Communication

Photo-Cross-Linking-Assisted Thermal Stability of DNA Origami Structures and Its Application for Higher-Temperature Self-Assembly

Department of Chemistry, Graduate School of Science, Kyoto University, Kitashirakawa-oiwakecho, Sakyo-ku, Kyoto 606-8502, Japan
CREST, Japan Science and Technology Corporation (JST), Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan
Institute for Integrated Cell-Material Sciences (iCeMS), Kyoto University, Yoshida-ushinomiyacho, Sakyo-ku, Kyoto 606-8501, Japan
J. Am. Chem. Soc., 2011, 133 (37), pp 14488–14491
DOI: 10.1021/ja204546h
Publication Date (Web): August 22, 2011
Copyright © 2011 American Chemical Society

Abstract

Abstract Image

Heat tolerance of DNA origami structures has been improved about 30 °C by photo-cross-linking of 8-methoxypsoralen. To demonstrate one of its applications, the cross-linked origami were used for higher-temperature self-assembly, which markedly increased the yield of the assembled product when compared to the self-assembly of non-cross-linked origami at lower-temperature. By contrast, at higher-temperature annealing, native non-cross-linked tiles did not self-assemble to yield the desired product; however, they formed a nonspecific broken structure.

Materials and methods, the design of the tiles, and additional AFM images. This material is available free of charge via the Internet at http://pubs.acs.org.

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Article Views: 2,673 Times
Received 18 May 2011
Published online 22 August 2011
Published in print 21 September 2011
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