kiok Kwon
    • Hee-Tae Jung*
      Hee-Tae Jung
      Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
      *Email: [email protected]
      More by Hee-Tae Jung
      Orcidhttps://orcid.org/0000-0002-5727-6732
    Other Access OptionsSupporting Information (1)

    Langmuir

    Cite this: Langmuir 2023, 39, 50, 18229–18237
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acs.langmuir.3c01988
    Published December 4, 2023
    Copyright © 2023 American Chemical Society
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    Abstract

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    Density multiplication in nanopatterning is one of the most efficient techniques for increasing the resolution of the inherent patterns. Thus far, most of the density multiplication techniques integrate bottom-up (or top-down) patterning onto guide patterns prepared by the top-down approach. Although the bottom-up approach exhibits several advantages of cost-effectiveness and high resolution, very few studies have reported bottom-up patterning within a bottom-up template. In this study, the density multiplication of supramolecular cylinders into a block copolymer (BCP)-based guide lamellar pattern is demonstrated by the directed self-assembly (DSA) of a dendrimer and BCPs for the first time. Supramolecular cylinders of sub-5 nm scale are confined into trenches based on 50 and 100 nm scales of a lamellar polystyrene (PS)-poly(methyl methacrylate) (PMMA) BCP, which led to 10×-level to 20×-level density multiplication. Moreover, the orientation of the dendrimer is dependent on the dendrimer film thickness, and the corresponding mechanism is revealed. Notably, the strong guiding effect from the high-resolution guide patterns improved the ordering behavior in the highly curved pattern. Graphoepitaxy via the confinement of an ultrahigh-resolution dendrimer into the guide pattern based on BCP demonstrates promise as a density multiplication method for generating highly ordered nanostructures and complex structures.

    Copyright © 2023 American Chemical Society

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    Supporting Information

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    The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acs.langmuir.3c01988.

    • AFM and GISAXS data of guide pattern and dendrimer alignment, Synthesis of dendrimer (PDF)

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    Langmuir

    Cite this: Langmuir 2023, 39, 50, 18229–18237
    Click to copy citationCitation copied!
    https://doi.org/10.1021/acs.langmuir.3c01988
    Published December 4, 2023
    Copyright © 2023 American Chemical Society
    Request reuse permissions

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