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    High-Resolution Field Effect Sensing of Ferroelectric Charges
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    † Semiconductor Device Laboratory, Samsung Advanced Institute of Technology, Yongin 446-712, Korea
    ‡ Semiconductor R&D center, Samsung Electronics, Yongin 446-711, Korea
    § School of Advanced Materials Engineering, Kookmin University, Seoul 136-702, Korea
    ∥ Division of Engineering, Brown University, Providence, Rhode Island 02912, United States
    ⊥ School of Electrical Engineering, Korea University, Seoul 136-713, Korea
    # Max Planck Institute of Microstructure Physics, Halle (Saale) 06120, Germany
    Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
    ◻ Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
    *E-mail: [email protected]
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    Nano Letters

    Cite this: Nano Lett. 2011, 11, 4, 1428–1433
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    https://doi.org/10.1021/nl103372a
    Published March 4, 2011
    Copyright © 2011 American Chemical Society
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    Abstract

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    Nanoscale manipulation of surface charges and their imaging are essential for understanding local electronic behaviors of polar materials and advanced electronic devices. Electrostatic force microscopy and Kelvin probe force microscopy have been extensively used to probe and image local surface charges responsible for electrodynamics and transport phenomena. However, they rely on the weak electric force modulation of cantilever that limits both spatial and temporal resolutions. Here we present a field effect transistor embedded probe that can directly image surface charges on a length scale of 25 nm and a time scale of less than 125 μs. On the basis of the calculation of net surface charges in a 25 nm diameter ferroelectric domain, we could estimate the charge density resolution to be as low as 0.08 μC/cm2, which is equivalent to 1/20 electron per nanometer square at room temperature.

    Copyright © 2011 American Chemical Society

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    Nano Letters

    Cite this: Nano Lett. 2011, 11, 4, 1428–1433
    Click to copy citationCitation copied!
    https://doi.org/10.1021/nl103372a
    Published March 4, 2011
    Copyright © 2011 American Chemical Society
    Request reuse permissions

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