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Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space
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    Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space
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    Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, #08-03 Innovis, 138634 Singapore
    Data Storage Institute, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, #08-01 Innovis, 138634 Singapore
    § Singapore University of Technology and Design, 8 Somapah Road, 487372, Singapore
    *E-mail: [email protected]. Telephone: +65 64994767).
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    Nano Letters

    Cite this: Nano Lett. 2017, 17, 12, 7620–7628
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    https://doi.org/10.1021/acs.nanolett.7b03613
    Published November 8, 2017
    Copyright © 2017 American Chemical Society

    Abstract

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    Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker’s conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials.

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    The Supporting Information is available free of charge on the ACS Publications website at DOI: 10.1021/acs.nanolett.7b03613.

    • Area fitting of the simulated silicon colors in the CIE chromaticity diagram, fabrication process, silicon color palette after the dry etching process, influence of numerical aperture on the silicon color palette, influence of the tilt angle on the silicon color palette, influence of the silicon nanodisk diameter and gap sizes, area fitting of silicon color palette after annealing in the CIE chromaticity diagram, flat silicon substrate with 70 nm thick Si3N4 layer, silicon nanodisks on silicon substrate without 70 nm thick Si3N4 layer, chromaticity diagram as generated by silicon nanodisks on quartz substrate, silicon color palette with an immersion oil, multimode decomposition simulations, silicon nanodisks for approximating white color pixel, silicon nanodisks for black pixel, color palettes by silicon nanorings and silicon nanodisk mixing, color matching functions, and multipolar decomposition technique (PDF)

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    Cite this: Nano Lett. 2017, 17, 12, 7620–7628
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    https://doi.org/10.1021/acs.nanolett.7b03613
    Published November 8, 2017
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