Article

Guided Deposition of Individual DNA Nanostructures on Silicon Substrates

Department of Chemistry and Biochemistry
Department of Electrical Engineering
University of Notre Dame, Notre Dame, Indiana 46556
Langmuir, 2010, 26 (15), pp 12680–12683
DOI: 10.1021/la101343k
Publication Date (Web): June 30, 2010
Copyright © 2010 American Chemical Society
*To whom correspondence should be addressed. E-mail: mlieberm@nd.edu., §

Present address: Nanoengineering Department, University of California, San Diego,CA

Abstract

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We demonstrate immobilization of DNA nanostructures (37 nm × 8 nm) on silicon by a combination of “top-down” fabrication and “bottom-up” self-assembly. Anchor lines and pads were defined using electron beam lithography and a cationic molecular monolayer. Individual DNA nanostructures bind in 85% yield onto the anchor pads and can be washed and imaged in air. The strength of the binding interaction between a DNA nanostructure and its anchor pad is at least −43 kJ/mol.

Experimental details for fabrication of APTES anchor pads on clean silicon, assembly of DNA nanostructures, and deposition of DNA nanostructures on anchor pads. This material is available free of charge via the Internet at http://pubs.acs.org.

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Received 5 April 2010
Published online 30 June 2010
Published in print 3 August 2010
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